Ion-beam deposition of Zr-Al multilayers and their structural properties

1992 ◽  
Vol 54-55 ◽  
pp. 335-337
Author(s):  
S Qadri
2011 ◽  
Vol 695 ◽  
pp. 598-601
Author(s):  
Gasidit Panomsuwan ◽  
Nagahiro Saito ◽  
Osamu Takai

Superlattice structure of SrTiO3and Nb-doped SrTiO3have been epitaxially grown on atomically flat surface of LaAlO3substrates by ion beam deposition method. Epitaxial superlattices were grown at 800 °C in the presence of partial oxygen pressure under optimizing growth conditions. The Nb-doped SrTiO3layers were varied from 2 to 15 unit cell thickness approximately, while SrTiO3layers are maintained at 15 unit cell thickness with 10 periods. The superlattices with various Nb-doped SrTiO3layer thicknesses were investigated using X-ray diffractometer (XRD) and atomic force microscope (AFM), in order to clearly understand structural properties and surface structure, which are significant for fabrication of the high quality superlattice structure.


1992 ◽  
Vol 54-55 ◽  
pp. 335-337 ◽  
Author(s):  
S.B. Qadri ◽  
C. Kim ◽  
M. Twigg ◽  
D. Moon

Author(s):  
J. Kulik ◽  
Y. Lifshitz ◽  
G.D. Lempert ◽  
S. Rotter ◽  
J.W. Rabalais ◽  
...  

Carbon thin films with diamond-like properties have generated significant interest in condensed matter science in recent years. Their extreme hardness combined with insulating electronic characteristics and high thermal conductivity make them attractive for a variety of uses including abrasion resistant coatings and applications in electronic devices. Understanding the growth and structure of such films is therefore of technological interest as well as a goal of basic physics and chemistry research. Recent investigations have demonstrated the usefulness of energetic ion beam deposition in the preparation of such films. We have begun an electron microscopy investigation into the microstructure and electron energy loss spectra of diamond like carbon thin films prepared by energetic ion beam deposition.The carbon films were deposited using the MEIRA ion beam facility at the Soreq Nuclear Research Center in Yavne, Israel. Mass selected C+ beams in the range 50 to 300 eV were directed onto Si {100} which had been etched with HF prior to deposition.


1995 ◽  
Vol 31 (6) ◽  
pp. 2694-2696 ◽  
Author(s):  
M. Tan ◽  
S.-I. Tan ◽  
Yong Shen

2004 ◽  
Vol 85 (9) ◽  
pp. 1595-1597 ◽  
Author(s):  
Jae Kwon Kim ◽  
Kyu Man Cha ◽  
Jung Hyun Kang ◽  
Yong Kim ◽  
Jae-Yel Yi ◽  
...  

2008 ◽  
Vol 516 (23) ◽  
pp. 8604-8608 ◽  
Author(s):  
C. Bundesmann ◽  
I.-M. Eichentopf ◽  
S. Mändl ◽  
H. Neumann

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