The nitrogen concentration effect on Ce doped SiOxNy emission: towards optimized Ce3+ for LED applications

The process of the removal of oxide ion admixtures by the action of CCl4 vapor (carbochlorination) from chloride melts of KCl–NaCl (0.5 : 0.5), BaCl2–KCl (0.26 : 0.74) and KCl–LiCl (0.41 : 0.59) was studied by a potentiometric method.

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Reactive Laser–Sputtering for Amorphous Silicon Films

MRS Proceedings ◽

10.1557/proc-4-559 ◽

1981 ◽

Vol 4 ◽

Cited By ~ 1

Author(s):

M. Hanabusa ◽

M. Suzuki

Keyword(s):

Amorphous Silicon ◽

Laser Pulses ◽

Spectroscopic Technique ◽

Silicon Films ◽

Atomic Vapor ◽

Reactive Deposition ◽

Target Spot ◽

Silicon Target ◽

Gas Atmosphere ◽

Reactive Gas

ABSTRACTIntense, Q-switched Nd:YAG laser pulses were used to vaporize a silicon target. The pulsed atomic vapor generated produces amorphous silicon films at unusually fast accumulation speeds of 106 Å/s. Despite this speed, reactive deposition is made possible simply by evaporating in a reactive gas atmosphere. For instance, hydrogenated films have been produced by evaporating in hydrogen. Atomic hydrogen generated by thermal decomposition at a laserirradiated target spot is responsible for hydrogenation. Dynamics of this laser-induced deposition have been studied by a spectroscopic technique.

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Reactive sputtering of TiOxNy coatings by the reactive gas pulsing process

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2007.03.021 ◽

2007 ◽

Vol 201 (18) ◽

pp. 7727-7732 ◽

Cited By ~ 16

Author(s):

N. Martin ◽

J. Lintymer ◽

J. Gavoille ◽

J.M. Chappé ◽

F. Sthal ◽

...

Keyword(s):

Reactive Sputtering ◽

Reactive Gas

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Development of a three-electrode-lens drift tube for time-of-flight mass spectrometry

Journal of Synchrotron Radiation ◽

10.1107/s0909049597019390 ◽

1998 ◽

Vol 5 (3) ◽

pp. 612-614

Author(s):

Hitoshi Sakamoto ◽

Yuji Takakuwa ◽

Toyokazu Hori ◽

Yoshiharu Enta ◽

Hiroo Kato ◽

...

Keyword(s):

Mass Spectrometry ◽

Drift Tube ◽

Detection Efficiency ◽

Time Of Flight ◽

Flight Mass Spectrometry ◽

Gas Atmosphere ◽

High Detection ◽

High Detection Efficiency ◽

Tof Ms ◽

Reactive Gas

A three-electrode-lens drift tube for time-of-flight mass spectrometry (TOF-MS) has been developed for utilizing a detector to observe photon-stimulated desorption (PSD). In spite of a small detection area, the detector has a high detection efficiency and durability to reactive gas atmosphere at high pressure. The TOF-MS performance of the drift tube was examined for PSD using single-bunch-mode synchrotron radiation on a dichlorosilane (SiH2Cl2)-saturated Si(001) surface. The measured acceleration and focusing-voltage dependences of the time of flight, intensity and full width at half-maximum for the peak of H+ and Cl+ PSD ions are discussed in terms of the numerical calculations of ion trajectories and focusing characteristic of the drift tube.

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Effect of oxygen and nitrogen concentration of nitrogen doped TiOx film as photocatalyst prepared by reactive sputtering

Applied Catalysis A General ◽

10.1016/j.apcata.2009.10.011 ◽

2009 ◽

Vol 371 (1-2) ◽

pp. 179-190 ◽

Cited By ~ 31

Author(s):

Seon-Hong Lee ◽

Eiji Yamasue ◽

Hideyuki Okumura ◽

Keiichi N. Ishihara

Keyword(s):

Nitrogen Concentration ◽

Reactive Sputtering ◽

Nitrogen Doped ◽

Effect Of Oxygen

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Hysteresis effect during reactive sputtering

Journal of Physics Conference Series ◽

10.1088/1742-6596/2059/1/012021 ◽

2021 ◽

Vol 2059 (1) ◽

pp. 012021

Author(s):

V I Shapovalov

Keyword(s):

Reactive Sputtering ◽

Target Area ◽

Algebraic Equations ◽

Metal Target ◽

Sticking Coefficient ◽

Physicochemical Models ◽

Tantalum Target ◽

The Comparative Study ◽

Reactive Gas ◽

Sputtering System

Abstract In this work, we studied the effect of constant parameters of the sputtering system on the width of the hysteresis loop during reactive sputtering. The sticking coefficient of the reactive gas to the surface, the chamber pumping speed, the target area, etc. are taken as parameters. The comparative study was carried out by numerical solution of systems of algebraic equations describing the chemisorption and physicochemical models of metal target reactive sputtering in a single reactive gas. The calculations were performed for sputtering a tantalum target in an Ar + O2 mixture. The studied dependences were non-linear in all cases.

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