Structure and Magnetic Properties of Fe-N Thin Films Grown by ECR Deposition

1999 ◽  
Vol 562 ◽  
Author(s):  
Š émeth ◽  
H. Akinaga ◽  
H. Boeve ◽  
H. Bender ◽  
J. de Boeck ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Cyclotron Resonance ◽  
Microwave Plasma ◽  
Nitrogen Concentration ◽  
High Vacuum ◽  
Plasma Source ◽  
Columnar Structure ◽  
Ultra High Vacuum ◽  
Si Substrates ◽  
Transmission Electron

ABSTRACTThe growth of FexNy thin films on GaAs, In0.2Ga0.8As, and SiO2/Si substrates using an ultra high-vacuum (UHV) deposition chamber equipped with electron cyclotron resonance (ECR) microwave plasma source is presented. The structural properties of the deposited films have been measured using various techniques as x-ray diffraction (XRD), Auger electron spectroscopy (AES), and transmission electron microscopy (TEM). The results of XRD measurements show that the films consist of a combination of α-Fe, α'-Fe, y-Fe4N, and α”- Fe16N2 phases. The depth profiles, calculated from the Auger peak intensities, show a uniform nitrogen concentration through the films. The TEM reveals a columnar structure of these films. The properties of the different Fe-N layers have been exploited in the fabrication of Fe(N) / FexNy / Fe trilayer structures, where Fe(N) means a slightly nitrogen doped Fe film. The magneto-transport properties of this trilayer structure grown on In0.2Ga0.8As substrates are presented.

Structure And Magnetic Properties Of Fe-N Thin Films Grown By Ecr Deposition

1999 ◽  
Vol 577 ◽  
Author(s):  
S. Németh ◽  
H. Akinaga ◽  
H. Boeve ◽  
H. Bender ◽  
J. De Boeck ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Cyclotron Resonance ◽  
Microwave Plasma ◽  
Nitrogen Concentration ◽  
High Vacuum ◽  
Plasma Source ◽  
Columnar Structure ◽  
Ultra High Vacuum ◽  
Si Substrates ◽  
Transmission Electron

ABSTRACTThe growth of FexNy thin films on GaAs, In0.2Ga0.8As, and Si02/Si substrates using an ultra high-vacuum (UHV) deposition chamber equipped with electron cyclotron resonance (ECR) microwave plasma source is presented. The structural properties of the deposited films have been measured using various techniques as x-ray diffraction (XRD), Auger electron spectroscopy (AES), and transmission electron microscopy (TEM). The results of XRD measurements show that the films consist of a combination of α-Fe, α'-Fe, γ-Fe4N, and α”- Fe16N2 phases. The depth profiles, calculated from the Auger peak intensities, show a uniform nitrogen concentration through the films. The TEM reveals a columnar structure of these films. The properties of the different Fe-N layers have been exploited in the fabrication of Fe(N) / FexNy / Fe trilayer structures, where Fe(N) means a slightly nitrogen doped Fe film. The magneto-transport properties of this trilayer structure grown on In0.2Ga0.8As substrates are presented.

Structrual Characterization and Raman Scattering of Epitaxial Aluminum Nitride Thin Films on Si(111)

1992 ◽  
Vol 242 ◽  
Author(s):  
W. J. Meng ◽  
T. A. Perry ◽  
J. Heremans ◽  
Y. T. Cheng
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
Raman Scattering ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
X Ray Diffraction ◽  
X Ray ◽  
Reactive Sputter Deposition ◽  
Transmission Electron ◽  
Substrate Temperatures

ABSTRACTThin films of aluminum nitride were grown epitaxially on Si(111) by ultra-high-vacuum dc magnetron reactive sputter deposition. Epitaxy was achieved at substrate temperatures of 600° C or above. We report results of film characterization by x-ray diffraction, transmission electron microscopy, and Raman scattering.

Preparation of Nanocrystalline Silicon by Pulsed Plasma Processing

1994 ◽  
Vol 358 ◽  
Author(s):  
S. Oda ◽  
M. Otobe
Keyword(s):  
Electron Cyclotron Resonance ◽  
Plasma Cells ◽  
High Vacuum ◽  
Plasma Processing ◽  
Nanocrystalline Silicon ◽  
Ultra High Vacuum ◽  
Pulsed Plasma ◽  
Very High Frequency ◽  
Transmission Electron ◽  
H2 Flux

ABSTRACTWe have proposed digital plasma processing for the fabrication of silicon quantum dots with grain size less than l0nm. By using the pulsed gas supply of SiH4 and H2 in the very-high frequency (VHF) plasma, we have clarified the role of atomic hydrogen in the nucleation, crystallization of nanocrystalline Si (nc-Si) as well as in the selective etching of amorphous Si to nc-Si. Recently, we have prepared nc-Si by employing an ultra-high-vacuum (UHV) chamber equipped with VHF plasma cells of SiH4 and H2. Flux rate of Si cluster depends significantly on the pressure of the plasma cell and VHF power. Spherical shaped nc-Si clusters less than 6nm in diameter have been observed by transmission electron microscopy (TEM). Infrared absorption measurements have clarified that the surface of nc-Si is covered by hydrogen. In an attempt to control the position of nuclei, we have prepared nc-Si on SiO2 with micro trenches, 40nm wide and 20nm deep, fabricated by electron beam exposure and electron cyclotron resonance (ECR) etching. It has been revealed by TEM observation that nc-Si are formed preferentially along micro trenches.

The Growth and Characterisation of Ir Silicide Films on (111)Si

1990 ◽  
Vol 202 ◽  
Author(s):  
M.A. Lawn ◽  
R.G. Elliman ◽  
M.C. Ridgway ◽  
R. Leckey ◽  
J.D. Riley
Keyword(s):  
Electron Microscope ◽  
Epitaxial Growth ◽  
Transmission Electron Microscope ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Grain Structure ◽  
Si Substrates ◽  
Fine Grain ◽  
Transmission Electron

ABSTRACTA study of the growth of thin Ir silicide films on (111)Si substrates has been undertaken. Thin (2.0nm) ir films deposited onto Si substrates under ultra-high vacuum conditions have been observed to display remarkable film continuity and fine grain structure (lnm). In situ annealing at 1000°C resulted in the formation of large regions (>10µm) of epitaxial IrSi3 islands (∼1µm) with identical epitaxial orientations. By means of annealing an as-deposited (2.0nm) Ir film stepwise to 1000°C within a transmission electron microscope the evolution of Ir silicide phases and morphologies were observed. The epitaxial growth of the semiconducting IrSi1.75 phase is reported along with the formation of Ir silicide islands at temperatures between 700°C and 800°C.

INVESTIGATION OF Ta/Ni–Al INTEGRATED FILM USED AS A DIFFUSION BARRIER LAYER BETWEEN Cu AND Si

2014 ◽  
Vol 21 (06) ◽  
pp. 1450079 ◽  
Author(s):  
LIM YANG ◽  
SHI JIE WANG ◽  
JI CHUAN HUO ◽  
XIAO HONG LI ◽  
JIAN XIN GUO ◽  
...  
Keyword(s):  
Barrier Layer ◽  
Diffusion Barrier ◽  
High Vacuum ◽  
Annealed Sample ◽  
Ultra High Vacuum ◽  
Cross Sectional ◽  
Force Microscopy ◽  
Si Substrates ◽  
Transmission Electron ◽  
Xrd Patterns

Ta (3.3 nm)/ Ni – Al (3.3 nm) integrated films deposited on Si substrates by magnetron sputtering, annealed at various temperatures in a ultra-high vacuum, have been studied as diffusion barrier layers between Cu and Si for application in Cu interconnection. The images of transmission electron microscopy (TEM) prove that the cross-sectional interfaces of Cu / Ta / Ni – Al / Si sample annealed at 600°C are clear and sharp. No Cu –silicide peaks can be found from the X-ray diffraction (XRD) patterns of the 850°C annealed sample, but the sheet resistance of the sample increases abruptly. Moreover, large grooves are found from the image of atomic force microscopy (AFM) for the 850°C annealed sample, implying the failure of the diffusion barrier. The integrated Ta / Ni – Al barrier layer retains thermally stable nature up to at least 800°C, indicating that the Ta / Ni – Al integrated film is an excellent diffusion barrier between Cu and Si .

Orientation Dependent Epitaxial Growth of CeO2 Layers on Si Substrates

1991 ◽  
Vol 237 ◽  
Author(s):  
T. Inoue ◽  
T. Ohsuna ◽  
Y. Yamamoto ◽  
Y. Sakurai ◽  
L. Luo ◽  
...  
Keyword(s):  
Volume Fraction ◽  
High Vacuum ◽  
Amorphous Layer ◽  
Electron Beam Evaporation ◽  
Ultra High Vacuum ◽  
Lattice Image ◽  
Cross Sectional ◽  
Si Substrates ◽  
Selected Area Electron Diffraction ◽  
Transmission Electron

ABSTRACTCerium dioxide (CeO2) layers epitaxially grown on (100), (111) and (110) silicon substrates by electron beam evaporation in an ultra-high vacuum were investigated. CeO2 layers on Si (111) substrates were proved to be epitaxially grown at the substrate temperature above 200°C, and had considerably good crystalline quality. On the other hand, CeO2 layers grown on Si (100) at 800°C consisted of more than 98% volume fraction of (110) component. Cross-sectional high resolution transmission electron microscopy and selected area electron diffraction verified clearly the above crystallography orientation and that the <100> direction in the CeO2(110) plane was parallel with the <110> direction in the Si (100) plane. The cross-sectional lattice image confirmed the existence of ∼ 6 nm-thick intermediate amorphous layer between the CeO2 layer and the Si substrate.

Microstructural Development of Dispersion Strengthened Cu Thin Films

1999 ◽  
Vol 562 ◽  
Author(s):  
D. Weiss ◽  
O. Kraft ◽  
E. Arzt
Keyword(s):  
Thin Films ◽  
Grain Growth ◽  
High Vacuum ◽  
Oxide Dispersion Strengthened ◽  
Ultra High Vacuum ◽  
Processing Route ◽  
Microstructural Development ◽  
High Temperature Strength ◽  
Second Phase ◽  
Si Substrates

ABSTRACTThe internal oxidation method is applied for the first time to produce a fine dispersion of second phase particles in thin films. A processing route is presented which includes ultra-high vacuum magnetron sputtering of about 1 μm thick alloy films onto Si substrates followed by in situ annealing and oxidation. Two different Cu-base alloys are examined, Cu-Y and Cu-Al, in which the extent of miscibilitiy differs significantly. This has considerable influence on the grain growth behavior. Nanoindention and wafer-curvature experiments show a drastic improvement of both room-temperature and high-temperature strength. Phenomena well known from bulk oxide-dispersion strengthened (ODS) alloys are found to appear in the thin films as well: Results on abnormal grain growth and the formation of creep voids are presented and discussed in terms of particle effects.

Microstructural Development of Dispersion Strengthened Cu Thin Films

1999 ◽  
Vol 564 ◽  
Author(s):  
D. Weiss ◽  
O. Kraft ◽  
E. Arzt
Keyword(s):  
Thin Films ◽  
Grain Growth ◽  
High Vacuum ◽  
Oxide Dispersion Strengthened ◽  
Ultra High Vacuum ◽  
Processing Route ◽  
Microstructural Development ◽  
High Temperature Strength ◽  
Second Phase ◽  
Si Substrates

AbstractThe internal oxidation method is applied for the first time to produce a fine dispersion of second phase particles in thin films. A processing route is presented which includes ultra-high vacuum magnetron sputtering of about 1 μm thick alloy films onto Si substrates followed by insitu annealing and oxidation. Two different Cu-base alloys are examined, Cu-Y and Cu-Al, in which the extent of miscibilitiy differs significantly. This has considerable influence on the grain growth behavior. Nanoindention and wafer-curvature experiments show a drastic improvement of both room-temperature and high-temperature strength. Phenomena well known from bulk oxide-dispersion strengthened (ODS) alloys are found to appear in the thin films as well: Results on abnormal grain growth and the formation of creep voids are presented and discussed in terms of particle effects.

Cathodoluminescence and Micro-Structure of Polycrystalline GaN Grown on ZnO/Si

2000 ◽  
Vol 639 ◽  
Author(s):  
Tsutomu Araki ◽  
Hidetaka Kagatsume ◽  
Hiroaki Aono ◽  
Yasushi Nanishi
Keyword(s):  
Molecular Beam ◽  
Electron Cyclotron Resonance ◽  
Columnar Structure ◽  
Micro Structure ◽  
Sem Images ◽  
Cross Sectional ◽  
Si Substrates ◽  
Transmission Electron ◽  
Resonance Plasma ◽  
Strong Contrast

ABSTRACTWe have investigated relationships between microscopic structure and cathodoluminescence (CL) property of polycrystalline (poly-) GaN grown by electron-cyclotron-resonance plasma-excited molecular beam epitaxy (ECR-MBE) on ZnO/Si substrates. Very strong CL with a peak of 3.45 eV was observed from the poly-GaN, which mainly showed a columnar structure with a size of 50-100 nm. On the other hand, the intensity of CL from the poly-GaN with few columnar domains was weaker than that of the poly-GaN with the columnar structure. The CL image from the poly-GaN, in which the columnar domains were locally observed, showed a strong contrast between bright domains and a dark background. It is confirmed that these bright regions in the CL images are corresponding to the columnar domains of the poly-GaN, by comparing with the SEM images. These results suggest that the columnar domains are responsible for the strong CL from the poly-GaN grown on the ZnO/Si substrates. Cross-sectional transmission electron microscope (TEM) observation revealed that the columnar domains had high quality crystallinity with few defects.

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