Influence of radical photoinitiator content on UV curing process and UV-cured hybrid sol–gel films

2019 ◽  
Vol 17 (2) ◽  
pp. 333-343 ◽  
Author(s):  
Anaïs Even ◽  
Guillaume Vignaud ◽  
Nadia Guitter ◽  
Nathalie Le Bozec ◽  
Philippe Tingaut ◽  
...  
Keyword(s):  
Sol Gel ◽  
Uv Curing ◽  
Curing Process ◽  
Sol Gel Films ◽  
Uv Curing Process

Control of a Robotic UV Curing Process With Thermal Vision Feedback Through Two IR Cameras

2009 ◽  
Author(s):  
Fan Zeng ◽  
Beshah Ayalew ◽  
Mohammed Omar
Keyword(s):  
Control Variable ◽  
Ultra Violet ◽  
Uv Curing ◽  
High Energy ◽  
Curing Process ◽  
Radiant Intensity ◽  
Loop Control ◽  
Thermal Vision ◽  
Uv Curing Process ◽  
Vision Feedback

Robotic ultra-violet (UV) curing is considered to be one of the effective ways to replace the current convection-based methods in various manufacturing processes due to its fast curing rate and high energy efficiency. This paper presents a closed-loop control of a robotic UV curing system by using thermal vision feedback through two infrared (IR) cameras. The proposed approach is developed based on a mathematical analysis of the fundamental UV curing process and the integration of the local and global IR cameras in a cascade manner. A computer simulation study is conducted to evaluate the proposed strategy by regarding two control variables: the radiant intensity of the UV heater and the sweeping speed of the robot end effector. The results indicate that controllers using either control variable can compensate for interferences and improve curing quality under this thermal-vision-based architecture.

Formation of Barrier Ribs via Micro Molding Process Using UV-Curable Paste

2007 ◽  
Vol 534-536 ◽  
pp. 1029-1032
Author(s):  
Yong Seog Kim ◽  
Tae Gum Koh ◽  
Yoo Seong Kim
Keyword(s):  
Uv Curing ◽  
Processing Route ◽  
Curing Process ◽  
Plasma Display Panel ◽  
Molding Process ◽  
Uv Curable ◽  
Processing Cost ◽  
Plasma Display ◽  
Uv Curing Process ◽  
Sintering Shrinkage

In an attempt to reduce processing cost and to improve the resolution of PDPs, a micro mold transfer processing route for barrier ribs of plasma display panel was attempted. In this study, the parameters that may cause defects during the process were identified, which include the shrinkage during the UV curing process, stress due to the evaporation of organic components, and sintering shrinkage. Considering such parameters, a UV curable paste was developed and the barrier ribs of PDPs were successfully processed via the process. This work demonstrated the possibility of a build-up route in manufacturing barrier ribs of PDP

Facile fabrication of photoinduced superhydrophobic–superhydrophilic surfaces on cellulose substrate without strength loss

2018 ◽  
Vol 89 (9) ◽  
pp. 1807-1822
Author(s):  
Yunjie Yin ◽  
Yanyan Zhang ◽  
Xiaoqian Ji ◽  
Tao Zhao ◽  
Chaoxia Wang
Keyword(s):  
Mechanical Properties ◽  
Uv Irradiation ◽  
Uv Curing ◽  
Contact Angles ◽  
Curing Process ◽  
Water Contact ◽  
Cellulose Substrate ◽  
Cellulose Substrates ◽  
Uv Curing Process ◽  
Modified Cellulose

A novel strategy was reported on the design and fabrication of functional photosensitive hybrid sols (FPHSs) by non-alcoholic emulsification in the presence of a TiO2 nanoparticle and photoinitiator via a sol-gel process using tetraethylorthosilicate, γ-methacryloxypropyltrimethoxysilane (MPS) and hydrophobic silane coupling agents as precursors. Smart cellulose substrates with alterable superhydrophobic–superhydrophilic conversion were fabricated using FPHS via the ultraviolet (UV) curing process. The liquid FPHS was photocured into solid gel during UV irradiation for 40 s with MPSs in FPHS, which was verified via Fourier transform infrared spectra. The cellulose substrates were modified with FPHSs, and the water contact angles of the modified cellulose substrates were more than 150°. The superhydrophobicity was improved by the gathering of hydrophobic chains and particle deposition of hybrid gel on the fiber surface. Nevertheless, the water contact angles of the modified cellulose substrates were receded with UV irradiation from 158° to 0° in 200 min, due to TiO2 photoinduction. The irradiated cellulose substrates were placed in the dark, and the water contact angles were recovered to about 130°, gradually. What is more, the reversible process can be repeated more than eight times. The modified cellulose substrate presented excellent washing fastness, even suffering 10 times washing processing. The mechanical properties, including breaking strength and elongation rate, were improved after the coating and UV curing process, which considerably remedied the defects of the heating curing process on the mechanical properties.

Study on the Transparent Electronic Isolation Layer Material - A Photoresist Composition which is Stable at High Temperature and Humidity

2020 ◽  
Vol 980 ◽  
pp. 44-57
Author(s):  
Wei Li ◽  
Da Hong Li ◽  
Jian Ping Cao ◽  
Xiang Jun Yun ◽  
Pawan Kunmar
Keyword(s):  
High Temperature ◽  
Uv Curing ◽  
Acid Value ◽  
Curing Process ◽  
Process Technology ◽  
Acrylic Copolymer ◽  
Isolation Layer ◽  
Temperature And Humidity ◽  
Bridge Pattern ◽  
Uv Curing Process

A negative resist composition composed of an acrylic-copolymer-binder resin, a crosslinker, photoinitiators, some agents and solvents has been UV-cured and developed for OverCoat (OC)-Bridge of One Glass Solution (OGS) touch panel (TP) sensor, wherein acrylic-copolymer-binder resin as a key element consisting of N-Phenylmaleimide (N-Pm), Methacrylic acid (MA), Styrene (St) and Isobornyl methacrylate (iBMA) monomers, being designed and synthesized to control the acid value (90-110mgKOH/g), molecular weight (Mw:10,000-20,000) and approximate solubility parameter [10.67-11.05(cal/cm3)1/2]. Here,we demonstrate a OC photoresist applies between two ITO line-films by UV-curing process technology deveoled for OC-Bridge pattern with a kind of acrylic-copolymer-binder resin by ours. Acting as TP sensor, the OC patterns have adequate resistance to solvents, acids and alkalis, good thermal and humid stability, and with excellent transparency and insulation. This OC photoresist, coupled with the acrylic-copolymer-binder resins, provides an unprecedented approach to realize supporting high temperature and humidity OC-Bridge.

A Noble Photo-Grafting Technique of Perfluoropolyether Molecular Chains to the Carbon Overcoat

2007 ◽  
Author(s):  
Paul H. Kasai ◽  
A. Wakabayashi
Keyword(s):  
Uv Curing ◽  
Carbon Layer ◽  
Molecular Chain ◽  
Fluoride Anion ◽  
Radical Center ◽  
Curing Process ◽  
Carbon Overcoat ◽  
Radical Chain ◽  
Polymer Backbone ◽  
Uv Curing Process

The technique of enhancing adhesion of PFPE (perfluoropolyether) lubricants to the carbon overcoat of magnetic media discs by irradiation with far-UV (185 nm) was reported some time ago.[1] It was later suggested that photoelectrons emanating from the carbon layer was responsible for the observed efficacy.[2] Capture of these low energy electrons by PFPE molecular chains would lead to detachment of a fluoride anion and formation of a radical center on the polymer backbone. Adhesion occurs when the radical center reacts with the carbon layer. Most recently this mechanism was challenged, and photo-cleavage of a CF2O unit from the molecular chain thus generating two radical chain fragments was proposed as the primary happening.[3] In either case the reaction commences at a point randomly selected on the molecular chain. The UV-curing process was not adopted into the production process until recently. The process is now being used for such lubricant mixtures as A20H/Z-dol and A20H/Z-tetraol. In these mixtures, however, an electro- or photo-chemistry involving the phosphazene moiety of A20H appears to play a major role.[4] One negative issue with the far-UV curing process is production of ozone if oxygen is present.

Characterization and Properties of UV-Cured Epoxy Acrylate/POSS Nanocomposites

2013 ◽  
Vol 652-654 ◽  
pp. 331-334
Author(s):  
Ying Wang ◽  
Xiang Xin Xue ◽  
Feng Guo Liu
Keyword(s):  
Phase Separation ◽  
Impact Resistance ◽  
Uv Curing ◽  
Xrd Analysis ◽  
Epoxy Acrylate ◽  
Curing Process ◽  
Ftir Analysis ◽  
Uv Curing Process ◽  
Oligomeric Silsesquioxane ◽  
The Impact

In this study, polyhedral oligomeric silsesquioxane (POSS) were blenged with epoxy acrylate (EA) and photoinitiator to prepare nanocomposites through UV-curing process. The vinyl-POSS nanoparticles were added to EA by physically blending at loadings between 0% and 15wt%. Through the FTIR analysis, we found that the POSS nanocomposites didn’t affect the extent of UV curing reactions; the curing reactions were performed to be completed in all POSS containing composites. The XRD analysis convinced the existing of phase separation between EA matrix and vinyl-POSS monomer. The impact resistance and coating adhesion were all enhanced by POSS nanocomposites at low content.

Improvement of the UV curing process for the laser lithography technique

1995 ◽  
Vol 16 (1) ◽  
pp. 23-32 ◽  
Author(s):  
J.Y.H. Fuh ◽  
Y.S. Choo ◽  
A.Y.C. Nee ◽  
L. Lu ◽  
K.C. Lee
Keyword(s):  
Uv Curing ◽  
Curing Process ◽  
Laser Lithography ◽  
Uv Curing Process ◽  
Lithography Technique
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