scholarly journals Oxygen diffusion at the {111} and {110} surfaces of yttrium doped ceria.

2022 ◽  
Vol 374 ◽  
pp. 115834
Author(s):  
J.A. Purton
Keyword(s):  
2018 ◽  
Vol 97 (2) ◽  
Author(s):  
Julius Koettgen ◽  
Peter C. Schmidt ◽  
Tomáš Bučko ◽  
Manfred Martin

Author(s):  
Mehmet Emin Kilic ◽  
Jong-Ho Lee ◽  
Kwang-Ryeol Lee

Trivalent dopants in CeO2 lattice generate the oxygen vacancies in the lattice, that is vital to oxygen diffusion. However, the dopant also has two detrimental effects on the oxygen vacancy...


2015 ◽  
Vol 277 ◽  
pp. 30-37 ◽  
Author(s):  
Guy Lazovski ◽  
Olga Kraynis ◽  
Roman Korobko ◽  
Ellen Wachtel ◽  
Igor Lubomirsky

2017 ◽  
Vol 19 (15) ◽  
pp. 9957-9973 ◽  
Author(s):  
Julius Koettgen ◽  
Tobias Zacherle ◽  
Steffen Grieshammer ◽  
Manfred Martin

Doping ceria with Sm increases the oxygen jump attempt frequency.


2013 ◽  
Vol 230 ◽  
pp. 37-42 ◽  
Author(s):  
M.J.D. Rushton ◽  
A. Chroneos ◽  
S.J. Skinner ◽  
J.A. Kilner ◽  
R.W. Grimes

2009 ◽  
Vol 289-292 ◽  
pp. 769-774 ◽  
Author(s):  
Kazimierz Kowalski

Oxygen self-diffusion and oxygen surface exchange investigations in the yttria-stabilized zirconia (3 and 8 mol% of Y2O3) and in the gadolinia-doped ceria (10 and 20 mol% of Gd2O3) ceramics in the temperature range from 250 to 450°C were performed by means of the 18O isotopic labeling and the SIMS profiling methods. The activation energies of these processes were determined. The results were discussed in comparison with the literature data extrapolated from higher temperatures.


Author(s):  
R.L. Sabatini ◽  
Yimei Zhu ◽  
Masaki Suenaga ◽  
A.R. Moodenbaugh

Low temperature annealing (<400°C) of YBa2Cu3O7x in a ozone containing oxygen atmosphere is sometimes carried out to oxygenate oxygen deficient thin films. Also, this technique can be used to fully oxygenate thinned TEM specimens when oxygen depletion in thin regions is suspected. However, the effects on the microstructure nor the extent of oxygenation of specimens has not been documented for specimens exposed to an ozone atmosphere. A particular concern is the fact that the ozone gas is so reactive and the oxygen diffusion rate at these temperatures is so slow that it may damage the specimen by an over-reaction. Thus we report here the results of an investigation on the microstructural effects of exposing a thinned YBa2Cu3O7-x specimen in an ozone atmosphere using transmission electron microscopy and energy loss spectroscopy techniques.


2002 ◽  
Vol 716 ◽  
Author(s):  
You-Seok Suh ◽  
Greg Heuss ◽  
Jae-Hoon Lee ◽  
Veena Misra

AbstractIn this work, we report the effects of nitrogen on electrical and structural properties in TaSixNy /SiO2/p-Si MOS capacitors. TaSixNy films with various compositions were deposited by reactive sputtering of TaSi2 or by co-sputtering of Ta and Si targets in argon and nitrogen ambient. TaSixNy films were characterized by Rutherford backscattering spectroscopy and Auger electron spectroscopy. It was found that the workfunction of TaSixNy (Si>Ta) with varying N contents ranges from 4.2 to 4.3 eV. Cross-sectional transmission electron microscopy shows no indication of interfacial reaction or crystallization in TaSixNy on SiO2, resulting in no significant increase of leakage current in the capacitor during annealing. It is believed that nitrogen retards reaction rates and improves the chemical-thermal stability of the gate-dielectric interface and oxygen diffusion barrier properties.


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