Hydrogen silsesquioxane bilayer resists—Combining high resolution electron beam lithography and gentle resist removal
2013 ◽
Vol 31
(6)
◽
pp. 06F102
◽
Keyword(s):
2008 ◽
Vol 26
(6)
◽
pp. 2049-2053
◽
Keyword(s):
Keyword(s):
2004 ◽
Vol 22
(6)
◽
pp. 3485
◽
Keyword(s):