Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering

2010 ◽  
Vol 8 (S1) ◽  
pp. 73-77 ◽  
Author(s):  
Stefan Jakobs Stefan Jakobs ◽  
Marc Lappschies Marc Lappschies ◽  
Uwe Schallenberg Uwe Schallenberg ◽  
Olaf Stenzel Olaf Stenzel ◽  
Steffen Wilbrandt Steffen Wilbrandt
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Metal Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films

Structure and optical parameters of Eu doped tellurium oxide thin films prepared by reactive magnetron sputtering method

2019 ◽  
Vol 691 ◽  
pp. 137592 ◽  
Author(s):  
Marcin Łapiński ◽  
Michalina Walas ◽  
Anna Gapska ◽  
Dorota Kulik ◽  
Aneta Szmytke ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Optical Parameters ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Tellurium Oxide

Growth and characterization of NiO thin films prepared by dc reactive magnetron sputtering

2011 ◽  
Vol 13 (2) ◽  
pp. 314-320 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
A. Sivasankar Reddy ◽  
Kee-Sun Lee ◽  
P. Sreedhara Reddy
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering
Sign in / Sign up

Export Citation Format

Share Document