mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning
Stefan Pfirrmann
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Robert Kirchner
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Olga Lohse
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Vitaliy A. Guzenko
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Anja Voigt
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...
1984 ◽
Vol 44
(4)
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pp. 468-469
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P. M. Mankiewich
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H. G. Craighead
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T. R. Harrison
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A. H. Dayem
2014 ◽
Vol 123
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pp. 62-64
Jung Wuk Kim
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Jens Bolten
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Christian Moormann
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Heinrich Kurz
1989 ◽
Vol 29
(6)
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pp. 1104
A.W. Baum
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J.E. Schneider
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R.F.W. Pease
1989 ◽
Vol 36
(11)
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pp. 2617-2618
S.Y. Chou
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D.R. Alee
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R.F.W. Pease
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J.S. Harris
1991 ◽
Vol 70
(3)
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pp. 1793-1799
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E. A. Dobisz
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C. R. K. Marrian
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R. J. Colton
2013 ◽
Vol 31
(6)
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pp. 06F102
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Marcus Rommel
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Jürgen Weis
2004 ◽
Vol 22
(6)
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pp. 3485
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H. Sailer
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A. Ruderisch
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W. Henschel
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V. Schurig
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D. P. Kern
2017 ◽
Vol 28
(46)
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pp. 465301
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M Salvato
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R Baghdadi
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C Cirillo
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S L Prischepa
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A L Dolgiy
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...
1989 ◽
Vol 7
(6)
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pp. 1771
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