A chromium carbide phase with B1 structure in thin films prepared by ion plating

1988 ◽  
Vol 167 (1-2) ◽  
pp. 233-244 ◽  
Author(s):  
K. Bewilogua ◽  
H.-J. Heinitz ◽  
B. Rau ◽  
S. Schulze
Keyword(s):  
Thin Films ◽  
Chromium Carbide ◽  
Carbide Phase ◽  
Ion Plating

Study on Arc Ion Plating Nitride Films of Microscopic Morphology and Micro-Hardness

2011 ◽  
Vol 306-307 ◽  
pp. 274-279
Author(s):  
Qing Tao ◽  
Yan Wei Sui ◽  
Sun Zhi ◽  
Wei Song
Keyword(s):  
Thin Films ◽  
Steel Substrate ◽  
Nitride Film ◽  
Composition Analysis ◽  
Micro Hardness ◽  
Arc Ion Plating ◽  
Ion Plating ◽  
Tin Thin Films ◽  
Research Procedure ◽  
Microscopic Morphology

AlN and TiN thin films are widely used in electronic devices and acoustic material and other fields because of its unique merit, the preparation of nitride thin films by using the arc ion plating has not been a systematic and deep study. The article presents our research procedure which the AlN and TiN thin films are deposited on stainless steel substrate by arc ion plating (AIP). The characteristics of thin films, for example microstructure, morphology, composition analysis and hardness, are examined and analyzed. The results showed that: Droplet-like particles appear in the microstructure of nitride thin films, and the grain size of droplet-like particles in AlN thin films is greater than in TiN thin films. The micro-hardness of nitride films preparation in experiment has improved significantly, and establish firmly basic for extending the application field of nitride film.

scholarly journals Preparation of Supersaturated Fe-In Alloy Thin Films by Ion-Plating Process

2013 ◽  
Vol 77 (5) ◽  
pp. 174-176 ◽  
Author(s):  
Mao Amano ◽  
Yumiko Ezaki ◽  
Kadek Fendy Sutrisna ◽  
Yoshihito Matsumura
Keyword(s):  
Thin Films ◽  
Ion Plating

Doping properties of ZnO thin films for photovoltaic devices grown by URT-IP (ion plating) method

2004 ◽  
Vol 451-452 ◽  
pp. 219-223 ◽  
Author(s):  
K. Iwata ◽  
T. Sakemi ◽  
A. Yamada ◽  
P. Fons ◽  
K. Awai ◽  
...  
Keyword(s):  
Thin Films ◽  
Zno Thin Films ◽  
Photovoltaic Devices ◽  
Ion Plating ◽  
Plating Method

scholarly journals Preparation of Aluminum Nitride Thin Films by RF Reactive Ion Plating.

Shinku ◽  
2004 ◽  
Vol 47 (6) ◽  
pp. 452-456
Author(s):  
Hiroshi OKANO ◽  
Tomohiro MASUDA ◽  
Akihiro MICHIHISA ◽  
Koji HASEGAWA
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
Ion Plating

scholarly journals Microstructure Analysis Of Thin Films Deposited By Reactive Evaporation And By Reactive Ion-Plating

1989 ◽  
Author(s):  
Karl H. Guenther ◽  
Boon Loo ◽  
David Burns ◽  
Jo Edgell ◽  
Debbie Windham ◽  
...  
Keyword(s):  
Thin Films ◽  
Microstructure Analysis ◽  
Ion Plating ◽  
Reactive Evaporation

Deposition of transparent conducting indium tin oxide thin films by reactive ion plating

1984 ◽  
Vol 115 (3) ◽  
pp. 195-201 ◽  
Author(s):  
Cui Yuanri ◽  
Xu Xinghao ◽  
Jin Zhaoting ◽  
Peng Chuancai ◽  
Xie Shuyun
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Thin Films ◽  
Ion Plating ◽  
Transparent Conducting

Magnetic Properties of Ferromagnetic Thin Films Prepared by Ion Plating

1977 ◽  
Vol 16 (2) ◽  
pp. 259-265 ◽  
Author(s):  
Masatoshi Takao ◽  
Yoshifumi Ohta ◽  
Akira Tasaki
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Ion Plating ◽  
Ferromagnetic Thin Films

Effect of pulsed bias on TiO2 thin films prepared on silicon by arc ion plating and simulation of pulsed plasma sheath dynamics

2012 ◽  
Vol 521 ◽  
pp. 7-11
Author(s):  
Min Zhang ◽  
Lei Liu ◽  
Xiaoxu Yang ◽  
Feifei Xu ◽  
Guoqiang Lin ◽  
...  
Keyword(s):  
Thin Films ◽  
Plasma Sheath ◽  
Pulsed Plasma ◽  
Tio2 Thin Films ◽  
Arc Ion Plating ◽  
Ion Plating

scholarly journals Preparation of Supersaturated Fe–In Alloy Thin Films by Ion-Plating Process

2014 ◽  
Vol 55 (9) ◽  
pp. 1471-1473
Author(s):  
Mao Amano ◽  
Yumiko Ezaki ◽  
Kadek Fendy Sutrisna ◽  
Yoshihito Matsumura
Keyword(s):  
Thin Films ◽  
Ion Plating
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