High resolution electron beam lithography using a chemically amplified calix[4]arene based resist

2004 ◽  
Vol 22 (6) ◽  
pp. 3485 ◽  
Author(s):  
H. Sailer ◽  
A. Ruderisch ◽  
W. Henschel ◽  
V. Schurig ◽  
D. P. Kern
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Resolution Electron

Silylation and Dry Development of Chemically Amplified Resists SAL601*, AZPN114*1, and Epoxidised Resist (EPR*1) for High Resolution Electron-Beam Lithography

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6873-6876 ◽  
Author(s):  
Evangelia Tegou ◽  
Evangelos Gogolides ◽  
Panagiotis Argitis ◽  
Ioannis Raptis ◽  
Giancarlo Meneghini ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Resolution Electron ◽  
Chemically Amplified Resists

High resolution electron beam lithography on CaF2

1984 ◽  
Vol 44 (4) ◽  
pp. 468-469 ◽  
Author(s):  
P. M. Mankiewich ◽  
H. G. Craighead ◽  
T. R. Harrison ◽  
A. H. Dayem
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
Resolution Electron

scholarly journals mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning

2016 ◽  
Author(s):  
Stefan Pfirrmann ◽  
Robert Kirchner ◽  
Olga Lohse ◽  
Vitaliy A. Guzenko ◽  
Anja Voigt ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
Surface Patterning ◽  
3D Surface ◽  
Resolution Electron

High resolution electron beam lithography with a polydiacetylene negative resist at 50 kV

1991 ◽  
Vol 70 (3) ◽  
pp. 1793-1799 ◽  
Author(s):  
E. A. Dobisz ◽  
C. R. K. Marrian ◽  
R. J. Colton
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
Resolution Electron
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