Si − doped In0.145Ga0.855As0.123Sb0.877: A novel p − type quaternary alloy with high crystalline quality

2021 ◽  
pp. 106797
Author(s):  
G. Villa-Martínez ◽  
D.M. Hurtado-Castañeda ◽  
Y.L. Casallas-Moreno ◽  
M. Ramírez-López ◽  
M.A. González-Morales ◽  
...  
1997 ◽  
Vol 478 ◽  
Author(s):  
J. Seo ◽  
K. Park ◽  
C. Lee ◽  
J. Kim

AbstractThe p-type Te-doped Bi0.5Sb1.5Te3 and n-type SbI3-doped Bi2Te2.85Se0.15 thermoelectric compounds were fabricated by hot pressing in the temperature range of 380 to 440 °C under 200 MPa in Ar. Both the compounds were highly dense and showed high crystalline quality. The grains of the compounds were preferentially oriented and contained many dislocations through the hot pressing. The fracture path followed the transgranular cleavage planes, which are perpendicular to the c-axis. In addition, with increasing the pressing temperature, the figure of merit was increased. The highest values of figure of merit for the p- and n-type compounds, which were obtained at 420 °C, were 2.69 × 10−3/K and 2.35×10−3/K, respectively.


1997 ◽  
Vol 478 ◽  
Author(s):  
K. Park ◽  
J. Seo ◽  
C. Lee

AbstractThe p-type Bi0.5Sb1.5Te3 compounds with Te dopant (4.0 and 6.0 wt%) and without dopant were fabricated by hot extrusion in the temperature range of 300 to 510 °C under an extrusion ratio of 20:1. The undoped and Te doped compounds were highly dense and showed high crystalline quality. The grains contained many dislocations and were fine equiaxed (˜ 1.0 μm) owing to the dynamic recrystallization during the extrusion. The hot extrusion gave rise to the preferred orientation of grains. The bending strength and the figure of merit of the undoped and Te doped compounds were increased with increasing the extrusion temperature. The Te dopant significantly increased the figure of merit. The values of the figure of merit of the undoped and 4.0 wt% Te-doped compounds hot extruded at 440 °C were 2.11×10−3/K and 2.94×10−3/K, respectively.


1995 ◽  
Vol 67 (10) ◽  
pp. 1390-1392 ◽  
Author(s):  
M. Y. Chern ◽  
H. M. Lin ◽  
C. C. Fang ◽  
J. C. Fan ◽  
Y. F. Chen

1999 ◽  
Vol 595 ◽  
Author(s):  
P. Ruterana ◽  
G. Nouet ◽  
Th. Kehagias ◽  
Ph. Komninou ◽  
Th. Karakostas ◽  
...  

AbstractWhen the stoichiometric TiN was deposited directly on GaN, we obtained columnar TiN grains of 5-20 nm section which cross the whole film thickness and are rotated mostly around the [111] axis. The conventional epitaxial relationship is obtained and no amorphous patches are observed at the interface. The deposition of TiN on Si doped GaN layers lead to the formation of an ohmic contact, whereas we obtain a rectifying contact on p type layers.


1996 ◽  
Vol 102 ◽  
pp. 151-155 ◽  
Author(s):  
G. Kaltsas ◽  
A. Travlos ◽  
A.G. Nassiopoulos ◽  
N. Frangis ◽  
J. Van Landuyt

CrystEngComm ◽  
2015 ◽  
Vol 17 (24) ◽  
pp. 4469-4474 ◽  
Author(s):  
J. Z. Li ◽  
Z. Z. Chen ◽  
Q. Q. Jiao ◽  
Y. L. Feng ◽  
S. Jiang ◽  
...  

The silane-controlled 3D growth led to a high crystalline quality, much strain relaxation and a specular surface for the GaN epilayers on NPSS.


2015 ◽  
Vol 15 (10) ◽  
pp. 4837-4842 ◽  
Author(s):  
J. A. Freitas ◽  
J. C. Culbertson ◽  
N. A. Mahadik ◽  
T. Sochacki ◽  
M. Bockowski ◽  
...  

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