Structural and gas barrier properties of hydrogenated silicon nitride thin films prepared by roll-to-roll microwave plasma-enhanced chemical vapor deposition

Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110167
Author(s):  
Seong-Keun Cho ◽  
Tae-Yeon Cho ◽  
Won Jae Lee ◽  
Juwhan Ryu ◽  
Jae Heung Lee
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Barrier Properties ◽  
Gas Barrier ◽  
Hydrogenated Silicon ◽  
Roll To Roll ◽  
Gas Barrier Properties

Morphology and gas barrier properties of thin SiOxcoatings on polycarbonate: Correlations with plasma-enhanced chemical vapor deposition conditions

2000 ◽  
Vol 15 (3) ◽  
pp. 704-717 ◽  
Author(s):  
Ahmet G. Erlat ◽  
Bo-Chy Wang ◽  
Richard J. Spontak ◽  
Yelena Tropsha ◽  
Kevin D. Mar ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Food Packaging ◽  
Chemical Vapor ◽  
Barrier Properties ◽  
High Fracture Toughness ◽  
High Fracture ◽  
Gas Barrier ◽  
Gas Barrier Properties ◽  
Deposition Conditions

Plasma-enhanced chemical vapor deposition of SiOx coatings on thermoplastics provides a viable route for production of transparent composite materials with high fracture toughness and high gas barrier properties, which are important considerations in the food packaging and biomedical device industries. By examining several series of systematically varied SiOx/polycarbonate composites, we have identified design correlations between coating characteristics (thickness, density, surface roughness, and O2 transmission) and deposition conditions (time, power, pressure, and flow rates). Of particular interest is the observation that the thermal activation energy for O2 permeation through these composites increases (by up to 17 kJ/mol) as their barrier efficacy increases.

Preparation of Magnesia Stabilized Zirconia Thin Films for Solid Oxide Fuel Cell by Microwave Plasma Chemical Vapor Deposition.

Shinku ◽  
1997 ◽  
Vol 40 (8) ◽  
pp. 660-663
Author(s):  
Hideo OKAYAMA ◽  
Tsukasa KUBO ◽  
Noritaka MOCHIZUKI ◽  
Akiyoshi NAGATA ◽  
Hiromu ISA
Keyword(s):  
Thin Films ◽  
Fuel Cell ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Solid Oxide ◽  
Oxide Fuel ◽  
Stabilized Zirconia ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

Formation of Nitrogen-Vacancy Centers in Homoepitaxial Diamond Thin Films Grown via Microwave Plasma-Assisted Chemical Vapor Deposition

2016 ◽  
Vol 15 (4) ◽  
pp. 614-618 ◽  
Author(s):  
Hideyuki Watanabe ◽  
Hitoshi Umezawa ◽  
Toyofumi Ishikawa ◽  
Kazuki Kaneko ◽  
Shinichi Shikata ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Nitrogen Vacancy ◽  
Nitrogen Vacancy Centers ◽  
Diamond Thin Films

Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition

2000 ◽  
Vol 9 (7) ◽  
pp. 545-549
Author(s):  
Zhang Yong-ping ◽  
Gu You-song ◽  
Chang Xiang-rong ◽  
Tian Zhong-zhuo ◽  
Shi Dong-xia ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Carbon Nitride ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

scholarly journals Plasma-Enhanced Chemical Vapor Deposition of Indene for Gas Separation Membrane

2019 ◽  
Vol 19 (1) ◽  
pp. 47 ◽  
Author(s):  
Myat Kyaw ◽  
Shinsuki Mori ◽  
Nathaniel Dugos ◽  
Susan Roces ◽  
Arnel Beltran ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Barrier Properties ◽  
Gas Barrier ◽  
Membrane Performance ◽  
Membrane Characterization ◽  
Separation Membrane ◽  
Zeolite 5A ◽  
Ft Ir

Polyindene (PIn) membrane was fabricated onto a zeolite 5A substrate by using plasma-enhanced chemical vapor deposition (PECVD) at low temperature. Membrane characterization was done by taking Scanning Electron Microscopy (SEM) and FT-IR measurements and the new peak was found in the plasma-derived PIn film. Membrane performance was analyzed by checking permeability of pure gases (H2, N2, and CO2) through the membrane. PECVD-derived PIn membrane showed high gas barrier properties and selectivities of 8.2 and 4.0 for H2/CO2 and H2/N2, respectively, at room temperature

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