Properties of Mn-doped p-type InxGa1-xAsyP1-y grown by liquid-phase epitaxy

1982 ◽  
Vol 25 (5) ◽  
pp. 359-365 ◽  
Author(s):  
Shigeo Fujita ◽  
Masaaki Kuzuhara ◽  
Mineto Yagyu ◽  
Akio Sasaki
1980 ◽  
Vol 51 (10) ◽  
pp. 5438 ◽  
Author(s):  
Shigeo Fujita ◽  
S.M. Bedair ◽  
M.A. Littlejohn ◽  
J.R. Hauser

1986 ◽  
Vol 89 ◽  
Author(s):  
S. H. Shin ◽  
J. G. Pasko ◽  
D. S. Lo ◽  
W. E. Tennant ◽  
J. R. Anderson ◽  
...  

AbstractHgMnCdTe/CdTe photodiodes with responsivity cutoffs of up to 1.54 pm have been fabricated by liquid phase epitaxy (LPE). The mesa device structure consists of a boron-implanted mosaic fabricated on a p-type Hg1−x−yMnxCdyTe layer grown on a CdTe substrate. A reverse breakdown voltage (VB) of 50 V and a leakage current density of 1.5 × 10−4 A/cm2 at V = −10 V was measured at room temperature (295K). A 0.75 pF capacitance was also measured under a 5 V reverse bias at room temperature. This device performance based on the quaternary HgMnCdTe shows both theoretical and practical promise of superior performance for wavelengths in the range 1.3 to 1.8 μm for fiber optic applications.


1993 ◽  
Vol 46 (2) ◽  
pp. 317 ◽  
Author(s):  
KSA Butcher ◽  
D Alexiev ◽  
TL Tansley

Measurements of minority carrier diffusion lengths for p-type and n-type GaAs were carried out using an electron beam induced current (EBIC) technique. The GaAs material was grown by liquid phase epitaxy (LPE) at the Australian Nuclear Science and Technology Organisation. The diffusion lengths measured for high purity p-type and n-type LPE-GaAs samples were observed to be longer than any previously reported.


2002 ◽  
Vol 91-92 ◽  
pp. 38-42 ◽  
Author(s):  
K. Zdansky ◽  
O. Prochazkova ◽  
J. Zavadil ◽  
J. Novotny

1998 ◽  
Vol 27 (8) ◽  
pp. 979-984
Author(s):  
Hiroshi Watanabe ◽  
Mitsutake Motozawa ◽  
Ken Suto ◽  
Jun-Ichi Nishizawa

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