PIXE detection limit for aluminium thin film deposited on Si-based matrix

2017 ◽  
Vol 406 ◽  
pp. 71-74
Author(s):  
M. Soueidan ◽  
M. Roumié ◽  
B. Nsouli
Keyword(s):  
Thin Film ◽  
Detection Limit

Detection Limit of Large Area Id Thin Film Position Sensitive Detectors Based in a-Si:H P.I.N. Diodes

1995 ◽  
Vol 377 ◽  
Author(s):  
R. Martins ◽  
G. Lavareda ◽  
F. Soares ◽  
E. Fortunato
Keyword(s):  
Thin Film ◽  
Experimental Data ◽  
Steady State ◽  
Detection Limit ◽  
Large Area ◽  
Position Sensitive ◽  
Position Sensitive Detectors

ABSTRACTThe aim of this work is to provide the basis for the interpretation of the steady state lateral photoeffect observed in p-i-n a-Si:H ID Thin Film Position Sensitive Detectors (ID TFPSD). The experimental data recorded in ID TFPSD devices with different performances are compared with the predicted curves and the obtained correlation's discussed.

Trace Analysis Using EDS: Applications to Thin-Film and Heterogeneous Samples

1990 ◽  
Vol 34 ◽  
pp. 57-70 ◽  
Author(s):  
B. J. Cross ◽  
J. E. Augenstine
Keyword(s):  
Thin Film ◽  
Detection Limit ◽  
Trace Analysis ◽  
Chemical Component ◽  
Minimum Detection Limit ◽  
False Detection ◽  
Heterogeneous Samples ◽  
Analysis Measurement ◽  
Detection And Quantification

Critical to “Trace Analysis” measurement are the concepts of detection and quantification. Detection means positively identifying a chemical component. The term Minimum Detection Limit (MDL), used here, follows that of Currie, and is the smallest concentration that yields a net count, above system background, which will be detected with a 95% probability (with only a 5% probability of false detection).

Drastic improvement in detection limits in energy dispersive X-ray fluorescence geometry utilizing micro-focused bremsstrahlung excitation in thin-film sample specimen

2021 ◽  
Vol 36 (4) ◽  
pp. 803-812
Author(s):  
Kaushik Sanyal ◽  
Buddhadev Kanrar ◽  
Sangita Dhara
Keyword(s):  
Thin Film ◽  
Detection Limit ◽  
Detection Limits ◽  
Energy Dispersive ◽  
Thin Film Sample ◽  
Film Sample ◽  
X Ray

Lowest detection limit achieved down to 0.4–4 ng mL−1 till date in a lab based XRF instrument.

DETECTION LIMIT FOR A VERY THIN BACKING FILM

1994 ◽  
Vol 04 (01) ◽  
pp. 1-7 ◽  
Author(s):  
KEIZO ISHII ◽  
HIKONOJO ORIHARA ◽  
YOSHIHIRO IWATA ◽  
KOTARO BESSHO
Keyword(s):  
Thin Film ◽  
Detection Limit ◽  
Spot Size ◽  
High Energy ◽  
High Energy Region ◽  
Beam Spot ◽  
Polyvinyl Formal ◽  
Beam Spot Size ◽  
Γ Rays ◽  
Mev Protons

Detection limit for thin backing films is formulated. A polyvinyl formal film of ~ 0.14µm was bombarded with 3 MeV protons and continuos backgrounds were measured with a Si(Li) detector. A large constant background of a high energy region (≥6 keV ) was interpreted as the Compton tail due to the 440 keV γ-rays from the excited state of 23Na which contaminated the surface of a carbon collimator placed just in front of a target. The detection limits of this thin film, under the condition of the beam spot size 6 mmϕ without collimator, are estimated for the elements of atomic number Z=10~55 and the minimum detection limit is calculated to be 4×10−12 g for Z=28~34.

Pushing the detection limit of thin film magnetoelectric heterostructures

2017 ◽  
Vol 32 (6) ◽  
pp. 1009-1019 ◽  
Author(s):  
Volker Röbisch ◽  
Sebastian Salzer ◽  
Necdet O. Urs ◽  
Jens Reermann ◽  
Erdem Yarar ◽  
...  
Keyword(s):  
Thin Film ◽  
Detection Limit ◽  
Image Position

Abstract

ROOM-TEMPERATURE NITRIC OXIDE GAS SENSING OF PEDOT THIN FILM USING SURFACE PLASMON RESONANCE

2009 ◽  
Vol 21 (06) ◽  
pp. 395-398 ◽  
Author(s):  
Tsing-Hau Wu ◽  
Hui-Hsin Lu ◽  
Wei-Yi Feng ◽  
Chii-Wann Lin ◽  
Chia-Yu Lin ◽  
...  
Keyword(s):  
Thin Film ◽  
Nitric Oxide ◽  
Surface Plasmon Resonance ◽  
Detection Limit ◽  
Surface Plasmon ◽  
Plasmon Resonance ◽  
Electrochemical Synthesis ◽  
Room Temperature ◽  
Gas Sensing ◽  
Optimal Thickness

A room-temperature nitric oxide ( NO ) gas sensor is prepared by using electrochemical synthesis of conducting polymer, poly-(3,4-ethylene dioxythiophene) (PEDOT) and characterized by surface plasmon resonance (SPR) method. Guided by SPR angle simulation, the optimal thickness of deposited PEDOT thin film is 25 nm and the resultant lowest detection limit of NO is 8 ppm. It exhibits 1.3 times higher responses to 25 ppm of NO gas than NO 2.

scholarly journals Thin-Film-Based SAW Magnetic Field Sensors

Sensors ◽  
2021 ◽  
Vol 21 (24) ◽  
pp. 8166
Author(s):  
Jana Meyer ◽  
Viktor Schell ◽  
Jingxiang Su ◽  
Simon Fichtner ◽  
Erdem Yarar ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Thin Film ◽  
Detection Limit ◽  
Dynamic Range ◽  
Limit Of Detection ◽  
Input Power ◽  
Semiconductor Technology ◽  
Noise Floor ◽  
Magnetic Field Sensors ◽  
Field Sensor

In this work, the first surface acoustic-wave-based magnetic field sensor using thin-film AlScN as piezoelectric material deposited on a silicon substrate is presented. The fabrication is based on standard semiconductor technology. The acoustically active area consists of an AlScN layer that can be excited with interdigital transducers, a smoothing SiO2 layer, and a magnetostrictive FeCoSiB film. The detection limit of this sensor is 2.4 nT/Hz at 10 Hz and 72 pT/Hz at 10 kHz at an input power of 20 dBm. The dynamic range was found to span from about ±1.7 mT to the corresponding limit of detection, leading to an interval of about 8 orders of magnitude. Fabrication, achieved sensitivity, and noise floor of the sensors are presented.

Clean Electron Microscope Substrate Films Used for Micrometeorite Collection and Study

1967 ◽  
Vol 25 ◽  
pp. 366-367
Author(s):  
D. M. Davies ◽  
R. Kemner ◽  
E. F. Fullam
Keyword(s):  
Thin Film ◽  
Electron Microscope ◽  
High Altitude ◽  
Amyl Acetate ◽  
Temperature Variations ◽  
Film Forming ◽  
Film Specimen ◽  
Particulate Contaminants

All serious electron microscopists at one time or another have been concerned with the cleanliness and freedom from artifacts of thin film specimen support substrates. This is particularly important where there are relatively few particles of a sample to be found for study, as in the case of micrometeorite collections. For the deposition of such celestial garbage through the use of balloons, rockets, and aircraft, the thin film substrates must have not only all the attributes necessary for use in the electron microscope, but also be able to withstand rather wide temperature variations at high altitude, vibration and shock inherent in the collection vehicle's operation and occasionally an unscheduled violent landing.Nitrocellulose has been selected as a film forming material that meets these requirements yet lends itself to a relatively simple clean-up procedure to remove particulate contaminants. A 1% nitrocellulose solution is prepared by dissolving “Parlodion” in redistilled amyl acetate from which all moisture has been removed.

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