Sputtering power effects on the electrochromic properties of NiO films

The influence of the deposition conditions on the structural features and electrochromic properties of nickel oxide (NiO) films prepared by chemical vapor deposition has been investigated. NiO films have been prepared on fluorine doped tin oxide (FTO) coated glass substrates from nickel-acetylacetonate precursor and their electrochromic properties have been studied by cyclic voltammetry in a 0.1 M KOH solution at room temperature. Films exhibiting only the NiO phase were obtained at deposition temperatures higher than 450 °C in a wide range of reactor pressures (0.13 to 66.6 kPa). Particularly, NiO films prepared at 500–550 °C from 0.13 to 53.3 kPa are transparent in nature and exhibit a crystallite size varying from 10 to 60 nm. An appreciable anodic electrochromic change from transparent to black coloured resulted from a very porous surface morphology and film thickness of about 3.5 μm. The electrochromic change was maintained over 3000 switching cycles. Nanostructured 3.5 μm-thick NiO films showed a maximum difference in optical transmittance of about 40% in the near-infrared region. These results make the nanostructured NiO films comparables with those prepared by other deposition techniques.

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Effect of the grain size on the electrochromic properties of NiO films

Optical Materials ◽

10.1016/j.optmat.2020.110280 ◽

2020 ◽

Vol 109 ◽

pp. 110280

Author(s):

Shiqi Jin ◽

Shangsheng Wen ◽

Muyun Li ◽

Huien Zhong ◽

Yanwei Chen ◽

...

Keyword(s):

Grain Size ◽

Electrochromic Properties ◽

Nio Films

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Preparation of Sn-NiO films and all-solid-state devices with enhanced electrochromic properties by magnetron sputtering method

Electrochimica Acta ◽

10.1016/j.electacta.2020.137457 ◽

2021 ◽

Vol 367 ◽

pp. 137457

Author(s):

Yingming Zhao ◽

Xiang Zhang ◽

Xi Chen ◽

Wenjie Li ◽

Lebin Wang ◽

...

Keyword(s):

Solid State ◽

Magnetron Sputtering ◽

Electrochromic Properties ◽

Solid State Devices ◽

Nio Films

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Preparation and characterization of F doped SnO2 films and electrochromic properties of FTO/NiO films

Current Applied Physics ◽

10.1016/j.cap.2007.11.010 ◽

2009 ◽

Vol 9 (1) ◽

pp. 67-72 ◽

Cited By ~ 30

Author(s):

K.K. Purushothaman ◽

M. Dhanashankar ◽

G. Muralidharan

Keyword(s):

Electrochromic Properties ◽

Nio Films

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Face–centered cubic p–type NiO films room–temperature prepared via direct-current reactive magnetron sputtering–Influence of sputtering power on microstructure, optical and electrical behaviors

Physica B Condensed Matter ◽

10.1016/j.physb.2019.411897 ◽

2020 ◽

Vol 579 ◽

pp. 411897 ◽

Cited By ~ 3

Author(s):

Xue Meng ◽

Yongli Du ◽

Xiaoyong Gao

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Room Temperature ◽

Reactive Magnetron Sputtering ◽

Face Centered Cubic ◽

Reactive Magnetron ◽

Sputtering Power ◽

Face Centered ◽

P Type ◽

Nio Films

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The effect of annealing temperature on the electrochromic properties of nanostructured NiO films

Solar Energy Materials and Solar Cells ◽

10.1016/j.solmat.2008.12.029 ◽

2009 ◽

Vol 93 (8) ◽

pp. 1195-1201 ◽

Cited By ~ 70

Author(s):

K.K. Purushothaman ◽

G. Muralidharan

Keyword(s):

Annealing Temperature ◽

Electrochromic Properties ◽

Nio Films

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Comparison of electrochromic properties of NiO films prepared by chemical bath deposition and spin coating

2012 IEEE International Meeting for Future of Electron Devices, Kansai ◽

10.1109/imfedk.2012.6218627 ◽

2012 ◽

Author(s):

Hiroyuki Nakashima ◽

Mitsuru Inada ◽

Tadashi Saitoh

Keyword(s):

Chemical Bath Deposition ◽

Spin Coating ◽

Electrochromic Properties ◽

Nio Films

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Electrochromic Properties of Nano-Columnar Nickel Oxide

Materials Science Forum ◽

10.4028/www.scientific.net/msf.654-656.1904 ◽

2010 ◽

Vol 654-656 ◽

pp. 1904-1907 ◽

Cited By ~ 1

Author(s):

Chih Ming Wang ◽

Kuo Sheng Kao ◽

Da Long Cheng ◽

Chien Chuan Cheng ◽

Po Tsung Hsieh ◽

...

Keyword(s):

Nickel Oxide ◽

Transition Metal Oxides ◽

Electrochromic Devices ◽

Smart Windows ◽

Electrochromic Properties ◽

Electrode Cell ◽

Electrochemical Analyzer ◽

Surface Microstructures ◽

Nio Films

Electrochromic properties of transition metal oxides had much attention in recent years. The electrochromic thin films can be assembly as electrochromic devices (ECDs) and then used for applications in devices such as mirrors, panels and smart windows. A kind of complementary ECD is popular in resent years. Therefore, a specific investigation on nickel oxide (NiO) electrochromic properties is completed in this study. The crystalline structure of the NiO films was analyzed using XRD (PANalytical X’Pert PRO) with Cu-Kα radiation. The atmosphere of oxygen concentration increasing has changed the NiO films crystalline from (200) to (111). The thicknesses and surface microstructures of the NiO films were investigated using a scanning electron microscope (SEM, Philips/FEI XL40 FEG). It is observed that films are relatively smooth deposited without oxygen. The characterization of the electrochromic properties was carried out in a two-electrode cell with an electrochemical analyzer (CHI 611B). The NiOx changes the transmittance of NiO films in the wavelength range of 300-1500 nm and the color of the film changes from transparent to brown. The nano-crack exhibits in the NiO film did enhance the electrochromic properties.

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Electrochromic properties of Al doped B-subsituted NiO films prepared by sol–gel

Progress in Organic Coatings ◽

10.1016/j.porgcoat.2008.09.006 ◽

2009 ◽

Vol 64 (2-3) ◽

pp. 300-303 ◽

Cited By ~ 16

Author(s):

Xianchun Lou ◽

Xiujian Zhao ◽

Jiamin Feng ◽

Xuedong Zhou

Keyword(s):

Sol Gel ◽

Electrochromic Properties ◽

Nio Films

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Effect of Sputtering Power on Physical Properties and Electrochromic Performance of Sputtered-WO3 Thin Films

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.802.69 ◽

2013 ◽

Vol 802 ◽

pp. 69-73

Author(s):

Russameeruk Noonuruk ◽

K. Paipitak ◽

Mati Horprathum ◽

Wicharn Techitdheera ◽

Supanit Porntheeraphat ◽

...

Keyword(s):

Thin Films ◽

Optical Modulation ◽

Cyclic Voltammograms ◽

X Ray ◽

Electrochromic Properties ◽

Sem Image ◽

Sputtering Power ◽

Average Grain Size ◽

Structural Surface ◽

Deposited Films

Tungsten oxide (WO3) electrochromic thin films were deposited onto F-doped tin oxide (FTO) substrates using DC sputtering of tungsten target in presence of oxygen and argon gas. As-deposited films were prepared with different sputtering power at 50 W, 100W and 200W. The effect of power on structural, surface morphology optical and electrochromic properties of the WO3 thin films were characterized by X-ray diffractometer, scanning electron microscope, UV-VIS spectrophotometer and Cyclic voltammetry, respectively. The XRD results show that the crystalline of WO3 can be identified an orientation growth along (222) plane. The average grain size evaluated from SEM image is approximately 200 nm. The films deposited at power of 200 W exhibited better electrochromic properties with greatest optical modulation (∆T) value of ∆T = 31.2 % at l= 550 nm. The cyclic voltammograms (CV) of WO3 thin films evidently exhibited that the WO3 films prepared at power of 200 W displayed the superior electrochromic performance, compared to the others.

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