Effect of the grain size on the electrochromic properties of NiO films

2020 ◽  
Vol 109 ◽  
pp. 110280
Author(s):  
Shiqi Jin ◽  
Shangsheng Wen ◽  
Muyun Li ◽  
Huien Zhong ◽  
Yanwei Chen ◽  
...  
2008 ◽  
Vol 8 (5) ◽  
pp. 2703-2706 ◽  
Author(s):  
J. R. Vargas Garcia ◽  
E. M. Lazcano Ugalde ◽  
F. Hernandez Santiago ◽  
J. M. Hallen Lopez

The influence of the deposition conditions on the structural features and electrochromic properties of nickel oxide (NiO) films prepared by chemical vapor deposition has been investigated. NiO films have been prepared on fluorine doped tin oxide (FTO) coated glass substrates from nickel-acetylacetonate precursor and their electrochromic properties have been studied by cyclic voltammetry in a 0.1 M KOH solution at room temperature. Films exhibiting only the NiO phase were obtained at deposition temperatures higher than 450 °C in a wide range of reactor pressures (0.13 to 66.6 kPa). Particularly, NiO films prepared at 500–550 °C from 0.13 to 53.3 kPa are transparent in nature and exhibit a crystallite size varying from 10 to 60 nm. An appreciable anodic electrochromic change from transparent to black coloured resulted from a very porous surface morphology and film thickness of about 3.5 μm. The electrochromic change was maintained over 3000 switching cycles. Nanostructured 3.5 μm-thick NiO films showed a maximum difference in optical transmittance of about 40% in the near-infrared region. These results make the nanostructured NiO films comparables with those prepared by other deposition techniques.


2021 ◽  
Vol 367 ◽  
pp. 137457
Author(s):  
Yingming Zhao ◽  
Xiang Zhang ◽  
Xi Chen ◽  
Wenjie Li ◽  
Lebin Wang ◽  
...  

2008 ◽  
Vol 55-57 ◽  
pp. 921-924
Author(s):  
K. Aiempanakit ◽  
Supattanapong Dumrongrattana ◽  
P. Rakkwamsuk

Indium tin oxide (ITO) films had been deposited on glass substrate without substrate heating and then tungsten oxide (WO3) films were deposited on ITO films by DC magnetron sputtering. In this work, we present the annealing ambient effect of ITO substrate on electrochromic properties of WO3 films. The ITO films were annealing in air and in vacuum at 350°C before coating with WO3 films. The structural, optical, and electrical properties of ITO films for as-deposited, annealing in air and in vacuum were investigated by X-ray diffraction, UV-VIS-NIR spectroscope and four point probe. The ITO films had a better crystallinity and lager grain size after annealing in air and in vacuum. The resistivity of ITO films increase with annealing in air, but decrease with annealing in vacuum. The WO3 films show difference surface morphology with higher grain size and surface roughness when coating on annealed ITO films in both cases. The electrochemical properties of film systems were characterized by cyclic voltammetry. The film systems of ITO plus WO3 showed that the charge capacity of ITO substrate annealing in vacuum was higher than the as-deposited ITO substrate and the ITO substrate annealing in air, respectively. This result corresponded to electrical conductivity of each ITO substrate.


2009 ◽  
Vol 9 (1) ◽  
pp. 67-72 ◽  
Author(s):  
K.K. Purushothaman ◽  
M. Dhanashankar ◽  
G. Muralidharan

Optik ◽  
2021 ◽  
Vol 231 ◽  
pp. 166509
Author(s):  
Juan R. Abenuz Acuña ◽  
Israel Perez ◽  
Víctor Sosa ◽  
Fidel Gamboa ◽  
José T. Elizalde ◽  
...  

2010 ◽  
Vol 654-656 ◽  
pp. 1904-1907 ◽  
Author(s):  
Chih Ming Wang ◽  
Kuo Sheng Kao ◽  
Da Long Cheng ◽  
Chien Chuan Cheng ◽  
Po Tsung Hsieh ◽  
...  

Electrochromic properties of transition metal oxides had much attention in recent years. The electrochromic thin films can be assembly as electrochromic devices (ECDs) and then used for applications in devices such as mirrors, panels and smart windows. A kind of complementary ECD is popular in resent years. Therefore, a specific investigation on nickel oxide (NiO) electrochromic properties is completed in this study. The crystalline structure of the NiO films was analyzed using XRD (PANalytical X’Pert PRO) with Cu-Kα radiation. The atmosphere of oxygen concentration increasing has changed the NiO films crystalline from (200) to (111). The thicknesses and surface microstructures of the NiO films were investigated using a scanning electron microscope (SEM, Philips/FEI XL40 FEG). It is observed that films are relatively smooth deposited without oxygen. The characterization of the electrochromic properties was carried out in a two-electrode cell with an electrochemical analyzer (CHI 611B). The NiOx changes the transmittance of NiO films in the wavelength range of 300-1500 nm and the color of the film changes from transparent to brown. The nano-crack exhibits in the NiO film did enhance the electrochromic properties.


2009 ◽  
Vol 64 (2-3) ◽  
pp. 300-303 ◽  
Author(s):  
Xianchun Lou ◽  
Xiujian Zhao ◽  
Jiamin Feng ◽  
Xuedong Zhou

Solar Energy ◽  
2009 ◽  
Vol 83 (12) ◽  
pp. 2103-2108 ◽  
Author(s):  
Xianchun Lou ◽  
Xiujian Zhao ◽  
Xin He

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