Effect of Constriction on Phonon Transport in Silicon Thin Films and Nanowires

Smart Science ◽  
2016 ◽  
Vol 4 (4) ◽  
pp. 173-179 ◽  
Author(s):  
Jay Dulhani ◽  
Bong Jae Lee
Author(s):  
Joseph E. Turney ◽  
A. J. H. McGaughey ◽  
C. H. Amon

Phonon transport in argon and silicon thin films is examined using harmonic lattice dynamics theory and the Lennard-Jones and Stillinger-Weber potentials. Film thicknesses ranging from 0.8 to 33.5 nm for argon and 0.4 to 8.6 nm for silicon are examined at a temperature of 0 K. Both reconstructed films and films built using the bulk unit cell are considered. Phonon dispersion curves for the in-plane direction and the density of states are computed from lattice dynamics and compared to predictions for a bulk system. The results from the lattice dynamics calculations are used to predict the thermal conductivities of the bulk and thin film structures.


2001 ◽  
Vol 123 (4) ◽  
pp. 749-759 ◽  
Author(s):  
Sandip Mazumder ◽  
Arunava Majumdar

The Boltzmann Transport Equation (BTE) for phonons best describes the heat flow in solid nonmetallic thin films. The BTE, in its most general form, however, is difficult to solve analytically or even numerically using deterministic approaches. Past research has enabled its solution by neglecting important effects such as dispersion and interactions between the longitudinal and transverse polarizations of phonon propagation. In this article, a comprehensive Monte Carlo solution technique of the BTE is presented. The method accounts for dual polarizations of phonon propagation, and non-linear dispersion relationships. Scattering by various mechanisms is treated individually. Transition between the two polarization branches, and creation and destruction of phonons due to scattering is taken into account. The code has been verified and evaluated by close examination of its ability or failure to capture various regimes of phonon transport ranging from diffusive to the ballistic limit. Validation results show close agreement with experimental data for silicon thin films with and without doping. Simulation results show that above 100 K, transverse acoustic phonons are the primary carriers of energy in silicon.


Author(s):  
Bruce L. Davis ◽  
Mehmet Su ◽  
Ihab El-Kady ◽  
Mahmoud I. Hussein

Thin films composed of dielectric materials are attracting growing interest in the solid state physics and nanoscale heat transfer communities. This is primarily due to their unique thermal and electronic properties and their extensive use as components in optoelectronic, and potentially in thermoelectric, devices. In this paper, an elaborate study is presented on silicon thin films ranging from a few nanometers in thickness to very thick bulk-like thicknesses. Full lattice dynamics calculations are performed incorporating the entire film cross section and the relaxation of the free surfaces. The phonon properties emerging from these calculations are then incorporated into Holland-Callaway models to predict the thermal conductivity and other phonon transport properties. A rigorous curve fitting process to a limited set of available experimental data is carried out to obtain the scattering lifetimes. Our results demonstrate the importance of proper consideration of the full thin-film dispersion description and provide insights into the relationship between thermal conductivity, film thickness and temperature.


2015 ◽  
Vol 92 (13) ◽  
Author(s):  
Weiyu Chen ◽  
Juekuan Yang ◽  
Zhiyong Wei ◽  
Chenhan Liu ◽  
Kedong Bi ◽  
...  

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Takuma Hori

AbstractThe method to optimize nanostructures of silicon thin films as thermoelectric materials is developed. The simulated annealing method is utilized for predicting the optimized structure. The mean free path and thermal conductivity of thin films, which are the objective function of optimization, is evaluated by using phonon transport simulations and lattice dynamics calculations. In small systems composed of square lattices, the simulated annealing method successfully predicts optimized structure corroborated by an exhaustive search. This fact indicates that the simulated annealing method is an effective tool for optimizing nanostructured thin films as thermoelectric materials.


Author(s):  
R. M. Anderson

Aluminum-copper-silicon thin films have been considered as an interconnection metallurgy for integrated circuit applications. Various schemes have been proposed to incorporate small percent-ages of silicon into films that typically contain two to five percent copper. We undertook a study of the total effect of silicon on the aluminum copper film as revealed by transmission electron microscopy, scanning electron microscopy, x-ray diffraction and ion microprobe techniques as a function of the various deposition methods.X-ray investigations noted a change in solid solution concentration as a function of Si content before and after heat-treatment. The amount of solid solution in the Al increased with heat-treatment for films with ≥2% silicon and decreased for films <2% silicon.


1998 ◽  
Vol 536 ◽  
Author(s):  
A. B. Pevtsov ◽  
N. A. Feoktistov ◽  
V. G. Golubev

AbstractThin (<1000 Å) hydrogenated nanocrystalline silicon films are widely used in solar cells, light emitting diodes, and spatial light modulators. In this work the conductivity of doped and undoped amorphous-nanocrystalline silicon thin films is studied as a function of film thickness: a giant anisotropy of conductivity is established. The longitudinal conductivity decreases dramatically (by a factor of 109 − 1010) as the layer thickness is reduced from 1500 Å to 200 Å, while the transverse conductivity remains close to that of a doped a- Si:H. The data obtained are interpreted in terms of the percolation theory.


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