Use of in-situ spectroscopic ellipsometry to study aluminium/oxide surface modifications in chloride and sulfuric solutions

2004 ◽  
Vol 455-456 ◽  
pp. 742-746 ◽  
Author(s):  
S. Van Gils ◽  
C.A. Melendres ◽  
H. Terryn ◽  
E. Stijns
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Aluminium Oxide ◽  
Surface Modifications ◽  
Oxide Surface

An extended Drude model for the in-situ spectroscopic ellipsometry analysis of ZnO thin layers and surface modifications

2014 ◽  
Vol 571 ◽  
pp. 437-441 ◽  
Author(s):  
Lennart Fricke ◽  
Tammo Böntgen ◽  
Jan Lorbeer ◽  
Carsten Bundesmann ◽  
Rüdiger Schmidt-Grund ◽  
...  
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Surface Modifications ◽  
Thin Layers ◽  
Drude Model

scholarly journals Formation and cross-linking of fibrinogen layers monitored with in situ spectroscopic ellipsometry

2010 ◽  
Vol 75 (2) ◽  
pp. 410-417 ◽  
Author(s):  
T. Berlind ◽  
M. Poksinski ◽  
P. Tengvall ◽  
H. Arwin
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Cross Linking

scholarly journals Characterization and Quantification of Depletion and Accumulation Layers in Solid‐State Li + ‐Conducting Electrolytes Using In Situ Spectroscopic Ellipsometry

2021 ◽  
pp. 2100585
Author(s):  
Leon Katzenmeier ◽  
Leif Carstensen ◽  
Simon J. Schaper ◽  
Peter Müller‐Buschbaum ◽  
Aliaksandr S. Bandarenka
Keyword(s):  
Solid State ◽  
Spectroscopic Ellipsometry

An in situ study of protein adsorption on combinatorial Cu–Al films using spectroscopic ellipsometry

2010 ◽  
Vol 81 (1) ◽  
pp. 58-66 ◽  
Author(s):  
M.A. McArthur ◽  
T.M. Byrne ◽  
R.J. Sanderson ◽  
G.P. Rockwell ◽  
L.B. Lohstreter ◽  
...  
Keyword(s):  
Protein Adsorption ◽  
Spectroscopic Ellipsometry ◽  
In Situ Study

In-situ spectroscopic ellipsometry for monitoring the TiSi multilayers during growth and annealing

1996 ◽  
Vol 275 (1-2) ◽  
pp. 44-47 ◽  
Author(s):  
S. Logothetidis ◽  
I. Alexandrou ◽  
N. Vouroutzis
Keyword(s):  
Spectroscopic Ellipsometry

In Situ Study of Barrier Layers Using Spectroscopic Ellipsometry and Mass Spectroscopy of Recoiled Ions

2000 ◽  
Vol 619 ◽  
Author(s):  
Y. Gao ◽  
A.H. Mueller ◽  
E.A. Irene ◽  
O. Auciello ◽  
A.R. Krauss ◽  
...  
Keyword(s):  
Real Time ◽  
Mass Spectroscopy ◽  
Spectroscopic Ellipsometry ◽  
Nitrogen Concentration ◽  
Random Access ◽  
Copper Interconnects ◽  
Access Memory ◽  
Barrier Layers ◽  
The Stability

ABSTRACTAn in situ study of barrier layers using spectroscopic ellipsometry (SE) and Time-of-Flight (ToF) mass spectroscopy of recoiled ions (MSRI) is presented. First the formation of copper silicides has been observed by real-time SE and in situ MSRI in annealed Cu/Si samples. Second TaSiN films as barrier layers for copper interconnects were investigated. Failure of the TaSiN layers in Cu/TaSiN/Si samples was detected by real-time SE during annealing and confirmed by in situ MSRI. The effect of nitrogen concentration on TaSiN film performance as a barrier was also examined. The stability of both TiN and TaSiN films as barriers for electrodes for dynamic random access memory (DRAM) devices has been studied. It is shown that a combination of in situ SE and MSRI can be used to monitor the evolution of barrier layers and detect the failure of barriers in real-time.

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