Realization of ultra-thin HSQ resist layer for high resolution electron beam lithography using liquid splitting process

2014 ◽  
Vol 123 ◽  
pp. 62-64
Author(s):  
Jung Wuk Kim ◽  
Jens Bolten ◽  
Christian Moormann ◽  
Heinrich Kurz
1984 ◽  
Vol 44 (4) ◽  
pp. 468-469 ◽  
Author(s):  
P. M. Mankiewich ◽  
H. G. Craighead ◽  
T. R. Harrison ◽  
A. H. Dayem

2016 ◽  
Author(s):  
Stefan Pfirrmann ◽  
Robert Kirchner ◽  
Olga Lohse ◽  
Vitaliy A. Guzenko ◽  
Anja Voigt ◽  
...  

1991 ◽  
Vol 70 (3) ◽  
pp. 1793-1799 ◽  
Author(s):  
E. A. Dobisz ◽  
C. R. K. Marrian ◽  
R. J. Colton

2017 ◽  
Vol 28 (46) ◽  
pp. 465301 ◽  
Author(s):  
M Salvato ◽  
R Baghdadi ◽  
C Cirillo ◽  
S L Prischepa ◽  
A L Dolgiy ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document