Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2010.08.002 ◽

2010 ◽

Vol 13 (4) ◽

pp. 245-251 ◽

Author(s):

S.V. Jagadeesh Chandra ◽

Chel-Jong Choi ◽

S. Uthanna ◽

G. Mohan Rao

Keyword(s):

Electrical Properties ◽

Radio Frequency ◽

Tantalum Oxide ◽

Oxide Films ◽

Radio Frequency Magnetron ◽

Post Deposition Annealing ◽

Structural And Electrical Properties ◽

Post Deposition

Download Full-text

Changes in the structural and electrical properties of vacuum post-annealed tungsten- and titanium-doped indium oxide films deposited by radio frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2011.08.060 ◽

2012 ◽

Vol 520 (6) ◽

pp. 2096-2101 ◽

Author(s):

L.T. Yan ◽

R.E.I. Schropp

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Indium Oxide ◽

Oxide Films ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Structural And Electrical Properties ◽

Indium Oxide Films

Download Full-text

Structural and electrical properties of CuIn1−xAlxSe2 thin films prepared by radio-frequency magnetron sputtering process

Applied Surface Science ◽

10.1016/j.apsusc.2014.11.131 ◽

2015 ◽

Vol 326 ◽

pp. 211-215 ◽

Author(s):

Jun Zhang ◽

Hongmei Deng ◽

Jun He ◽

Xiankuan Meng ◽

Tantan Liu ◽

...

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Structural And Electrical Properties

Download Full-text

Effect of Post Deposition Annealing on the Structural and Electrical Properties of NbTiN Thin Films Deposited by Reactive Bias Target Ion Beam Deposition Technique

IEEE Transactions on Applied Superconductivity ◽

10.1109/tasc.2019.2910024 ◽

2019 ◽

Vol 29 (5) ◽

pp. 1-5

Author(s):

Tannaz Farrahi ◽

Michael E. Cyberey ◽

Michael B. Eller ◽

Arthur W. Lichtenberger

Keyword(s):

Electrical Properties ◽

Ion Beam ◽

Deposition Technique ◽

Post Deposition Annealing ◽

Ion Beam Deposition ◽

Structural And Electrical Properties ◽

Post Deposition ◽

Beam Deposition

Download Full-text

Observation of Blue-Light Emission from Tantalum Oxide Films Deposited by Radio-Frequency Magnetron Sputtering

IEICE Transactions on Electronics ◽

10.1093/ietele/e91-c.10.1669 ◽

2008 ◽

Vol E91-C (10) ◽

pp. 1669-1672 ◽

Author(s):

K. MIURA ◽

H. MIYAZAKI ◽

O. HANAIZUMI

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Light Emission ◽

Tantalum Oxide ◽

Oxide Films ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Blue Light Emission

Download Full-text

Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

Applied Physics A ◽

10.1007/s003390000691 ◽

2001 ◽

Vol 73 (2) ◽

pp. 229-236 ◽

Author(s):

H.B. Nie ◽

S.Y. Xu ◽

S.J. Wang ◽

L.P. You ◽

Z. Yang ◽

...

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Tantalum Nitride ◽

Radio Frequency Magnetron Sputtering ◽

Structural And Electrical Properties

Download Full-text

Effects of post-deposition annealing ambient on chemical, structural, and electrical properties of RF magnetron sputtered Y2O3 gate on gallium nitride

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2013.05.202 ◽

2013 ◽

Vol 575 ◽

pp. 382-392 ◽

Author(s):

Hock Jin Quah ◽

Kuan Yew Cheong

Keyword(s):

Gallium Nitride ◽

Electrical Properties ◽

Post Deposition Annealing ◽

Structural And Electrical Properties ◽

Post Deposition

Download Full-text

Effect of post-deposition annealing on the structural and electrical properties of dc magnetron sputtered Ta2O5 films

Journal of Physics Conference Series ◽

10.1088/1742-6596/114/1/012035 ◽

2008 ◽

Vol 114 ◽

pp. 012035 ◽

Author(s):

S Uthanna ◽

S V J Chandra ◽

P S Reddy ◽

G M Rao

Keyword(s):

Electrical Properties ◽

Post Deposition Annealing ◽

Structural And Electrical Properties ◽

Post Deposition

Download Full-text

Structural and electrical properties of fluorine-doped zinc tin oxide thin films prepared by radio-frequency magnetron sputtering

Current Applied Physics ◽

10.1016/j.cap.2014.03.020 ◽

2014 ◽

Vol 14 (6) ◽

pp. 850-855 ◽

Author(s):

R. Pandey ◽

S.H. Cho ◽

D.K. Hwang ◽

W.K. Choi

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Tin Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films ◽

Structural And Electrical Properties ◽

Download Full-text

Understanding of post deposition annealing and substrate temperature effects on structural and electrical properties of Gd2O3 MOS capacitor

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-018-8804-y ◽

2018 ◽

Vol 29 (10) ◽

pp. 7993-8001 ◽

Author(s):

Aysegul Kahraman

Keyword(s):

Electrical Properties ◽

Substrate Temperature ◽

Temperature Effects ◽

Post Deposition Annealing ◽

Mos Capacitor ◽

Structural And Electrical Properties ◽

Post Deposition

Download Full-text

Effect of Post-Deposition Annealing and Electrode Materials on the Characteristics of Tantalum Oxide Films Deposited by Plasma-Enhanced Chemical Vapor Deposition

10.7567/ssdm.1992.a-4-2 ◽

1992 ◽

Author(s):

H. S. Park ◽

Y. K. Baek ◽

J. C. Kim ◽

S. H. Choi ◽

K. H. Oh

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Electrode Materials ◽

Tantalum Oxide ◽

Oxide Films ◽

Chemical Vapor ◽

Post Deposition Annealing ◽

Post Deposition

Download Full-text