The influence of nitrogen concentration on microstructure and ultra-low friction behaviour of Fe–N thin films

2014 ◽  
Vol 74 ◽  
pp. 62-71 ◽  
Author(s):  
S. Chakravarty ◽  
N. Kumar ◽  
K. Panda ◽  
T.R. Ravindran ◽  
B.K. Panigrahi ◽  
...  
Keyword(s):  
Thin Films ◽  
Nitrogen Concentration ◽  
Low Friction ◽  
Friction Behaviour

The Correlation of Adhesion Strength with Barrier Structure in Cu Metallization

2003 ◽  
Vol 766 ◽  
Author(s):  
A. Sekiguchi ◽  
J. Koike ◽  
K. Ueoka ◽  
J. Ye ◽  
H. Okamura ◽  
...  
Keyword(s):  
Thin Films ◽  
Adhesion Strength ◽  
Nitrogen Concentration ◽  
Scratch Test ◽  
Barrier Structure ◽  
Barrier Layers ◽  
Cu Metallization ◽  
Microstructure Observation ◽  
Sputter Deposited ◽  
Sulfur Containing

AbstractAdhesion strength in sputter-deposited Cu thin films on various types of barrier layers was investigated by scratch test. The barrier layers were Ta1-xNx with varied nitrogen concentration of 0, 0.2, 0.3, and 0.5. Microstructure observation by TEM indicated that each layer consists of mixed phases of β;-Ta, bcc-TaN0.1, hexagonal-TaN, and fcc-TaN, depending on the nitrogen concentration. A sulfur- containing amorphous phase was also present discontinuously at the Cu/barrier interfaces in all samples. Scratch test showed that delamination occurred at the Cu/barrier interface and that the overall adhesion strength increased with increasing the nitrogen concentration. A good correlation was found between the measured adhesion strength and the composing phases in the barrier layer.

Effect of nitrogen concentration on the magnetic properties of Fe-Ta-N thin films

2004 ◽  
Vol 49 (12) ◽  
pp. 1623-1626
Author(s):  
A. S. Kamzin ◽  
S. Yu. Mal’tsev ◽  
S. A. Kamzin ◽  
Fulin Wei ◽  
Zheng Yang
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Nitrogen Concentration

Structure and Magnetic Properties of Fe-N Thin Films Grown by ECR Deposition

1999 ◽  
Vol 562 ◽  
Author(s):  
Š émeth ◽  
H. Akinaga ◽  
H. Boeve ◽  
H. Bender ◽  
J. de Boeck ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Cyclotron Resonance ◽  
Microwave Plasma ◽  
Nitrogen Concentration ◽  
High Vacuum ◽  
Plasma Source ◽  
Columnar Structure ◽  
Ultra High Vacuum ◽  
Si Substrates ◽  
Transmission Electron

ABSTRACTThe growth of FexNy thin films on GaAs, In0.2Ga0.8As, and SiO2/Si substrates using an ultra high-vacuum (UHV) deposition chamber equipped with electron cyclotron resonance (ECR) microwave plasma source is presented. The structural properties of the deposited films have been measured using various techniques as x-ray diffraction (XRD), Auger electron spectroscopy (AES), and transmission electron microscopy (TEM). The results of XRD measurements show that the films consist of a combination of α-Fe, α'-Fe, y-Fe4N, and α”- Fe16N2 phases. The depth profiles, calculated from the Auger peak intensities, show a uniform nitrogen concentration through the films. The TEM reveals a columnar structure of these films. The properties of the different Fe-N layers have been exploited in the fabrication of Fe(N) / FexNy / Fe trilayer structures, where Fe(N) means a slightly nitrogen doped Fe film. The magneto-transport properties of this trilayer structure grown on In0.2Ga0.8As substrates are presented.

Low friction states for thin solid lubricant film of MoS2

2018 ◽  
Vol 70 (4) ◽  
pp. 639-644 ◽  
Author(s):  
Kwang-Hua R. Chu
Keyword(s):  
Thin Films ◽  
Solid Lubricant ◽  
Activation Volume ◽  
High Vacuum ◽  
Low Friction ◽  
Friction Behavior ◽  
Stick Slip ◽  
Content Type ◽  
Term Operation

Purpose During the operation of Wendelstein 7-X (W7-X), any mechanical disturbance such as stick-slip may cause quenching of superconducting (SC) coils. The friction behavior of MoS2 lubrication (thin film) for narrow support elements between the SC coils in W7-X is rather important, as there is a design requirement for a coefficient of friction (COF) 0.05 between the sliding surfaces to control the stress contribution (from friction). Design/methodology/approach The author has carried out intensive calibrations or verifications using verified models considering previous friction tests on various samples which measured the COF in 4.2 K, 77 K and room temperature conditions (at high vacuum) to simulate the actual working condition. Findings The author has given useful explanations and diagnosis for previous anomalous scattered data. To improve the performance of MoS2, the author has predicted its better COF (0.002 via tuning of the activation volume), which could be a superlubricating state for MoS2 thin films considering the long-term operation requirement W7-X. Originality/value In this paper, the author has adopted Eyring’s approach to predict the low COF (0.002 via tuning of the activation volume), which could be a superlubricating state for MoS2 thin films considering the long-term operation requirement W7-X. Finally, some recent progresses about the possible few-layer MoS2 role in the electromagnetic loads have been provided.

scholarly journals Amorphous W–S–N thin films: The atomic structure behind ultra-low friction

2015 ◽  
Vol 82 ◽  
pp. 84-93 ◽  
Author(s):  
Leyla Isaeva ◽  
Jill Sundberg ◽  
Soham Mukherjee ◽  
Christopher J. Pelliccione ◽  
Andreas Lindblad ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Structure ◽  
Low Friction

Comparison of the structure and topography of selected low friction thin films

2017 ◽  
Vol 1 (83) ◽  
pp. 21-25
Author(s):  
A. Paradecka ◽  
K. Lukaszkowicz ◽  
A. Kříž ◽  
R. Potempa
Keyword(s):  
Thin Films ◽  
Tribological Properties ◽  
New Technologies ◽  
Low Friction ◽  
Current Application ◽  
Mechanical And Tribological Properties ◽  
Atomic Force ◽  
Crucial Information ◽  
Intensive Development

Purpose: The purpose of this article is to characterize and compare the structure, mechanical and tribological properties of low friction DLC and TiC thin films deposited on the austenitic steel X6CrNiMoTi17-12-2 substrate. Design/methodology/approach: In the research, the samples of the DLC and TiC thin films with transition hard AlCrN interlayer deposited by magnetron sputtering and PACVD technology respectively were used. Observations of topography were made using a scanning electron microscope (SEM), and the atomic force microscope (AFM). The structure of samples was performed using a Raman microscope. The microhardness tests of thin films were made by Oliver & Phare method. Findings: Studies confirmed that the combination of research SEM and AFM provide crucial information on the structure and topography of the samples. It was possible to obtain information about the topography parameters and allow for the assessment of morphology and quality of the tested coatings. Study of the structure using Raman spectroscopy revealed the band corresponding to the DLC and TiC thin films. Practical implications: The current application areas for low friction thin films are constantly growing, and the intensive development of techniques requires the use of new technologies what leads to the production of the specific surface layer and a thorough examination. Originality/value: Growing area of low friction coatings with specific properties requires the use of specialized tools aimed at assessing the topography and structures which are responsible for tribological properties.

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