Ion bombardment of AlN films deposited in a reactive sputtering process with accurate control of the mass flow of the reactive gas
1992 ◽
Vol 51
(1-3)
◽
pp. 500-508
◽
Keyword(s):
2007 ◽
Vol 201
(18)
◽
pp. 7727-7732
◽
1999 ◽
Vol 112
(1-3)
◽
pp. 221-225
◽
1999 ◽
Vol 113
(1-2)
◽
pp. 134-139
◽
1985 ◽
Vol 130
(3-4)
◽
pp. 307-313
◽
1999 ◽
Vol 38
(Part 1, No. 7B)
◽
pp. 4515-4519
◽