Characterization of acid-treated carbon nanotube thin films by means of Raman spectroscopy and field-effect response

2009 ◽  
Vol 476 (4-6) ◽  
pp. 258-261 ◽  
Author(s):  
Zhi-Bin Zhang ◽  
Jiantong Li ◽  
Ana López Cabezas ◽  
Shi-Li Zhang
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Carbon Nanotube ◽  
Field Effect ◽  
Treated Carbon

Broadband Coherent Anti-Stokes Raman Spectroscopy Characterization of Polymer Thin Films

2006 ◽  
Vol 60 (10) ◽  
pp. 1097-1102 ◽  
Author(s):  
Zachary D. Schultz ◽  
Marc C. Gurau ◽  
Lee J. Richter
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Polymer Thin Films ◽  
Anti Stokes

Characterization of Radiation Damage in Carbon Nanotube Field-Effect Transistors

2013 ◽  
Vol 60 (6) ◽  
pp. 4087-4093 ◽  
Author(s):  
S. Ashley Francis ◽  
Cory D. Cress ◽  
John W. McClory ◽  
Elizabeth A. Moore ◽  
James C. Petrosky
Keyword(s):  
Carbon Nanotube ◽  
Radiation Damage ◽  
Field Effect ◽  
Field Effect Transistors

Omcvd Elaboration and Characterization of Silicon Carbide and Carbon-Silicon Carbide Films from Organosilicon Compounds

1992 ◽  
Vol 271 ◽  
Author(s):  
R. Morancho ◽  
A. Reynes ◽  
M'b. Amjoud ◽  
R. Carles
Keyword(s):  
Thin Films ◽  
Silicon Carbide ◽  
Raman Spectroscopy ◽  
Chemical Vapor Deposition ◽  
Thermal Behavior ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organosilicon Compounds ◽  
Carrier Gas

ABSTRACTTwo organosilicon molecules tetraethysilane (TESi) and tetravinylsilane (TVSi) were used to prepare thin films of silicon carbide by chemical vapor deposition (C. V. D.). In each of the molecule, the ratio C/Si = 8, the only difference between TESi and TVSi is the structure of the radicals ethyl (.CH2-CH3) and vinyl (.CH=CH2). This feature induces different thermal behavior and leads to the formation of different materials depending on the nature of the carrier gas He or H2· The decomposition gases are correlated with the material deposited which is investigated by I.R. and Raman spectroscopy. The structure of the starting molecule influences the mechanisms of decomposition and consequently the structure of the material obtained.

Characterization of IrO2 thin films by Raman spectroscopy

1997 ◽  
Vol 301 (1-2) ◽  
pp. 7-11 ◽  
Author(s):  
P.C Liao ◽  
C.S Chen ◽  
W.S Ho ◽  
Y.S Huang ◽  
K.K Tiong
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy
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