Surface hardening of laser melting deposited 12CrNi2 alloy steel by enhanced plasma carburizing via hollow cathode discharge

2020 ◽  
Vol 397 ◽  
pp. 125976 ◽  
Author(s):  
Z.H. Dong ◽  
W. Zhang ◽  
H.W. Kang ◽  
Y.J. Xie ◽  
M. Ebrahimnia ◽  
...  
Keyword(s):  
Alloy Steel ◽  
Hollow Cathode ◽  
Surface Hardening ◽  
Hollow Cathode Discharge ◽  
Laser Melting ◽  
Plasma Carburizing

PLASMA NITRIDING OF AISI 5140 LOW ALLOY STEEL ASSISTED WITH HOLLOW CATHODE DISCHARGE AT LOW PRESSURE

2018 ◽  
Vol 25 (04) ◽  
pp. 1850086 ◽  
Author(s):  
ENBO WANG ◽  
HAO YANG ◽  
LIANG WANG
Keyword(s):  
Alloy Steel ◽  
Hollow Cathode ◽  
Plasma Nitriding ◽  
Compound Layer ◽  
Low Pressure ◽  
Optical Microscope ◽  
Hollow Cathode Discharge ◽  
Low Alloy Steel ◽  
X Ray Diffraction ◽  
Diffusion Layers

Plasma nitriding of AISI 5140 low alloy steel was carried at pressures ranging from 100[Formula: see text]Pa–500[Formula: see text]Pa for 4[Formula: see text]h with hollow cathode discharge assistance. The treated samples were characterized by optical microscope, microhardness tester, X-ray diffraction and electrochemical workstation. The results show that the compound layer is about 5[Formula: see text][Formula: see text]m in thickness and the depth of surface hardening layer is about 240[Formula: see text][Formula: see text]m for the sample nitrided at 100[Formula: see text]Pa for 4[Formula: see text]h. The hardness value of nitrided surface is about 830[Formula: see text]HV[Formula: see text], which is about 2.9 times higher than that (290[Formula: see text]HV[Formula: see text]) of the substrate. There is no obvious difference in the thickness of compound and diffusion layers, surface microhardness and phase composition of nitrided layers in comparison with that of samples nitrided at pressure 300 and 500[Formula: see text]Pa used by conventional plasma nitriding. But plasma nitriding with low pressure can effectively reduce the assumption of nitriding gas and amount of exhausted emission.

Comparison of plasma characteristics of high-power pulsed sputtering glow discharge and hollow-cathode discharge

2020 ◽  
Vol 60 (1) ◽  
pp. 015501
Author(s):  
Shoki Abe ◽  
Katsuyuki Takahashi ◽  
Seiji Mukaigawa ◽  
Koichi Takaki ◽  
Ken Yukimura
Keyword(s):  
Glow Discharge ◽  
High Power ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Plasma Characteristics

Effect of aging the hollow cathode by sputtering on the analytical precision of the hollow cathode discharge emission source

1992 ◽  
Vol 64 (17) ◽  
pp. 1831-1835 ◽  
Author(s):  
Jih Lie. Tseng ◽  
Jau Yurn. Kung ◽  
J. C. Williams ◽  
Steven T. Griffin
Keyword(s):  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Emission Source ◽  
Analytical Precision

Comparison of trace analytical results obtained with different hollow cathode discharge lamps

1985 ◽  
Vol 85 (1-2) ◽  
pp. 15-22
Author(s):  
Zs. Vámos-Szilvássy ◽  
A. Buzási-Győrfi
Keyword(s):  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Analytical Results

Subcritical Hopf bifurcation in NeNd hollow cathode discharge

1994 ◽  
Vol 196 (3-4) ◽  
pp. 191-194 ◽  
Author(s):  
P.R. Sasi Kumar ◽  
V.P.N. Nampoori ◽  
C.P.G. Vallabhan
Keyword(s):  
Hopf Bifurcation ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Subcritical Hopf Bifurcation

Optogalvanic effect in a hollow cathode discharge with nonlaser sources

1982 ◽  
Vol 21 (8) ◽  
pp. 1465 ◽  
Author(s):  
Charles T. Apel ◽  
Richard A. Keller ◽  
Edward F. Zalewski ◽  
Rolf Engleman
Keyword(s):  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Optogalvanic Effect
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