Influence of Oxygen Ions Bombardment on Optical Properties of MgF2 Anti-Reflection Films

2013 ◽  
Vol 805-806 ◽  
pp. 99-102 ◽  
Author(s):  
Xiang Ru Guo ◽  
Ling Ping Zhou ◽  
Kun Peng ◽  
Jia Jun Zhu ◽  
De Yi Li
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Electron Beam Evaporation ◽  
Magnesium Fluoride ◽  
Visible Range ◽  
Oxygen Ions ◽  
Structure And Morphology ◽  
Vis Spectroscopy ◽  
Morphology Of Films ◽  
The Mean

Magnesium fluoride (MgF2) thin films were deposited by electron beam evaporation method and then films were bombarded by oxygen ions for various time to study the evolution of optical properties as a function of bombardment time. The transmittance, structure and morphology of films were measured by UV-vis spectroscopy, XRD and metallographic microscope, respectively. The mean transmittance of films in the visible range decrease significantly with an increase of bombardment time.

scholarly journals Effect of Target Sintering Temperature on the Morphological and Optical Properties of Pulsed Laser Deposited TiO2 Thin Films

Coatings ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 561
Author(s):  
Laid Kadri ◽  
Georgiana Bulai ◽  
Aurelian Carlescu ◽  
Stoian George ◽  
Silviu Gurlui ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Optical Properties ◽  
Indium Tin Oxide ◽  
Sintering Temperature ◽  
Pulsed Laser ◽  
Visible Range ◽  
Tio2 Thin Films ◽  
Vis Spectroscopy ◽  
Ito Glass

In this paper, we report on the effect of titanium dioxide (TiO2) target sintering temperature on the morphological and optical properties of amorphous titanium dioxide thin films synthesized by pulsed laser deposition (PLD) on indium tin oxide (ITO) glass substrate and subsequently heat-treated in air at low temperature (150 °C). Three types of targets were used, unsintered (pressed at room temperature), sintered at 500 °C and sintered at 1000 °C. The surface morphology of the samples was investigated by scanning electron microscopy (SEM), and profilometry was used for thickness measurements. The structural properties of the films were examined by X-ray diffraction (XRD), while their optical properties were studied by UV‒vis spectroscopy. The obtained TiO2 thin films have an amorphous nature, as shown by XRD analysis. Profilometer showed that sintered target samples have more reliable thicknesses than unsintered ones. The SEM studies revealed the sufficient structural homogeneity of sintered target nanosized TiO2 films and agglomerates in the case of unsintered target film. The UV‒vis transmittance spectra showed high transparency in the visible range of PLD films, proportional to the target sintering temperature. The optical band gaps of the films deposited using the 500 °C and 1000 °C sintered targets are closer to those of anatase and rutile phases, respectively, which provides a promising approach to the challenges of amorphous TiO2-based nanostructures.

scholarly journals The Influence of Annealing Temperature on the Structural and Optical Properties of ZrO2 Thin Films and How Affects the Hydrophilicity

Crystals ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 454 ◽  
Author(s):  
A. Méndez-López ◽  
O. Zelaya-Ángel ◽  
M. Toledano-Ayala ◽  
I. Torres-Pacheco ◽  
J.F. Pérez-Robles ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Sol Gel ◽  
Average Particle Size ◽  
Dip Coating ◽  
Visible Range ◽  
Average Particle ◽  
Structural And Optical Properties ◽  
Air Atmosphere ◽  
Vis Spectroscopy

Zirconium oxide (ZrO2) thin films were prepared by the sol-gel dip coating technique, in combination with annealing at different temperatures in air atmosphere, with the final goal of studying the water wettability of the surface. The annealing effects on the structural and optical properties of the ZrO2 films were investigated to check the characteristics of the material. X-ray diffraction (XRD) patterns of ZrO2 annealed at 450 °C and 550 °C show the formation of tetragonal phase, with layers constituted by nanoparticles with average particle size of 21 nm and 25 nm, respectively. Fourier-transform infrared spectroscopy (FT-IR) spectra revealed the presence of vibrational modes associated to ZrO2. Photoluminescence (PL) and ultraviolet-visible spectroscopy (UV–Vis) spectroscopy was used for optical properties. All deposited ZrO2 thin films presented a high optical transparency, with an average transmittance above 70% in the visible range (400–700 nm). The hydrophilic properties of ZrO2 films were characterized by means of the measurements of the contact angle. When the sample was annealed at 550 °C, the hydrophilicity reached the best behavior, which was explained as an effect of the structural and morphological change of the films.

scholarly journals Fabrication of Transparent Mg(OH)2 Thin Films by Drop-Dry Deposition

Materials ◽  
2021 ◽  
Vol 14 (4) ◽  
pp. 724
Author(s):  
Tong Li ◽  
Masaya Ichimura
Keyword(s):  
Thin Films ◽  
Aqueous Solution ◽  
Optical Properties ◽  
Surface Morphology ◽  
Magnesium Hydroxide ◽  
Dry Deposition ◽  
Visible Range ◽  
Substrate Heating ◽  
Water Effects ◽  
Deposition Conditions

Magnesium hydroxide (Mg(OH)2) thin films were deposited by the drop-dry deposition (DDD) method using an aqueous solution containing Mg(NO3)2 and NaOH. DDD was performed by dropping the solution on a substrate, heating-drying, and rinsing in water. Effects of different deposition conditions on the surface morphology and optical properties of Mg(OH)2 thin films were researched. Films with a thickness of 1−2 μm were successfully deposited, and the Raman peaks of Mg(OH)2 were observed for them. Their transmittance in the visible range was 95% or more, and the bandgap was about 5.8 eV. It was found that the thin films have resistivity of the order of 105 Ωcm. Thus, the transparent and semiconducting Mg(OH)2 thin films were successfully prepared by DDD.

Electrophoretic Deposition of Titania Thin Films: Influence of Deposition Time on Microstructural and Optical Properties of the Coatings

2013 ◽  
Vol 829 ◽  
pp. 917-921
Author(s):  
Saber Ghannadi ◽  
Hossein Abdizadeh ◽  
Mohammad Reza Golobostanfard
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Electrophoretic Deposition ◽  
Deposition Time ◽  
Colloidal Suspension ◽  
Vis Spectroscopy ◽  
Titania Films ◽  
Titania Sol ◽  
Deposited Film ◽  
Deposited Films

Titania thin films were prepared by electrophoretic deposition at various deposition times (1, 5 and 10 min) in constant applied potential (5 V). For this purpose, modified titania sol was prepared as a colloidal suspension. The influence of deposition time on the thickness and optical properties of titania films was investigated. Scanning electron microscope images illustrate compact and homogeneous titania films deposited on FTO substrates. The results show that the film thickness increases with increasing the deposition time. It could be inferred from UV-Vis spectroscopy that increasing the thickness of deposited film causes higher absorbance at UV region. Also, increasing the deposition time from 1 to 5 min leads to increase in optical band gap of the deposited films.

scholarly journals Combination of Zinc Oxide and Antimony Doped Tin Oxide Nanocoatings for Glazing Application

Coatings ◽  
2018 ◽  
Vol 8 (7) ◽  
pp. 248 ◽  
Author(s):  
Benjamin Schumm ◽  
Thomas Abendroth ◽  
Saleh A. Alajlan ◽  
Ahmed M. Almogbel ◽  
Holger Althues ◽  
...  
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Optical Properties ◽  
Tin Oxide ◽  
Near Infrared ◽  
Glass Production ◽  
Float Glass ◽  
Building Envelope ◽  
Visible Range ◽  
Production Processes

Multilayered nanocoatings allow outstanding properties with broad potential for glazing applications. Here, we report on the development of a multilayer nanocoating for zinc oxide (ZnO) and antimony doped tin oxide (ATO). The combination of ZnO and ATO thin films with their promising optical properties is a cost-efficient alternative for the production of energy-efficient glazing. It is an effective modification of the building envelope to reduce current high domestic demand of electrical power for air conditioning, especially in hot climates like Saudi Arabia. In this paper, we report the development of a nanocoating based on the combination of ZnO and ATO. Principle material and film investigations were carried out on lab-scale by dip coating with chemical solution deposition (CSD), while with regard to production processes, chemical vapor deposition (CVD) processes were evaluated in a second stage of the film development. It was found that with both processes, high-quality thin films and multilayer coatings with outstanding optical properties can be prepared. While keeping the optical transmission in the visible range at around 80%, only 10% of the NIR (near infrared) and below 1% of UV (ultraviolet) light passes these coatings. However, in contrast to CSD, the CVD process allows a free combination of the multilayer film sequence, which is of high relevance for production processes. Furthermore, it can be potentially integrated in float glass production lines.

Doping and Annealing Effects on the Optical Bandgap of the Nickel Doped Copper Oxide Thin Films

2021 ◽  
Vol 16 (2) ◽  
pp. 243-248
Author(s):  
Fatmah S. Bahabri ◽  
Alaa Y. Mahmoud ◽  
Wafa A. Alghameeti
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Doping Concentration ◽  
Cupric Oxide ◽  
Optical Bandgap ◽  
Visible Range ◽  
Bandgap Energy ◽  
Direct Bandgap ◽  
Annealing Temperatures ◽  
Annealing Effects

In this work, we study the optical properties of the Nickel doped cupric oxide Ni-CuO thin films with Ni various doping concentrations (0, 20, 30, 50, 70, and 80%), at two different annealing temperatures; 200 and 400 °C. The absorbance and optical bandgap for the films are calculated and compared. We find that all films exhibit clear peaks in the visible range, with the increase in the absorptivity via increasing both annealing and Ni concentration. We also find that the annealing affects the shape of the absorbance peaks to be narrowed and blue shifted. Investigation on the direct bandgap energy shows that all films exhibit large direct gap; ranging from 3.87 to 4.01 eV. For non-annealed films, direct bandgap increases with increasing the Ni concentration, while for the annealed samples, the direct bandgap generally decreases by annealing, and with increasing the doping concentration. For the indirect bandgap analysis, the calculated values of the bandgap are ranging from 0.62 to 1.96 eV. We find that for non-annealed films, the indirect bandgap increases with increasing the doping concentration, while after annealing, the bandgap decreases with increasing the doping concentration for the annealing at 200 and 400 °C, with more decreasing in the gap at 400 °C.

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