Group III hydride precursors for the metalorganic vapour phase epitaxy (MOVPE) of (AlGa)As/GaAs heterostructures

1991 ◽  
Vol 115 (1-4) ◽  
pp. 248-253 ◽  
Author(s):  
H. Protzmann ◽  
T. Marschner ◽  
O. Zsebök ◽  
W. Stolz ◽  
E.O. Göbel ◽  
...  
Keyword(s):  
Vapour Phase ◽  
Vapour Phase Epitaxy ◽  
Group Iii ◽  
Metalorganic Vapour Phase Epitaxy

scholarly journals Influence of the Mg precursor on the incorporation of Mg in MOVPE grown GaN.

2000 ◽  
Vol 5 (1) ◽  
Author(s):  
P. de Mierry ◽  
B. Beaumont ◽  
E. Feltin ◽  
H.P.D. Schenk ◽  
Pierre Gibart ◽  
...  
Keyword(s):  
Growth Rate ◽  
Surface Concentration ◽  
Vapour Phase ◽  
Vapour Phase Epitaxy ◽  
Group Iii ◽  
Metalorganic Vapour Phase Epitaxy ◽  
Amine Adducts ◽  
Sims Analysis

Incorporation of Mg in metalorganic vapour phase epitaxy (MOVPE) GaN has been investigated, using two different Mg precursors: bis-methylcyclopentadienyl magnesium [(MeCp)2Mg] and Solution bis-cyclopentadienyl magnesium [Solution Cp2Mg]. SIMS analysis reveals an increased (two fold) efficiency of Mg incorporation for Solution Cp2Mg as compared to (MeCp)2Mg. These results are attributed to the stronger interaction of (MeCp)2Mg with NH3, leading to the formation of alkylmagnesium amine adducts, and a reduced effective Mg surface concentration. A decreased GaN growth rate with increasing Mg fluxes is also reported for both precursors. This effect is more pronounced for Solution Cp2Mg indicating that incorporation of Mg in the lattice proceeds via the capture of Mg into group III sites, and that the supply of Mg from the surface is reduced in the case when (MeCp)2Mg is used.

Dependence of the V/III Ratio on Indium Incorporation in InGaN Films Grown by Metalorganic Vapour Phase Epitaxy

2020 ◽  
Vol 20 (5) ◽  
pp. 2979-2986
Author(s):  
V. Suresh Kumar ◽  
S. Y. Ji ◽  
Y. T. Zhang ◽  
K. Shojiki ◽  
J. H. Choi ◽  
...  
Keyword(s):  
Phase Separation ◽  
Vapour Phase ◽  
Peak Position ◽  
Molar Ratio ◽  
Band Edge Emission ◽  
Reciprocal Space Mapping ◽  
Vapour Phase Epitaxy ◽  
Group Iii ◽  
Force Microscopy ◽  
Metalorganic Vapour Phase Epitaxy

InGaN epitaxial layers were grown on c-plane sapphire substrates using the metalorganic vapour phase epitaxy (MOVPE) system at 760 °C. By varying the total flow rate of group-III sources (TMI+TEG) with a fixed molar ratio of group-III sources [TMI/(TMI+TEG)], the influence of V/III ratio were investigated from 4500 to 20000. The grown N-polar InGaN layers were investigated by atomic force microscopy and it is found that the surface roughness decreases with increasing the V/III ratios. High resolution X-ray diffraction analyses show that the phase separation decreases with increasing the V/III ratios. Photoluminescence measurements reveal that the peak position of the band-edge emission shifted toward the shorter wavelength with increasing the V/III ratios. Reciprocal space mapping (RSM) analyses were carried out on InGaN films. At low V/III ratio, the phase separation can be detected in InGaN films.

Characterization of GaAs/AlGaAs quantum wells and quantum wires by chemical lattice imaging

1994 ◽  
Vol 52 ◽  
pp. 736-737
Author(s):  
A. Carlsson ◽  
J.-O. Malm ◽  
A. Gustafsson
Keyword(s):  
Quantum Well ◽  
Quantum Wells ◽  
Quantum Wires ◽  
Vapour Phase ◽  
Quantitative Information ◽  
Lattice Imaging ◽  
Vapour Phase Epitaxy ◽  
Metalorganic Vapour Phase Epitaxy ◽  
High Resolution Images

In this study a quantum well/quantum wire (QW/QWR) structure grown on a grating of V-grooves has been characterized by a technique related to chemical lattice imaging. This technique makes it possible to extract quantitative information from high resolution images.The QW/QWR structure was grown on a GaAs substrate patterned with a grating of V-grooves. The growth rate was approximately three monolayers per second without growth interruption at the interfaces. On this substrate a barrier of nominally Al0.35 Ga0.65 As was deposited to a thickness of approximately 300 nm using metalorganic vapour phase epitaxy . On top of the Al0.35Ga0.65As barrier a 3.5 nm GaAs quantum well was deposited and to conclude the structure an additional approximate 300 nm Al0.35Ga0.65 As was deposited. The GaAs QW deposited in this manner turns out to be significantly thicker at the bottom of the grooves giving a QWR running along the grooves. During the growth of the barriers an approximately 30 nm wide Ga-rich region is formed at the bottom of the grooves giving a Ga-rich stripe extending from the bottom of each groove to the surface.

scholarly journals Towards practical applications of quantum emitters in boron nitride

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
M. Koperski ◽  
K. Pakuła ◽  
K. Nogajewski ◽  
A. K. Dąbrowska ◽  
M. Tokarczyk ◽  
...  
Keyword(s):  
Optical Properties ◽  
Boron Nitride ◽  
Vapour Phase ◽  
Emission Characteristics ◽  
Vapour Phase Epitaxy ◽  
Practical Applications ◽  
Metalorganic Vapour Phase Epitaxy ◽  
Polydimethylsiloxane Films ◽  
Background Luminescence ◽  
Quantum Emitters

AbstractWe demonstrate quantum emission capabilities from boron nitride structures which are relevant for practical applications and can be seamlessly integrated into a variety of heterostructures and devices. First, the optical properties of polycrystalline BN films grown by metalorganic vapour-phase epitaxy are inspected. We observe that these specimens display an antibunching in the second-order correlation functions, if the broadband background luminescence is properly controlled. Furthermore, the feasibility to use flexible and transparent substrates to support hBN crystals that host quantum emitters is explored. We characterise hBN powders deposited onto polydimethylsiloxane films, which display quantum emission characteristics in ambient environmental conditions.

Pulsed epitaxial lateral overgrowth of GaN by metalorganic vapour phase epitaxy

2007 ◽  
Vol 300 (1) ◽  
pp. 104-109 ◽  
Author(s):  
C. Liu ◽  
P.A. Shields ◽  
S. Denchitcharoen ◽  
S. Stepanov ◽  
A. Gott ◽  
...  
Keyword(s):  
Vapour Phase ◽  
Epitaxial Lateral Overgrowth ◽  
Vapour Phase Epitaxy ◽  
Lateral Overgrowth ◽  
Metalorganic Vapour Phase Epitaxy
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