Field emission characteristics of thin-metal-coated nano-sheet carbon films

2011 ◽  
Vol 257 (7) ◽  
pp. 2455-2460 ◽  
Author(s):  
Guang-Rui Gu ◽  
Toshimichi Ito
Keyword(s):  
Field Emission ◽  
Carbon Films ◽  
Thin Metal ◽  
Emission Characteristics

Field Emission from Carbon Films Deposited by VHF CVD on Different Substrates

1999 ◽  
Vol 558 ◽  
Author(s):  
A.I. Kosarev ◽  
A.S. Abramov ◽  
A.J. Vinogradov ◽  
M.V. Shutov ◽  
T.E. Felter ◽  
...  
Keyword(s):  
Work Function ◽  
Field Emission ◽  
Low Temperatures ◽  
Carbon Films ◽  
Emission Characteristics ◽  
Back Contact ◽  
Contact Material ◽  
Si Substrates

ABSTRACTAs previously demonstrated, non-diamond carbon (NDC) films deposited at low temperatures 200-300 °C on silicon tips reduced the threshold of field emission. In this paper we will present the results of the study of field emission from flat NDC films prepared by VHF CVD. Emission measurements were performed in a diode configuration at approximately 10−10 Torr. NDC films were deposited on ceramic and on c-Si substrates sputter coated with layers of Ti, Cu, Ni and Pt. The back contact material influences the emission characteristics but not as a direct correlation to work function. A model of field emission from metal-NDC film structures will be discussed.

Morphology of Low Temperature Carbon Films Prepared by VHF CVD: Correlation with Field Emission

1998 ◽  
Vol 509 ◽  
Author(s):  
A.N. Titkov ◽  
A.I. Kosarev ◽  
A.J. Vinogradov ◽  
Z. Waqar ◽  
I.V. Makarenko ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Low Temperature ◽  
Field Emission ◽  
Significant Influence ◽  
Substrate Surface ◽  
Carbon Films ◽  
Emission Characteristics ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters

AbstractThe effect of deposition parameters and substrate on the morphology of carbon films prepared in VHF plasma at low temperature has been studied by Atomic Force Microscopy. Carbon films demonstrating superior emission characteristics were the smoothest, but not all of the smoothest films demonstrated good emission. Significant influence of pre-growth treatment of the substrate surface on the emission characteristics of the films was found.

Field emission characteristics of cesiated amorphous carbon films by negative carbon ion

1999 ◽  
Vol 355-356 ◽  
pp. 199-204 ◽  
Author(s):  
Dong Won Han ◽  
Yong Hwan Kim ◽  
Dong Jun Choi ◽  
Eung Joon Chi ◽  
Woo Young Yoon ◽  
...  
Keyword(s):  
Field Emission ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Emission Characteristics ◽  
Amorphous Carbon Films ◽  
Carbon Ion

Field-Emission Characteristics of Hydrogenated Amorphous Carbon Films Prepared by Surface Wave Plasma

2000 ◽  
Vol 39 (Part 2, No. 9A/B) ◽  
pp. L929-L932 ◽  
Author(s):  
Masaaki Nagatsu ◽  
Toru Sano ◽  
Noriharu Takada ◽  
Wang X. Guang ◽  
Takashi Hirao ◽  
...  
Keyword(s):  
Surface Wave ◽  
Field Emission ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Emission Characteristics ◽  
Amorphous Carbon Films ◽  
Hydrogenated Amorphous Carbon ◽  
Hydrogenated Amorphous
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