Analytical Treatment of Phonon Transport in Thin Films

Author(s):  
Bekir Sami Yilbas ◽  
Saad Bin Mansoor ◽  
Haider Ali
2016 ◽  
Vol 503 ◽  
pp. 130-140 ◽  
Author(s):  
Saad B. Mansoor ◽  
Bekir S. Yilbas

2012 ◽  
Vol 26 (17) ◽  
pp. 1250104 ◽  
Author(s):  
B. S. YILBAS ◽  
S. BIN MANSOOR

Phonon transport in two-dimensional silicon and aluminum films is investigated. The frequency dependent solution of Boltzmann transport equation is obtained numerically to account for the acoustic and optical phonon branches. The influence of film size on equivalent equilibrium temperature distribution in silicon and aluminum films is presented. It is found that increasing film width influences phonon transport in the film; in which case, the difference between the equivalent equilibrium temperature due to silicon and diamond films becomes smaller for wider films than that of the thinner films.


2014 ◽  
Vol 4 (1) ◽  
Author(s):  
Xinjiang Wang ◽  
Baoling Huang

Abstract We have systematically investigated the in-plane thermal transport in Si thin films using an approach based on the first-principles calculations and lattice dynamics. The effects of phonon mode depletion induced by the phonon confinement and the corresponding variation in interphonon scattering, which may be important for the thermal conductivities of ultra-thin films but are often neglected in precedent studies, are considered in this study. The in-plane thermal conductivities of Si thin films with different thicknesses have been predicted over a temperature range from 80 K to 800 K and excellent agreements with experimental results are found. The validities of adopting the bulk phonon properties and gray approximation of surface specularity in thin film studies have been clarified. It is found that in ultra-thin films, while the phonon depletion will reduce the thermal conductivity of Si thin films, its effect is largely offset by the reduction in the interphonon scattering rate. The contributions of different phonon modes to the thermal transport and isotope effects in Si films with different thicknesses under various temperatures are also analyzed.


Author(s):  
Joseph E. Turney ◽  
A. J. H. McGaughey ◽  
C. H. Amon

Phonon transport in argon and silicon thin films is examined using harmonic lattice dynamics theory and the Lennard-Jones and Stillinger-Weber potentials. Film thicknesses ranging from 0.8 to 33.5 nm for argon and 0.4 to 8.6 nm for silicon are examined at a temperature of 0 K. Both reconstructed films and films built using the bulk unit cell are considered. Phonon dispersion curves for the in-plane direction and the density of states are computed from lattice dynamics and compared to predictions for a bulk system. The results from the lattice dynamics calculations are used to predict the thermal conductivities of the bulk and thin film structures.


2012 ◽  
Vol 134 (5) ◽  
Author(s):  
Mitsuhiro Matsumoto ◽  
Masaya Okano ◽  
Yusuke Masao

Analysis of phonon dynamics based on a linearized Boltzmann transport equation is widely used for thermal analysis of solid thin films, but couplings among various phonon modes appear in some situations. We propose a direct simulation Monte Carlo (DSMC) scheme to simulate the phonon gas starting without the conventional linearization approximation. This requires no relaxation time as an input parameter, and we can investigate the couplings among phonons with different modes. A prototype code based on a simple phonon model was developed, and energy flux was evaluated for thin films of various thickness as a test calculation.


2006 ◽  
Vol 128 (2) ◽  
pp. 115-124 ◽  
Author(s):  
Rodrigo Escobar ◽  
Brian Smith ◽  
Cristina Amon

Numerical simulations of time-dependent energy transport in semiconductor thin films are performed using the lattice Boltzmann method applied to phonon transport. The discrete lattice Boltzmann method is derived from the continuous Boltzmann transport equation assuming first gray dispersion and then nonlinear, frequency-dependent phonon dispersion for acoustic and optical phonons. Results indicate that a transition from diffusive to ballistic energy transport is found as the characteristic length of the system becomes comparable to the phonon mean free path. The methodology is used in representative microelectronics applications covering both crystalline and amorphous materials including silicon thin films and nanoporous silica dielectrics. Size-dependent thermal conductivity values are also computed based on steady-state temperature distributions obtained from the numerical models. For each case, reducing feature size into the subcontinuum regime decreases the thermal conductivity when compared to bulk values. Overall, simulations that consider phonon dispersion yield results more consistent with experimental correlations.


2008 ◽  
Vol 130 (7) ◽  
Author(s):  
Jaona Randrianalisoa ◽  
Dominique Baillis

Heat conduction in submicron crystalline materials can be well modeled by the Boltzmann transport equation (BTE). The Monte Carlo method is effective in computing the solution of the BTE. These past years, transient Monte Carlo simulations have been developed, but they are generally memory demanding. This paper presents an alternative Monte Carlo method for analyzing heat conduction in such materials. The numerical scheme is derived from past Monte Carlo algorithms for steady-state radiative heat transfer and enables us to understand well the steady-state nature of phonon transport. Moreover, this algorithm is not memory demanding and uses very few iteration to achieve convergence. It could be computationally more advantageous than transient Monte Carlo approaches in certain cases. Similar to the famous Mazumder and Majumdar’s transient algorithm (2001, “Monte Carlo Study of Phonon Transport in Solid Thin Films Including Dispersion and Polarization,” ASME J. Heat Transfer, 123, pp. 749–759), the dual polarizations of phonon propagation, the nonlinear dispersion relationships, the transition between the two polarization branches, and the nongray treatment of phonon relaxation times are accounted for. Scatterings by different mechanisms are treated individually, and the creation and/or destruction of phonons due to scattering is implicitly taken into account. The proposed method successfully predicts exact solutions of phonon transport across a gallium arsenide film in the ballistic regime and that across a silicon film in the diffusion regime. Its capability to model the phonon scattering by boundaries and impurities on the phonon transport has been verified. The current simulations agree well with the previous predictions and the measurement of thermal conductivity along silicon thin films and along silicon nanowires of widths greater than 22nm. This study confirms that the dispersion curves and relaxation times of bulk silicon are not appropriate to model phonon propagation along silicon nanowires of 22nm width.


2010 ◽  
Vol 108 (11) ◽  
pp. 113524 ◽  
Author(s):  
D. P. Sellan ◽  
J. E. Turney ◽  
A. J. H. McGaughey ◽  
C. H. Amon
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