Characterisation of thin film silicon films deposited by plasma enhanced chemical vapour deposition at 162MHz, using a large area, scalable, multi-tile-electrode plasma source

2011 ◽  
Vol 519 (20) ◽  
pp. 6884-6886 ◽  
Author(s):  
E. Monaghan ◽  
T. Michna ◽  
C. Gaman ◽  
D. O'Farrel ◽  
K. Ryan ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Plasma Source ◽  
Silicon Films ◽  
Large Area ◽  
Thin Film Silicon

Silicon Films Deposited by Low-Pressure Chemical Vapour Deposition for Microsystems

2003 ◽  
Vol 93 ◽  
pp. 453-458 ◽  
Author(s):  
H. Mahfoz-Kotb ◽  
A.C. Salaün ◽  
T. Mohammed-Brahim ◽  
F. Bendriaa ◽  
F. Le Bihan ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Silicon Films ◽  
Pressure Chemical
Sign in / Sign up

Export Citation Format

Share Document