Molecular beam epitaxy growth and characterization of AlGaN epilayers in nitrogen-rich condition on Si substrate

2021 ◽  
Vol 135 ◽  
pp. 106099
Author(s):  
Qihua Zhang ◽  
Xue Yin ◽  
Eli Martel ◽  
Songrui Zhao
2015 ◽  
Vol 1131 ◽  
pp. 16-19
Author(s):  
Patchareewan Prongjit ◽  
Samatcha Vorathamrong ◽  
Somsak Panyakeow ◽  
Chiraporn Tongyam ◽  
Piyasan Prasertthdam ◽  
...  

The GaAs nanowires are grown on Si (111) substrates by Ga-assisted molecular beam epitaxy growth technique. The effect of SiO2 thickness on the structural properties of GaAs nanowires is investigated by Scanning Electron Microscope (SEM). The nucleation of GaAs nanowires related to the presence of a SiO2 layer previously coated on Si substrate. The results show that the density, length, and diameter of GaAs nanowires strongly depend on the oxidation time (or SiO2 thickness).


2013 ◽  
Vol 25 (6) ◽  
pp. 1523-1526
Author(s):  
万文坚 Wan Wenjian ◽  
尹嵘 Yin Rong ◽  
韩英军 Han Yingjun ◽  
王丰 Wang Feng ◽  
郭旭光 Guo Xuguang ◽  
...  

1992 ◽  
Vol 7 (3) ◽  
pp. 337-343 ◽  
Author(s):  
J R Soderstrom ◽  
M M Cumming ◽  
J -Y Yao ◽  
T G Andersson

Author(s):  
Yu. G. Sadofyev ◽  
V. F. Pevtsov ◽  
E. M. Dianov ◽  
P. A. Trubenko ◽  
M. V. Korshkov

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