scholarly journals Effect of in situ annealing on the structural and electrical properties and infrared photodetection of III-Sb on GaAs using interfacial misfit array

2018 ◽  
Vol 427 ◽  
pp. 876-883 ◽  
Author(s):  
Bo Wen Jia ◽  
Kian Hua Tan ◽  
Wan Khai Loke ◽  
Satrio Wicaksono ◽  
Soon Fatt Yoon
2009 ◽  
Vol 194 (1) ◽  
pp. 93-103 ◽  
Author(s):  
A. Trenczek-Zajac ◽  
M. Radecka ◽  
K. Zakrzewska ◽  
A. Brudnik ◽  
E. Kusior ◽  
...  

2006 ◽  
Vol 100 (6) ◽  
pp. 063518 ◽  
Author(s):  
R. J. Westerwaal ◽  
M. Slaman ◽  
C. P. Broedersz ◽  
D. M. Borsa ◽  
B. Dam ◽  
...  

1989 ◽  
Vol 169 ◽  
Author(s):  
G. A. N. Connell ◽  
D. B. Fenner ◽  
D. K. Fork ◽  
J.B. Boyce ◽  
F.A. Ponce ◽  
...  

AbstractYSZ [ (Y2O3)x (ZrO2)1‐x ] buffer‐layers for various compositions, x, and YBCO (Y1Ba2Cu3O7‐δ) films were grown on hydrogen‐terminated Si(100) substrates by laser ablation. The structural and electrical properties of the YBCO are found to depend strongly on x, and to be optimized near x=0.1.


ACS Nano ◽  
2012 ◽  
Vol 6 (11) ◽  
pp. 9567-9573 ◽  
Author(s):  
Mohd Zamri Mohd Yusop ◽  
Pradip Ghosh ◽  
Yazid Yaakob ◽  
Golap Kalita ◽  
Masato Sasase ◽  
...  

2010 ◽  
Vol 96 (21) ◽  
pp. 212901 ◽  
Author(s):  
C. Marchiori ◽  
E. Kiewra ◽  
J. Fompeyrine ◽  
C. Gerl ◽  
C. Rossel ◽  
...  

Author(s):  
F. M. Ross ◽  
R. Hull ◽  
D. Bahnck ◽  
J. C. Bean ◽  
L. J. Peticolas ◽  
...  

We describe an investigation of the electrical properties of interfacial dislocations in strained layer heterostructures. We have been measuring both the structural and electrical characteristics of strained layer p-n junction diodes simultaneously in a transmission electron microscope, enabling us to correlate changes in the electrical characteristics of a device with the formation of dislocations.The presence of dislocations within an electronic device is known to degrade the device performance. This degradation is of increasing significance in the design and processing of novel strained layer devices which may require layer thicknesses above the critical thickness (hc), where it is energetically favourable for the layers to relax by the formation of misfit dislocations at the strained interfaces. In order to quantify how device performance is affected when relaxation occurs we have therefore been investigating the electrical properties of dislocations at the p-n junction in Si/GeSi diodes.


2011 ◽  
Vol 3 (10) ◽  
pp. 1-4 ◽  
Author(s):  
Bushra A Hasan ◽  
◽  
Ghuson H Mohamed ◽  
Amer A Ramadhan

Author(s):  
A. Kareem Dahash Ali ◽  
Nihad Ali Shafeek

This study included the fabrication of    compound (Tl2-xHgxBa2-ySryCa2Cu3O10+δ) in a manner solid state and under hydrostatic pressure ( 8 ton/cm2) and temperature annealing(850°C), and determine the effect of the laser on the structural and electrical properties elements in the compound, and various concentrations of x where (x= 0.1,0.2,0.3 ). Observed by testing the XRD The best ratio of compensation for x is 0.2 as the value of a = b = 5.3899 (A °), c = 36.21 (A °) show that the installation of four-wheel-based type and that the best temperature shift is TC= 142 K  .When you shine a CO2 laser on the models in order to recognize the effect of the laser on these models showed the study of X-ray diffraction of these samples when preparing models with different concentrations of the values ​​of x, the best ratio of compensation is 0.2 which showed an increase in the values ​​of the dimensions of the unit cell a=b = 5.3929 (A °), c = 36.238 (A°). And the best transition temperature after shedding laser is TC=144 K. 


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