Effects of oxygen percentage on the growth of copper oxide thin films by reactive radio frequency sputtering

2013 ◽  
Vol 140 (1) ◽  
pp. 243-248 ◽  
Author(s):  
P.K. Ooi ◽  
S.S. Ng ◽  
M.J. Abdullah ◽  
H. Abu Hassan ◽  
Z. Hassan
Keyword(s):  
Thin Films ◽  
Radio Frequency ◽  
Copper Oxide ◽  
Oxide Thin Films ◽  
Radio Frequency Sputtering ◽  
Oxygen Percentage

Optical characteristics of transparent samarium oxide thin films deposited by the radio-frequency sputtering technique

Pramana ◽  
2016 ◽  
Vol 87 (5) ◽  
Author(s):  
A A ATTA ◽  
M M EL-NAHASS ◽  
KHALED M ELSABAWY ◽  
M M ABD EL-RAHEEM ◽  
A M HASSANIEN ◽  
...  
Keyword(s):  
Thin Films ◽  
Radio Frequency ◽  
Optical Characteristics ◽  
Samarium Oxide ◽  
Oxide Thin Films ◽  
Radio Frequency Sputtering

A statistical parameter study of indium tin oxide thin films deposited by radio-frequency sputtering

2005 ◽  
Vol 476 (1) ◽  
pp. 59-64 ◽  
Author(s):  
Seung-Ik Jun ◽  
Timothy E. McKnight ◽  
Michael L. Simpson ◽  
Philip D. Rack
Keyword(s):  
Thin Films ◽  
Radio Frequency ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Statistical Parameter ◽  
Parameter Study ◽  
Oxide Thin Films ◽  
Radio Frequency Sputtering

Atomic oxygen radio-frequency source and its application to the treatment of mixed valence copper oxide thin films

1992 ◽  
Vol 1 (3) ◽  
pp. 175-178 ◽  
Author(s):  
O Guymont ◽  
E Le Duc ◽  
D Pagnon ◽  
A M Pointu ◽  
M Touzeau ◽  
...  
Keyword(s):  
Thin Films ◽  
Radio Frequency ◽  
Copper Oxide ◽  
Atomic Oxygen ◽  
Mixed Valence ◽  
Oxide Thin Films ◽  
Frequency Source
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