Structure and gas-barrier properties of amorphous hydrogenated carbon films deposited on inner walls of cylindrical polyethylene terephthalate by plasma-enhanced chemical vapor deposition

2009 ◽  
Vol 255 (7) ◽  
pp. 3983-3988 ◽  
Author(s):  
Jing Li ◽  
Chunzhi Gong ◽  
Xiubo Tian ◽  
Shiqin Yang ◽  
Ricky K.Y. Fu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Polyethylene Terephthalate ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Barrier Properties ◽  
Carbon Films ◽  
Gas Barrier ◽  
Amorphous Hydrogenated Carbon ◽  
Gas Barrier Properties

Mechanical and Gas Barrier Properties of Poly(L-Lactic Acid) by Plasma-Enhanced Chemical Vapor Deposition of SiOx

2017 ◽  
Vol 57 (6) ◽  
pp. 581-590 ◽  
Author(s):  
Shuxin Song ◽  
Yu Wang ◽  
Min Liang ◽  
Xiaojing Qi ◽  
Jinjun Yang ◽  
...  
Keyword(s):  
Lactic Acid ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Barrier Properties ◽  
Gas Barrier ◽  
Gas Barrier Properties

Morphology and gas barrier properties of thin SiOxcoatings on polycarbonate: Correlations with plasma-enhanced chemical vapor deposition conditions

2000 ◽  
Vol 15 (3) ◽  
pp. 704-717 ◽  
Author(s):  
Ahmet G. Erlat ◽  
Bo-Chy Wang ◽  
Richard J. Spontak ◽  
Yelena Tropsha ◽  
Kevin D. Mar ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Food Packaging ◽  
Chemical Vapor ◽  
Barrier Properties ◽  
High Fracture Toughness ◽  
High Fracture ◽  
Gas Barrier ◽  
Gas Barrier Properties ◽  
Deposition Conditions

Plasma-enhanced chemical vapor deposition of SiOx coatings on thermoplastics provides a viable route for production of transparent composite materials with high fracture toughness and high gas barrier properties, which are important considerations in the food packaging and biomedical device industries. By examining several series of systematically varied SiOx/polycarbonate composites, we have identified design correlations between coating characteristics (thickness, density, surface roughness, and O2 transmission) and deposition conditions (time, power, pressure, and flow rates). Of particular interest is the observation that the thermal activation energy for O2 permeation through these composites increases (by up to 17 kJ/mol) as their barrier efficacy increases.

scholarly journals Plasma-Enhanced Chemical Vapor Deposition of Indene for Gas Separation Membrane

2019 ◽  
Vol 19 (1) ◽  
pp. 47 ◽  
Author(s):  
Myat Kyaw ◽  
Shinsuki Mori ◽  
Nathaniel Dugos ◽  
Susan Roces ◽  
Arnel Beltran ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Barrier Properties ◽  
Gas Barrier ◽  
Membrane Performance ◽  
Membrane Characterization ◽  
Separation Membrane ◽  
Zeolite 5A ◽  
Ft Ir

Polyindene (PIn) membrane was fabricated onto a zeolite 5A substrate by using plasma-enhanced chemical vapor deposition (PECVD) at low temperature. Membrane characterization was done by taking Scanning Electron Microscopy (SEM) and FT-IR measurements and the new peak was found in the plasma-derived PIn film. Membrane performance was analyzed by checking permeability of pure gases (H2, N2, and CO2) through the membrane. PECVD-derived PIn membrane showed high gas barrier properties and selectivities of 8.2 and 4.0 for H2/CO2 and H2/N2, respectively, at room temperature

Deposition and Etching of Amorphous Carbon Films Prepared by ECR-Plasma-Enhanced Benzene Chemical Vapor Deposition

1998 ◽  
Vol 555 ◽  
Author(s):  
Xiao-Hua Chen ◽  
Laren M. Tolbert ◽  
Z. Y. Ning ◽  
Dennis W. Hess
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Electron Cyclotron Resonance ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Benzene Vapor ◽  
Plasma Etch ◽  
Ecr Plasma ◽  
Amorphous Hydrogenated Carbon

AbstractAmorphous hydrogenated carbon thin films have been deposited from benzene vapor in a microwave electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition (CVD) system. Plasma enhanced dissociation and reaction of benzene were monitored by mass spectrometry. Deposited films were characterized by Fourier transform infrared spectroscopy and fluorescence spectroscopy. The effect of the deposition rate on the film density and plasma etch resistance was also studied. The etch resistance of deposited carbon film is higher than the conventional resist Novolac.

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