Directional nickel silicide-induced crystallization of amorphous silicon channel under high-density current stressing

2005 ◽  
Vol 237 (1-2) ◽  
pp. 167-173 ◽  
Author(s):  
C.H. Yu ◽  
P.H. Yeh ◽  
L.J. Chen
Keyword(s):  
Amorphous Silicon ◽  
Nickel Silicide ◽  
High Density ◽  
Density Current ◽  
Current Stressing ◽  
Induced Crystallization

Vacuum-enhanced nickel-induced crystallization of hydrogenated amorphous silicon

2012 ◽  
Vol 112 (7) ◽  
pp. 073506 ◽  
Author(s):  
N. Budini ◽  
P. A. Rinaldi ◽  
R. D. Arce ◽  
J. A. Schmidt ◽  
R. R. Koropecki ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Hydrogenated Amorphous ◽  
Induced Crystallization

Near-infrared femtosecond laser-induced crystallization of amorphous silicon

2004 ◽  
Vol 85 (7) ◽  
pp. 1232-1234 ◽  
Author(s):  
Jia-Min Shieh ◽  
Zun-Hao Chen ◽  
Bau-Tong Dai ◽  
Yi-Chao Wang ◽  
Alexei Zaitsev ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Amorphous Silicon ◽  
Near Infrared ◽  
Induced Crystallization

Effect of surface morphology on laser-induced crystallization of amorphous silicon thin films

2013 ◽  
Author(s):  
Lu Huang ◽  
Jing Jin ◽  
Guohua Wang ◽  
Weimin Shi ◽  
Weiguang Yang ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Amorphous Silicon ◽  
Silicon Thin Films ◽  
Induced Crystallization ◽  
Effect Of Surface
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