Effects of post deposition annealing atmosphere on interfacial and electrical properties of HfO2/Ge3N4 gate stacks

2019 ◽  
Vol 675 ◽  
pp. 16-22 ◽  
Author(s):  
Kumar Mallem ◽  
S.V. Jagadeesh Chandra ◽  
Minkyu Ju ◽  
Subhajit Dutta ◽  
Swagata Phanchanan ◽  
...  
2005 ◽  
Vol 44 (4B) ◽  
pp. 2230-2234 ◽  
Author(s):  
Hag-Ju Cho ◽  
Hye Lan Lee ◽  
Hong Bae Park ◽  
Taek Soo Jeon ◽  
Seong Geon Park ◽  
...  

RSC Advances ◽  
2020 ◽  
Vol 10 (49) ◽  
pp. 29394-29401
Author(s):  
Chandrasekaran Abinaya ◽  
Kevin Bethke ◽  
Virgil Andrei ◽  
Jonas Baumann ◽  
Beatrix Pollakowski-Herrmann ◽  
...  

This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere.


2020 ◽  
Vol 31 (22) ◽  
pp. 20378-20386
Author(s):  
Shagolsem Romeo Meitei ◽  
Rajshree Rajkumari ◽  
Naorem Khelchand Singh

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