Optical emission spectroscopic analysis of plasma parameters in tin–copper alloy co-sputtering system

2016 ◽  
Vol 48 (12) ◽  
Author(s):  
Kadhim A. Aadim
Keyword(s):  
Copper Alloy ◽  
Spectroscopic Analysis ◽  
Optical Emission ◽  
Plasma Parameters ◽  
Emission Spectroscopic Analysis ◽  
Sputtering System

scholarly journals Optical Emission Spectroscopic Analysis of Plasma Parameters in Cadmium by Nd: YAG laser Technique

2021 ◽  
Vol 2114 (1) ◽  
pp. 012049
Author(s):  
Uday H. Tawfeeq ◽  
Ahmed K. Abbas ◽  
Kadhim A. Aadim
Keyword(s):  
Laser Pulse ◽  
Atmospheric Pressure ◽  
Spectroscopic Analysis ◽  
Debye Length ◽  
Optical Emission ◽  
Plasma Electron ◽  
Laser Technique ◽  
Plasma Parameters ◽  
Yag Laser ◽  
Emission Spectroscopic Analysis

Abstract In this work, optical emission spectroscopy (OES) was used to estimate the parameters of plasma electron temperature (Te), electron density (ne), plasma frequency (fp), Debye length (λD), and Debye number (ND). Understanding how an energy pulsed laser affects these variables is also important. Irradiation of pure cadmium using an Nd: YAG laser pulse with a wavelength(1064)nm and energy ranging from (200-600)millijoules, of frequency (6) Hz. The spectrum of laser-induced plasma was detected under atmospheric pressure. It was discovered that when the energy of the laser pulse rises, the intensity of the CdI and CdII lines increases.

scholarly journals Spectroscopic Analysis of CdO1-X: SnX Plasma Produced by Nd:YAG Laser

2020 ◽  
pp. 1665-1671
Author(s):  
Madyan A. Khalaf ◽  
Baida M. Ahmed ◽  
Kadhim A. Aadim
Keyword(s):  
Electron Temperature ◽  
Spectroscopic Analysis ◽  
Outcome Measure ◽  
Focal Length ◽  
Debye Length ◽  
Optical Emission ◽  
Plasma Parameters ◽  
Optical Emission Spectrum ◽  
Mixing Ratios ◽  
Line Intensities

In this work, the optical emission spectrum technique was used to analyze the spectrum resulting from the CdO:Sn plasma produced by laser Nd:YAG with a wavelength of (1064) nm, duration of (9) ns, and a focal length of (10) cm in the range of energy of 500-800 mJ. The electron temperature (Te) was calculated using the in ratio line intensities method, while the electron density (ne) was calculated using Saha-Boltzmann equation. Also, other plasma parameters were calculated, such as plasma (fp), Debye length (λD) and Debye number (ND). At mixing ratios of X=0.1, 0.3 and 0.5, the CdO1-X :SnX plasma spectrum was recorded for different energies. The changes in electron temperature and the densities were studied as a function of the laser energies. Outcome measure value of the electron temperature at the ratio of  X = 0.1 was (1.079-1.054) eV, while at  X=0.3 the Te range was (0.952- 0.921) eV and at X=0.5 it was (0.928-0.906) eV.

scholarly journals Spectroscopic Analysis of Clove Plasma Parameters Using Optical Emission Spectroscopy

2021 ◽  
pp. 2565-2570
Author(s):  
Neean F. Majeed ◽  
Maysaa R. Naeemah ◽  
Alyaa H. Ali ◽  
Sabah N. Mazhir
Keyword(s):  
Atmospheric Pressure ◽  
Antimicrobial Agents ◽  
Spectroscopic Analysis ◽  
Chemical Elements ◽  
Emission Spectra ◽  
Optical Emission ◽  
Absorption Spectrometry ◽  
Plasma Parameters ◽  
X Ray ◽  
Normal Atmospheric Pressure

     In the current study, the emission spectra generated from clove were measured under normal atmospheric pressure with different laser energies. Clove is used as a source of essential oil in herbal medicine, in particular as a dynamic analgesic oil in dental and other diseases. For aromatherapy, Antiseptic, antiviral, and antimicrobial agents are also packaged with cloves. Compounds that reduce inflammation tend to battle sore throats, cold, and cough as they display so many advantages. The measured spectrum reveals distinctive lines of clove’s chemical elements. X-ray fluorescent (XRF) and atomic absorption spectrometry (AAS) were used to measure the spectrum generated or absorbed by detecting the presence of various elements and their ratios in the cloves, for different energy the electron temperature varies between 0.043 and 0.073 eV and the number of electron varied between 2.074 and 2.287) x1014 cm-3 for clove.

scholarly journals Optical Emission Spectroscopic Analysis of Plasma Plume during Pulsed Laser Deposition of PZT

2014 ◽  
Vol 2014 ◽  
pp. 1-9 ◽  
Author(s):  
S. Sasanka Kumar ◽  
R. Reshmi ◽  
N. V. Joshy ◽  
A. C. Saritha ◽  
M. K. Jayaraj
Keyword(s):  
Electron Temperature ◽  
Early Stage ◽  
Time Of Flight ◽  
Optical Emission ◽  
Target Surface ◽  
Number Density ◽  
Plasma Parameters ◽  
Partial Pressures ◽  
Emission Spectroscopic Analysis ◽  
Almost All

Spatial variation in intensity of spectral emission, electron temperature, number density, and the time of flight (TOF) of ions and neutrals at various oxygen ambiances has been investigated on ferroelectric lead zirconium titanate (PZT) plasma using optical emission spectroscopy. Plasma produced by ablating PZT ceramic target using Nd-YAG laser operating at the third harmonics (λ=355 nm, τ=10 ns, repetition frequency 10 Hz) was investigated at various oxygen partial pressures and at various distances from the target surface. Here energy density for laser fluence was fixed as 3.13 Jcm−2 and distance from the target and ambient gas pressure were varied. The electron number density Ne and electron temperature of the PZT plasma at the early stage of plume expansion were measured as 1.7×1017 Jcm−2 and 13200 K, respectively, and thus verified the existence of local thermodynamic equilibrium (LTE). Time of flight spectra (TOF) of neutral and singly ionized species in plasma were recorded. The result shows that plasma parameters and velocity of species are of same order for various oxygen partial pressures but have a decreasing tendency with distance. The energy of almost all species in the plume become more or less same at 0.1 mbar. These conditions favour the growth of perovskite PZT thin films.

scholarly journals COMPARISON STUDY BETWEEN SPECTROSCOPIC ANALYSIS FOR (ZN,SN) PLASMA BY LIBS

2021 ◽  
Vol 03 (02) ◽  
pp. 52-61
Author(s):  
Hadeel K. NASIF ◽  
Kadhim A. AADIM ◽  
Baida M. AHMED
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Spectroscopic Analysis ◽  
Focal Length ◽  
Line Strength ◽  
Pulsed Laser ◽  
Optical Emission ◽  
Comparison Study ◽  
Plasma Parameters ◽  
Strength Formula

this article a spectroscopic research on laser-produced Tin and Zinc plasmas using the optical emission spectroscopy (OES) technique. Plasmas can be produced from a solid tin and zinc targets irradiated with a pulsed laser in room environments. The spectrum is recorded for the Sn, Zn laser plasma Nd: YAG with a wavelength of (1064) nm, a duration of (9) ns, and a frequency of (6) Hz and a focal length of (10) cm within the energy range (300-800)mj. By using the ratio line strength formula, the electron temperature (Te) can be calculated and the result is for Zinc (Zn) plasma (2.11 ev) and tin (Sn) plasma (1,227 ev). The Saha-Boltzmann equation will be used to calculate electron density (ne) in this method and the values for zinc (Zn) (3.3 cm-3)and tin (Sn) (2.1 cm-3). The plasma parameters, such as plasma (fp), Debye duration (λD), and Debye number (ND), were calculated in the proposed document.

scholarly journals Dry Etching Performance and Gas-Phase Parameters of C6F12O + Ar Plasma in Comparison with CF4 + Ar

Materials ◽  
2021 ◽  
Vol 14 (7) ◽  
pp. 1595
Author(s):  
Nomin Lim ◽  
Yeon Sik Choi ◽  
Alexander Efremov ◽  
Kwang-Ho Kwon
Keyword(s):  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Reactive Ion Etching ◽  
Research Work ◽  
Optical Emission ◽  
Plasma Parameters ◽  
Ion Etching ◽  
Ar Plasma ◽  
Ar Gas ◽  
Etching Selectivity

This research work deals with the comparative study of C6F12O + Ar and CF4 + Ar gas chemistries in respect to Si and SiO2 reactive-ion etching processes in a low power regime. Despite uncertain applicability of C6F12O as the fluorine-containing etchant gas, it is interesting because of the liquid (at room temperature) nature and weaker environmental impact (lower global warming potential). The combination of several experimental techniques (double Langmuir probe, optical emission spectroscopy, X-ray photoelectron spectroscopy) allowed one (a) to compare performances of given gas systems in respect to the reactive-ion etching of Si and SiO2; and (b) to associate the features of corresponding etching kinetics with those for gas-phase plasma parameters. It was found that both gas systems exhibit (a) similar changes in ion energy flux and F atom flux with variations on input RF power and gas pressure; (b) quite close polymerization abilities; and (c) identical behaviors of Si and SiO2 etching rates, as determined by the neutral-flux-limited regime of ion-assisted chemical reaction. Principal features of C6F12O + Ar plasma are only lower absolute etching rates (mainly due to the lower density and flux of F atoms) as well as some limitations in SiO2/Si etching selectivity.

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