High rate roll-to-roll atmospheric atomic layer deposition of Al 2 O 3 thin films towards gas diffusion barriers on polymers

2014 ◽  
Vol 136 ◽  
pp. 90-94 ◽  
Author(s):  
Kamran Ali ◽  
Kyung-Hyun Choi ◽  
Jeongdai Jo ◽  
Yun Woo Lee
RSC Advances ◽  
2017 ◽  
Vol 7 (10) ◽  
pp. 5601-5609 ◽  
Author(s):  
Kwan Hyuck Yoon ◽  
Hongbum Kim ◽  
Yong-Eun Koo Lee ◽  
Nabeen K. Shrestha ◽  
Myung Mo Sung

We present UV-ALD as a promising approach to fabricate effective gas-diffusion barrier thin films at low deposition temperature (40 °C).


2006 ◽  
Vol 89 (3) ◽  
pp. 031915 ◽  
Author(s):  
P. F. Carcia ◽  
R. S. McLean ◽  
M. H. Reilly ◽  
M. D. Groner ◽  
S. M. George

2006 ◽  
Vol 88 (5) ◽  
pp. 051907 ◽  
Author(s):  
M. D. Groner ◽  
S. M. George ◽  
R. S. McLean ◽  
P. F. Carcia

2013 ◽  
Vol 97 (1) ◽  
pp. 127-134 ◽  
Author(s):  
Tae Eun Hong ◽  
Tae-Ho Kim ◽  
Jae-Hun Jung ◽  
Soo-Hyun Kim ◽  
Hoon Kim

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