Large Scale Language Assessments

2011 ◽  
Keyword(s):  
Large Scale ◽  
Language Assessments

Developing individualized feedback for listening assessment: Combining standard setting and cognitive diagnostic assessment approaches

2021 ◽  
pp. 026553222199547
Author(s):  
Shangchao Min ◽  
Lianzhen He
Keyword(s):  
Large Scale ◽  
Standard Setting ◽  
Diagnostic Assessment ◽  
Efl Learners ◽  
Cognitive Diagnostic Assessment ◽  
Item Level ◽  
Language Assessments ◽  
Individualized Feedback ◽  
Proficiency Classifications ◽  
Acceptable Reliability

In this study, we present the development of individualized feedback for a large-scale listening assessment by combining standard setting and cognitive diagnostic assessment (CDA) approaches. We used the performance data from 3358 students’ item-level responses to a field test of a national EFL test primarily intended for tertiary-level EFL learners. The results showed that proficiency classifications and subskill mastery classifications were generally of acceptable reliability, and the two kinds of classifications were in alignment with each other at individual and group levels. The outcome of the study is a set of descriptors that describe each test taker’s ability to understand certain level of oral texts and his or her cognitive performance. The current study, by illustrating the feasibility of combining standard setting and CDA approaches to produce individualized feedback, contributes to the enhancement of score reporting and addresses the long-standing criticism that large-scale language assessments fail to provide individualized feedback to link assessment with instruction.

A systematic review of methods for evaluating rating quality in language assessment

2017 ◽  
Vol 35 (2) ◽  
pp. 161-192 ◽  
Author(s):  
Stefanie A. Wind ◽  
Meghan E. Peterson
Keyword(s):  
Large Scale ◽  
Measurement Theory ◽  
Measurement Techniques ◽  
Assessment System ◽  
High Stakes ◽  
Rater Reliability ◽  
Assessment Systems ◽  
Level Information ◽  
Language Assessments ◽  
Assessment Context

The use of assessments that require rater judgment (i.e., rater-mediated assessments) has become increasingly popular in high-stakes language assessments worldwide. Using a systematic literature review, the purpose of this study is to identify and explore the dominant methods for evaluating rating quality within the context of research on large-scale rater-mediated language assessments. Results from the review of 259 methodological and applied studies reveal an emphasis on inter-rater reliability as evidence of rating quality that persists across methodological and applied studies, studies primarily focused on rating quality and studies not primarily focused on rating quality, and across multiple language constructs. Additional findings suggest discrepancies in rating designs used in empirical research and practical concerns in performance assessment systems. Taken together, the findings from this study highlight the reliance upon aggregate-level information that is not specific to individual raters or specific facets of an assessment context as evidence of rating quality in rater-mediated assessments. In order to inform the interpretation and use of ratings, as well as the improvement of rater-mediated assessment systems, rating quality indices are needed that go beyond group-level indicators of inter-rater reliability, and provide diagnostic evidence of rating quality specific to individual raters, students, and other facets of the assessment system. These indicators are available based on modern measurement techniques, such as Rasch measurement theory and other item response theory approaches. Implications are discussed as they relate to validity, reliability/precision, and fairness for rater-mediated assessments.

scholarly journals Estimating measurement error in child language assessments administered by daycare educators in large scale intervention studies

PLoS ONE ◽  
2021 ◽  
Vol 16 (11) ◽  
pp. e0255414
Author(s):  
E. F. Haghish ◽  
Werner Vach ◽  
Anders Højen ◽  
Dorthe Bleses
Keyword(s):  
Measurement Error ◽  
Large Scale ◽  
Intervention Studies ◽  
Science Studies ◽  
Linear Models ◽  
Screening Program ◽  
Child Language ◽  
Additional Measurement ◽  
Language Assessments ◽  
Using Data

Measurement error is a ubiquitous element of social science studies. In large-scale effectiveness intervention studies on child language, administration of the assessment of language and preliteracy outcomes by speech and language pathologists is costly in money and human resources. Alternatively, daycare educators can administer the assessment, which preserves considerable resources but may increase the measurement error. Using data from two nationwide child language intervention studies in Denmark, this article evaluates daycare educators’ measurement error when administering a test of language and preliteracy skills of 3 to 5 year old children that in part is used in a national screening program. Since children were randomly assigned to educators, hierarchical linear models can estimate the amount of additional measurement error caused by educators’ language assessments. The result shows that the amount of additional measurement error varied between different language subscales, ranging from 4% to 19%, which can be compensated for by increasing the sample size by the latter percentage. The benefits and risks of having daycare educators administer language assessments are discussed.

Some comments about observations and image processing of comet 29P/Schwassmann-Wachmann 1

1999 ◽  
Vol 173 ◽  
pp. 243-248
Author(s):  
D. Kubáček ◽  
A. Galád ◽  
A. Pravda
Keyword(s):  
Image Processing ◽  
Large Scale ◽  
Harvard College ◽  
Oak Ridge ◽  
Large Scale Structures ◽  
Short Period Comet ◽  
Short Period ◽  
Scale Structures ◽  
Harvard College Observatory ◽  
Period Comet

AbstractUnusual short-period comet 29P/Schwassmann-Wachmann 1 inspired many observers to explain its unpredictable outbursts. In this paper large scale structures and features from the inner part of the coma in time periods around outbursts are studied. CCD images were taken at Whipple Observatory, Mt. Hopkins, in 1989 and at Astronomical Observatory, Modra, from 1995 to 1998. Photographic plates of the comet were taken at Harvard College Observatory, Oak Ridge, from 1974 to 1982. The latter were digitized at first to apply the same techniques of image processing for optimizing the visibility of features in the coma during outbursts. Outbursts and coma structures show various shapes.

Evolution of Large-Scale Coronal Structures

1994 ◽  
Vol 144 ◽  
pp. 29-33
Author(s):  
P. Ambrož
Keyword(s):  
Magnetic Field ◽  
Field Line ◽  
Large Scale ◽  
Coronal Magnetic Field ◽  
Source Surface ◽  
Solar Cycles ◽  
Characteristic Relationship ◽  
The Magnetic Field ◽  
Coronal Structures

AbstractThe large-scale coronal structures observed during the sporadically visible solar eclipses were compared with the numerically extrapolated field-line structures of coronal magnetic field. A characteristic relationship between the observed structures of coronal plasma and the magnetic field line configurations was determined. The long-term evolution of large scale coronal structures inferred from photospheric magnetic observations in the course of 11- and 22-year solar cycles is described.Some known parameters, such as the source surface radius, or coronal rotation rate are discussed and actually interpreted. A relation between the large-scale photospheric magnetic field evolution and the coronal structure rearrangement is demonstrated.

Large-scale Motion of Solar Filaments

2000 ◽  
Vol 179 ◽  
pp. 205-208
Author(s):  
Pavel Ambrož ◽  
Alfred Schroll
Keyword(s):  
Magnetic Flux ◽  
Proper Motion ◽  
Time Scale ◽  
Large Scale ◽  
Accuracy Of Measurements ◽  
Solar Filaments ◽  
General Movement ◽  
Scale Motion ◽  
Velocity Scatter

AbstractPrecise measurements of heliographic position of solar filaments were used for determination of the proper motion of solar filaments on the time-scale of days. The filaments have a tendency to make a shaking or waving of the external structure and to make a general movement of whole filament body, coinciding with the transport of the magnetic flux in the photosphere. The velocity scatter of individual measured points is about one order higher than the accuracy of measurements.

Some applications of electron beam microanalysis techniques in VLSI process evaluation

1983 ◽  
Vol 41 ◽  
pp. 160-161
Author(s):  
Simon Thomas
Keyword(s):  
Integrated Circuits ◽  
Process Evaluation ◽  
Large Scale ◽  
Technology Development ◽  
Analytical Techniques ◽  
Successful Implementation ◽  
Analysis Of Failures ◽  
Characterization Of Materials ◽  
Circuits Vlsi

Trends in the technology development of very large scale integrated circuits (VLSI) have been in the direction of higher density of components with smaller dimensions. The scaling down of device dimensions has been not only laterally but also in depth. Such efforts in miniaturization bring with them new developments in materials and processing. Successful implementation of these efforts is, to a large extent, dependent on the proper understanding of the material properties, process technologies and reliability issues, through adequate analytical studies. The analytical instrumentation technology has, fortunately, kept pace with the basic requirements of devices with lateral dimensions in the micron/ submicron range and depths of the order of nonometers. Often, newer analytical techniques have emerged or the more conventional techniques have been adapted to meet the more stringent requirements. As such, a variety of analytical techniques are available today to aid an analyst in the efforts of VLSI process evaluation. Generally such analytical efforts are divided into the characterization of materials, evaluation of processing steps and the analysis of failures.

Electron microscopy study of reactively sputter-deposited Ti/N films on silicon

1992 ◽  
Vol 50 (2) ◽  
pp. 1362-1363
Author(s):  
V. C. Kannan ◽  
A. K. Singh ◽  
R. B. Irwin ◽  
S. Chittipeddi ◽  
F. D. Nkansah ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Large Scale ◽  
Hexagonal Phase ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Process Conditions ◽  
Tin Films ◽  
Wide Range ◽  
Fcc Phase ◽  
Circuits Vlsi

Titanium nitride (TiN) films have historically been used as diffusion barrier between silicon and aluminum, as an adhesion layer for tungsten deposition and as an interconnect material etc. Recently, the role of TiN films as contact barriers in very large scale silicon integrated circuits (VLSI) has been extensively studied. TiN films have resistivities on the order of 20μ Ω-cm which is much lower than that of titanium (nearly 66μ Ω-cm). Deposited TiN films show resistivities which vary from 20 to 100μ Ω-cm depending upon the type of deposition and process conditions. TiNx is known to have a NaCl type crystal structure for a wide range of compositions. Change in color from metallic luster to gold reflects the stabilization of the TiNx (FCC) phase over the close packed Ti(N) hexagonal phase. It was found that TiN (1:1) ideal composition with the FCC (NaCl-type) structure gives the best electrical property.

Evolution of the microstructure of Cu(Ti)/SiO2 layers annealed in NH3

1995 ◽  
Vol 53 ◽  
pp. 452-453
Author(s):  
J. Liu ◽  
N. D. Theodore ◽  
D. Adams ◽  
S. Russell ◽  
T. L. Alford ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Titanium Nitride ◽  
Large Scale ◽  
Standard Procedure ◽  
Alloy Film ◽  
Electron Beam Evaporation ◽  
Copper Metallization ◽  
Nominal Composition ◽  
Ti Alloy ◽  
Thermally Grown

Copper-based metallization has recently attracted extensive research because of its potential application in ultra-large-scale integration (ULSI) of semiconductor devices. The feasibility of copper metallization is, however, limited due to its thermal stability issues. In order to utilize copper in metallization systems diffusion barriers such as titanium nitride and other refractory materials, have been employed to enhance the thermal stability of copper. Titanium nitride layers can be formed by annealing Cu(Ti) alloy film evaporated on thermally grown SiO2 substrates in an ammonia ambient. We report here the microstructural evolution of Cu(Ti)/SiO2 layers during annealing in NH3 flowing ambient.The Cu(Ti) films used in this experiment were prepared by electron beam evaporation onto thermally grown SiO2 substrates. The nominal composition of the Cu(Ti) alloy was Cu73Ti27. Thermal treatments were conducted in NH3 flowing ambient for 30 minutes at temperatures ranging from 450°C to 650°C. Cross-section TEM specimens were prepared by the standard procedure.

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