Valence band discontinuity of the (0001) 2H-GaN / (111) 3C-SiC interface

1999 ◽  
Vol 28 (12) ◽  
pp. L34-L37 ◽  
Author(s):  
S. W. King ◽  
R. F. Davis ◽  
C. Ronning ◽  
R. J. Nemanich
1996 ◽  
Vol 54 (4) ◽  
pp. 2718-2722 ◽  
Author(s):  
L. Wang ◽  
S. Sivananthan ◽  
R. Sporken ◽  
R. Caudano

1995 ◽  
Vol 378 ◽  
Author(s):  
Art J. Nelson ◽  
K. Sinha ◽  
John Moreland

AbstractSynchrotron radiation soft x-ray photoemission spectroscopy was used to investigate the development of the electronic structure at the CdS/Cu2Se heterojunction interface. Cu2−xSe layers were deposited on GaAs (100) by molecular beam epitaxy from Cu2Se sources. Raman spectra reveal a strong peak at 270 cm−1, indicative of the Cu2−xSe phase. Atomic force microscopy reveals uniaxial growth in a preferred (100) orientation. CdS overlayers were then deposited in-situ, at room temperature, in steps on these epilayers. Photoemission measurements were acquired after each growth in order to observe changes in the valence band electronic structure as well as changes in the Se3d and Cd4d core lines. The results were used to correlate the interfacial chemistry with the electronic structure and to directly determine the CdS/Cu2−xSe and heterojunction valence band discontinuity and the consequent heterojunction band diagram. These results are compared to the valence band offset (ΔEv) for the CdS/CuInSe2 heterojunction interface.


1995 ◽  
Vol 24 (4) ◽  
pp. 225-227 ◽  
Author(s):  
G. Martin ◽  
S. Strite ◽  
A. Botchkarev ◽  
A. Agarwal ◽  
A. Rockett ◽  
...  

1993 ◽  
Vol 07 (07) ◽  
pp. 459-464 ◽  
Author(s):  
SHIHONG XU ◽  
XIANMING LIU ◽  
MAOSHENG MA ◽  
JINGSHENG ZHU ◽  
YUHENG ZHANG ◽  
...  

The changes of band offset of Ge-GaAs(100) heterojunction are observed by means of an ultrathin Na intralayer with the photoemission spectroscopy. 1 ML Na intralayer increases the valence-band discontinuity of Ge-GaAs by 0.19 eV on the average.


1985 ◽  
Vol 56 ◽  
Author(s):  
B. A. WILSON ◽  
P. DAWSON ◽  
C. W. TU ◽  
R. C. MILLER

AbstractA novel method has been used to obtain a direct and accurate measure of the valence-band discontinuity AlyGa1−yAs/AlAs heterojunctions in quantum-well structures. The technique takes advantage of the crossover occurring at a critical Al concentration above which the indirect X minimum in the AlAs becomes the lowest-energy conduction band in the system. Within these “staggered” band alignment structures, photoexcited electrons and holes are spatially separated, and recombination occurs across the interface. The resulting emission fixes the valence-band offset to within 1% without accurate knowledge of other system parameters, such as effective masses and exciton or dopant binding energies. These measurements represent the first direct optical confirmation of staggered band alignments in this technologically important material system.


1995 ◽  
Vol 377 ◽  
Author(s):  
M. Sebastiani ◽  
L. Di Gaspare ◽  
C. Bittencourt ◽  
F. Evangelisti

ABSTRACTWe report the first yield spectroscopy study on well characterized c-Si/a-Si:H heterojunctions grown in situ under UHV conditions. We find that this spectroscopy, when operated in the constant final state mode, allows a direct and precise determination of the valence-band discontinuity at the interface. A value of δEv = 0.44 ± 0.02 eV was found for the discontinuity.


2000 ◽  
Vol 639 ◽  
Author(s):  
Toshiki Makimoto ◽  
Kazuhide Kumakura ◽  
Toshio Nishida ◽  
Naoki Kobayashi

ABSTRACTp-InGaN/n-GaN heterojunction diodes were grown by metalorganic vapor phase epitaxy and characterized using current-voltage (I-V) and capacitance-voltage (C-V) measurements. We changed the In mole fraction in p-InGaN from 0 to 25% to investigate diode characteristics. All the diodes showed rectified I-V characteristics at room temperature. The ideality factors obtained from forward I-V characteristics were around 2, meaning that the recombination current is dominant instead of the tunneling current through the defects in depletion layers of the diodes. The breakdown voltage in reverse I-V characteristics depends on the net donor concentration (ND - NA) in n-GaN instead of the In mole fraction in p-InGaN. This result also means that the defects in p-InGaN do not influence the breakdown voltage. The built-in potential from C-V measurements decreases with the In mole fraction in p-InGaN, meaning that the valence band discontinuity increases with the In mole fraction. This valence band discontinuity realizes the hole confinement in an HBT with an p-InGaN base. Using these InGaN/GaN heterojunction diodes, an InGaN/GaN double heterojunction bipolar transistor was fabricated for the first time. The maximum current gain of 1.2 was obtained at room temperature.


1994 ◽  
Vol 65 (5) ◽  
pp. 610-612 ◽  
Author(s):  
G. Martin ◽  
S. Strite ◽  
A. Botchkarev ◽  
A. Agarwal ◽  
A. Rockett ◽  
...  

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