Doping of rf plasma deposited diamond-like carbon films

1995 ◽  
Vol 270 (1-2) ◽  
pp. 194-199 ◽  
Author(s):  
S.R.P. Silva ◽  
G.A.J. Amaratunga
Keyword(s):  
Carbon Films ◽  
Rf Plasma ◽  
Diamond Like Carbon

Diamond-like carbon films from CO source gas by RF plasma CVD method

2014 ◽  
Vol 54 (1S) ◽  
pp. 01AD04 ◽  
Author(s):  
Yuki Yasuoka ◽  
Toru Harigai ◽  
Jun-Seok Oh ◽  
Hiroshi Furuta ◽  
Akimitsu Hatta ◽  
...  
Keyword(s):  
Carbon Films ◽  
Rf Plasma ◽  
Diamond Like Carbon ◽  
Plasma Cvd ◽  
Cvd Method

scholarly journals Evidence of Carboxyl Modification of Hydrogen-Free Diamond-Like Carbon Films Assisted by Radio Frequency Plasma in Vacuum

2012 ◽  
Vol 2012 ◽  
pp. 1-6 ◽  
Author(s):  
Yuqi Xue ◽  
Zixin Wang ◽  
Jun Wang ◽  
Changji Hu ◽  
Fangyan Xie ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Carbon Films ◽  
Rf Plasma ◽  
Diamond Like Carbon ◽  
Spectra Analysis ◽  
Force Microscopy ◽  
Atomic Force ◽  
Frequency Plasma ◽  
Ft Ir

Modification of hydrogen-free diamond-like carbon (DLC) is presented, with acrylic acid (AA) vapor carried into a vacuum chamber by argon and with the in situ assistance of low-power radio frequency (RF) plasma at a temperature below 100°C. Measured by atomic force microscopy (AFM) technique, the roughness (Ra) of the DLC was 1.063±0.040 nm. XPS and FT-IR spectra analysis showed that carboxyl groups were immobilized on the surface of the DLC films, with about 40% of carboxyl group area coverage. It was found that the RF plasma and reaction time are important in enhancing the modification rate and efficiency.

Diamond-like carbon films prepared by rf plasma deposition

Vacuum ◽  
1990 ◽  
Vol 41 (4-6) ◽  
pp. 1360-1363 ◽  
Author(s):  
X.-D. Pan ◽  
E.A. Maydell ◽  
R.H. Milne ◽  
D.J. Fabian
Keyword(s):  
Plasma Deposition ◽  
Carbon Films ◽  
Rf Plasma ◽  
Diamond Like Carbon

Substrate Effect on the Diamond-Like Carbon Films Synthesized by RF Plasma Enhanced Chemical Vapor Deposition

2007 ◽  
Vol 539-543 ◽  
pp. 3574-3579 ◽  
Author(s):  
S.S. Tzeng ◽  
Wei Min Wu ◽  
J.S. Hsu
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
The Self ◽  
Rf Plasma ◽  
Diamond Like Carbon ◽  
Working Pressure ◽  
Glass Substrates ◽  
Self Bias

Diamond-like carbon (DLC) films were synthesized by RF plasma enhanced chemical vapor deposition using methane as carbon source. Effect of substrate on the growth of DLC films was investigated by using four different substrate materials, silicon wafer (100), glass, flat-polished and mirror-polished alumina. The carbon films were deposited at four different self-bias voltages (-157 V, -403 V, -500 V and -590 V) by changing the plasma power under fixed flow rate and working pressure. Raman analyses indicated that DLC films were deposited on silicon and glass substrates at the self-bias -403 V ~ -590 V, and polymer-like carbon films were obtained at -157 V. For the alumina substrates, different Raman results were observed for flat-polished and mirror-polished alumina substrates. The hardness of DLC films, deposited on silicon and glass substrates at the self-bias -403 V ~ -590 V, was within 16~20 GPa using nanoindentation technique.

Investigation of diamond-like carbon films synthesized by multi-jet hollow cathode rf plasma source

2002 ◽  
Vol 406 (1-2) ◽  
pp. 275-281 ◽  
Author(s):  
G. Fedosenko ◽  
D. Korzec ◽  
J. Engemann ◽  
D. Lyebyedyev ◽  
H.-C. Scheer
Keyword(s):  
Hollow Cathode ◽  
Plasma Source ◽  
Carbon Films ◽  
Rf Plasma ◽  
Diamond Like Carbon
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