The effect of crystal structure and morphology on the optical properties of chromium nitride thin films

Magnesium fluoride (MgF2) thin films were deposited by electron beam evaporation method and then films were bombarded by oxygen ions for various time to study the evolution of optical properties as a function of bombardment time. The transmittance, structure and morphology of films were measured by UV-vis spectroscopy, XRD and metallographic microscope, respectively. The mean transmittance of films in the visible range decrease significantly with an increase of bombardment time.

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Crystal Structure and Optical Properties of Al-Doped ZnO Large-Area Thin Films Using 1500 mm Dual Cylindrical Cathodes

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2015.11454 ◽

2015 ◽

Vol 15 (11) ◽

pp. 8370-8374

Author(s):

JinJu Lee ◽

Jong-Yoon Ha ◽

Haena Yim ◽

Won-Kook Choi ◽

Ji-Won Choi

Keyword(s):

Crystal Structure ◽

Thin Films ◽

Optical Properties ◽

Large Area ◽

Doped Zno

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Effect of crystal structure on optical properties of sol–gel derived zirconia thin films

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2012.12.115 ◽

2013 ◽

Vol 556 ◽

pp. 182-187 ◽

Cited By ~ 22

Author(s):

Xiaodong Wang ◽

Guangming Wu ◽

Bin Zhou ◽

Jun Shen

Keyword(s):

Crystal Structure ◽

Thin Films ◽

Optical Properties ◽

Sol Gel

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EFFECT OF DEPOSITION TEMPERATURE ON THE PROPERTIES OF TIO2 THIN FILMS DEPOSITED BY MOCVD

Surface Review and Letters ◽

10.1142/s0218625x16500013 ◽

2016 ◽

Vol 23 (02) ◽

pp. 1650001 ◽

Cited By ~ 1

Author(s):

ZAKI S. KHALIFA

Keyword(s):

Crystal Structure ◽

Thin Films ◽

Dielectric Constant ◽

Refractive Index ◽

Optical Properties ◽

Deposition Temperature ◽

Energy Gap ◽

Organic Chemical ◽

Tio2 Thin Films ◽

Optical Energy Gap

Crystal structure, microstructure, and optical properties of TiO2 thin films deposited on quartz substrates by metal-organic chemical vapor deposition (MOCVD) in the temperature range from 250[Formula: see text]C to 450[Formula: see text]C have been studied. The crystal structure, thickness, microstructure, and optical properties have been carried out using X-ray diffraction (XRD), field emission scanning electron microscope (FESEM), atomic force microscope (AFM), and UV-visible transmittance spectroscopy, respectively. XRD patterns show that the obtained films are pure anatase. Simultaneously, the crystal size calculated using XRD peaks, and the grain size measured by AFM decrease with the increase in deposition temperature. Moreover, the texture of the films change and roughness decrease with the increase in deposition temperature. The spectrophotometric transmittance spectra have been used to calculate the refractive index, extinction coefficient, dielectric constant, optical energy gap, and porosity of the deposited films. While the refractive index and dielectric constant decrease with the increase of deposition temperature, the porosity shows the opposite.

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