scholarly journals mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning

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Robert Kirchner ◽  
Olga Lohse ◽  
Vitaliy A. Guzenko ◽  
Anja Voigt ◽  
...  
1984 ◽  
Vol 44 (4) ◽  
pp. 468-469 ◽  
Author(s):  
P. M. Mankiewich ◽  
H. G. Craighead ◽  
T. R. Harrison ◽  
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1991 ◽  
Vol 70 (3) ◽  
pp. 1793-1799 ◽  
Author(s):  
E. A. Dobisz ◽  
C. R. K. Marrian ◽  
R. J. Colton

2017 ◽  
Vol 28 (46) ◽  
pp. 465301 ◽  
Author(s):  
M Salvato ◽  
R Baghdadi ◽  
C Cirillo ◽  
S L Prischepa ◽  
A L Dolgiy ◽  
...  

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