Growth of the AlN nano-pillar crystal films by means of a halide chemical vapor deposition under atmospheric pressure

2004 ◽  
Vol 86 (1) ◽  
pp. 74-77 ◽  
Author(s):  
Masayuki Yoshioka ◽  
Naoyuki Takahashi ◽  
Takato Nakamura
2002 ◽  
Vol 12 (5) ◽  
pp. 1573-1576 ◽  
Author(s):  
Naoyuki Takahashi ◽  
Arei Niwa ◽  
Tadashi Takahashi ◽  
Takato Nakamura ◽  
Masayuki Yoshioka ◽  
...  

2003 ◽  
Vol 15 (9) ◽  
pp. 1763-1765 ◽  
Author(s):  
Naoyuki Takahashi ◽  
Yusuke Nakatani ◽  
Takuma Yatomi ◽  
Takato Nakamura

2016 ◽  
Vol 5 (2) ◽  
pp. 56
Author(s):  
Keiji Komatsu ◽  
Pineda Marulanda David Alonso ◽  
Nozomi Kobayashi ◽  
Ikumi Toda ◽  
Shigeo Ohshio ◽  
...  

<p class="1Body">MgO films were epitaxially grown on single crystal MgO substrates by atmospheric-pressure chemical vapor deposition (CVD). Reciprocal lattice mappings and X-ray reflection pole figures were used to evaluate the crystal quality of the synthesized films and their epitaxial relation to their respective substrates. The X-ray diffraction profiles indicated that the substrates were oriented out-of-plane during MgO crystal growth. Subsequent pole figure measurements showed how all the MgO films retained the substrate in-plane orientations by expressing the same pole arrangements. The reciprocal lattice mappings indicated that the whisker film showed a relatively strong streak while the continuous film showed a weak one. Hence, highly crystalline epitaxial MgO thin films were synthesized on single crystal MgO substrates by atmospheric-pressure CVD.</p>


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