Interfacial microstructure evolution in Pb-free solder systems

2003 ◽  
Vol 32 (8) ◽  
pp. 906-912 ◽  
Author(s):  
K. Y. Lee ◽  
M. Li
2011 ◽  
Vol 239-242 ◽  
pp. 2976-2980 ◽  
Author(s):  
Ying Hui Zhang ◽  
Jing Qin ◽  
Hong Jin Zhao ◽  
Gao Lei Xu

The interfacial microstructure evolution of copper/aluminium laminates with different annealing processes was studied. It was found that the formation and growth of intermetallic compounds in the interface during metallurgical combination process have four stages: the incubation period, the formation of island-like new phases in local areas, the transverse-lengthwise-transverse growth of diffusion zone, the formation of new intermetallic compounds and thickening of diffusion zone.


2011 ◽  
Vol 519 (13) ◽  
pp. 4212-4215 ◽  
Author(s):  
Jen-Hao Song ◽  
Jow-Lay Huang ◽  
James C. Sung ◽  
Sheng-Chang Wang ◽  
Horng-Hwa Lu ◽  
...  

2020 ◽  
Vol 49 (4) ◽  
pp. 2660-2668 ◽  
Author(s):  
Jianglei Fan ◽  
Hengtao Zhai ◽  
Zhanyun Liu ◽  
Xiao Wang ◽  
Xiangkui Zhou ◽  
...  

2004 ◽  
Vol 810 ◽  
Author(s):  
K.Y. Lee ◽  
S.L. Liew ◽  
S.J. Chua ◽  
D.Z. Chi ◽  
H.P. Sun ◽  
...  

ABSTRACTPhase formation and interfacial microstructure evolution of nickel germanides formed by rapid thermal annealing in a 15-nm Ni/Ge (100) system have been studied. Coexistence of a NiGe layer and Ni-rich germanide particles was detected at 250°C. Highly textured NiGe film with a smooth interface with Ge was observed. Annealing at higher temperatures resulted in grain growth and severe grooving of the NiGe film at the substrate side, followed by serious agglomeration above 500°C. Fairly low sheet resistance was achieved in 250-500°C where the NiGe film continuity was uninterrupted.


2005 ◽  
Vol 863 ◽  
Author(s):  
S.M. Yang ◽  
Y.Y. Chang ◽  
Weite Wu

AbstractAt present, Pb-free process is imperative in the electronic packaging industry. Many reports focus on Pb-free solder to improve the solderability, it seems not obtain wettability as good as SnPb solder. In this study, an alloy interlayer with different content was deposited on Cu to balance wettability and diffusion barrier in the interface of joint by electroplating process. There are three types of interlayers including Cu, Ni, and SnNi alloy. The interlayer may react with Sn-3.5Ag solder during reflow process. Sn-Ni alloy plating layer is selected to improve wettability and provide diffusion barrier at the same time in soldering process. For interfacial microstructure examination, morphology characterization can be obtained by using scanning electron microscope (SEM) and energy-dispersive x-ray analysis (EDX). The structure of IMC is identified by x-ray diffraction (XRD).


2021 ◽  
Vol 853 ◽  
pp. 157120
Author(s):  
Jiaming Liu ◽  
Yubo Zhang ◽  
Zhongkai Guo ◽  
Shichao Liu ◽  
Junjia Zhang ◽  
...  

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