The electrophoretic deposition (EPD) of micro/nano-particle manganese zinc ferrite (Mnx
Zn1-xFe2O4) material has been carried out on silicon substrates. EPD is performed in isopropanol
(IPA) solutions containing charging and adhesion agents. The ferrite powders were prepared by
grinding ceramic sintered toroids of a commercial high permeability Mn-Zn ferrite. The ferrite film
has been deposited up to 4μm in thickness in 30 minutes showing good selectivity to silicon
patterned with 250nm thermally grown silicon dioxide. Additionally, selective deposition has been
observed on heavily doped p-type regions in n-type silicon substrates. The deposition process is a
self limiting process with the initial high elerophoretic current declining to 10% of its value in 10
minutes. This result suggests that majority of ferrite deposition occurs in first 10 minutes. The
deposition rate and zeta potential measurements indicate a high particle velocity on the order
5.7x10-3 cm/s with an electric field of 160V/cm generated across the 2 cm electrode spacing. An
amorphous like interfacial layer is observed in as deposited substrates. The scanning electron
micrographs indicate pattern filling and conformal deposition on copper planar micro-inductors
fabricated by chemical mechanical planarization. These results are promising for powder ferrite
material (hard and soft) to be selectively deposited for a wide variety of applications in
microelectronics passive components and in MEM’s based applications
Converse magnetoelectric effects in composites of liquid phase epitaxy grown nickel zinc ferrite films and lead zirconate titanate: Studies on the influence of ferrite film parameters
