The fabrication of back-gated high electron mobility transistors — a novel approach using MBE regrowth on an in situ ion beam patterned epilayer
1993 ◽
Vol 127
(1-4)
◽
pp. 41-45
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2011 ◽
Vol 29
(3)
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pp. 031204
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2014 ◽
Vol 32
(6)
◽
pp. 061202
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2021 ◽
Vol 9
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pp. 348-352