<title>Etching mechanism of Au thin films in Cl<formula><inf><roman>2</roman></inf></formula>/Ar inductively coupled plasma</title>

Etching mechanism of (Pb,Sr)TiO3 thin films for DRAM application using Cl2/Ar inductively coupled plasma

Vacuum ◽

10.1016/j.vacuum.2004.01.018 ◽

2004 ◽

Vol 74 (3-4) ◽

pp. 485-489 ◽

Cited By ~ 4

Author(s):

Gwan-Ha Kim ◽

Kyoung-Tae Kim ◽

Dong-Pyo Kim ◽

Chang-Il Kim

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Etching Mechanism

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Etching Mechanism of ZnO Thin Films in Inductively Coupled Plasma

Solid State Phenomena - Advances in Nanomaterials and Processing ◽

10.4028/3-908451-31-0.65 ◽

2007 ◽

pp. 65-68

Author(s):

Chan Min Kang ◽

Jong Sik Kim ◽

Gwan Ha Kim ◽

Chang Il Kim

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Zno Thin Films ◽

Inductively Coupled ◽

Etching Mechanism

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Broadband and wide-angle antireflection subwavelength structures of Si by inductively coupled plasma etching using dewetted nanopatterns of Au thin films as masks

Thin Solid Films ◽

10.1016/j.tsf.2010.12.248 ◽

2011 ◽

Vol 519 (11) ◽

pp. 3792-3797 ◽

Cited By ~ 23

Author(s):

J.W. Leem ◽

J.S. Yu

Keyword(s):

Thin Films ◽

Plasma Etching ◽

Inductively Coupled Plasma ◽

Subwavelength Structures ◽

Wide Angle ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled ◽

Au Thin Films

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Gas-phase chemistry and etching mechanism of SiNx thin films in C4F8 + Ar inductively coupled plasma

Thin Solid Films ◽

10.1016/j.tsf.2019.05.066 ◽

2019 ◽

Vol 685 ◽

pp. 97-107 ◽

Cited By ~ 1

Author(s):

Nomin Lim ◽

Alexander Efremov ◽

Kwang-Ho Kwon

Keyword(s):

Thin Films ◽

Gas Phase ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Gas Phase Chemistry ◽

Etching Mechanism ◽

Phase Chemistry

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Etching Mechanism of Indium Tin Oxide Thin Films using Cl2/HBr Inductively Coupled Plasma

Transactions on Electrical and Electronic Materials ◽

10.4313/teem.2009.10.1.001 ◽

2009 ◽

Vol 10 (1) ◽

pp. 1-4 ◽

Cited By ~ 7

Author(s):

Sung-Ihl Kim ◽

Kwang-Ho Kwon

Keyword(s):

Thin Films ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Inductively Coupled Plasma ◽

Oxide Thin Films ◽

Inductively Coupled ◽

Etching Mechanism

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Evolution of nanocrystalline diamond thin films by high-density low-pressure CH4 plasma in planar inductively coupled plasma CVD

10.1063/5.0016897 ◽

2020 ◽

Author(s):

Sucharita Saha ◽

Debajyoti Das

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Low Pressure ◽

High Density ◽

Nanocrystalline Diamond ◽

Plasma Cvd ◽

Inductively Coupled ◽

Diamond Thin Films

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Device Relevant Doped Amorphous Silicon Thin Films by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC) ◽

10.1109/pvsc.2018.8548298 ◽

2018 ◽

Author(s):

Boon Heng TEO ◽

Jin LIU ◽

Jia GE ◽

Delio PEREZ ◽

Edwin CARMONA ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled ◽

Silicon Thin Films

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Dry etching of magnesium oxide thin films by using inductively coupled plasma for buffer layer of MFIS structure

Thin Solid Films ◽

10.1016/j.tsf.2006.10.087 ◽

2007 ◽

Vol 515 (12) ◽

pp. 4955-4959 ◽

Cited By ~ 6

Author(s):

Gwan-Ha Kim ◽

Chang-Il Kim

Keyword(s):

Thin Films ◽

Buffer Layer ◽

Magnesium Oxide ◽

Inductively Coupled Plasma ◽

Dry Etching ◽

Oxide Thin Films ◽

Inductively Coupled ◽

Mfis Structure

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Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma

Journal of Applied Physics ◽

10.1063/1.4807404 ◽

2013 ◽

Vol 113 (20) ◽

pp. 203505 ◽

Cited By ~ 5

Author(s):

Y. N. Guo ◽

D. Y. Wei ◽

S. Q. Xiao ◽

S. Y. Huang ◽

H. P. Zhou ◽

...

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films

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Etching mechanism of MgO thin films in inductively coupled Cl2∕Ar plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1772370 ◽

2004 ◽

Vol 22 (5) ◽

pp. 2101-2106 ◽

Cited By ~ 19

Author(s):

A. M. Efremov ◽

Seong-Mo Koo ◽

Dong-Pyo Kim ◽

Kyoung-Tae Kim ◽

Chang-Il Kim

Keyword(s):

Thin Films ◽

Inductively Coupled ◽

Etching Mechanism ◽

Ar Plasma

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Etching mechanism of Au thin films in Cl2/Ar inductively coupled plasma

Etching mechanism of (Pb,Sr)TiO3 thin films for DRAM application using Cl2/Ar inductively coupled plasma

Etching Mechanism of ZnO Thin Films in Inductively Coupled Plasma

Broadband and wide-angle antireflection subwavelength structures of Si by inductively coupled plasma etching using dewetted nanopatterns of Au thin films as masks

Gas-phase chemistry and etching mechanism of SiNx thin films in C4F8 + Ar inductively coupled plasma

Etching Mechanism of Indium Tin Oxide Thin Films using Cl2/HBr Inductively Coupled Plasma

Evolution of nanocrystalline diamond thin films by high-density low-pressure CH4 plasma in planar inductively coupled plasma CVD

Device Relevant Doped Amorphous Silicon Thin Films by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

Dry etching of magnesium oxide thin films by using inductively coupled plasma for buffer layer of MFIS structure

Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma

Etching mechanism of MgO thin films in inductively coupled Cl2∕Ar plasma

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Etching mechanism of Au thin films in Cl2/Ar inductively coupled plasma

Etching mechanism of (Pb,Sr)TiO3 thin films for DRAM application using Cl2/Ar inductively coupled plasma

Etching Mechanism of ZnO Thin Films in Inductively Coupled Plasma

Broadband and wide-angle antireflection subwavelength structures of Si by inductively coupled plasma etching using dewetted nanopatterns of Au thin films as masks

Gas-phase chemistry and etching mechanism of SiNx thin films in C4F8 + Ar inductively coupled plasma

Etching Mechanism of Indium Tin Oxide Thin Films using Cl2/HBr Inductively Coupled Plasma

Evolution of nanocrystalline diamond thin films by high-density low-pressure CH4 plasma in planar inductively coupled plasma CVD

Device Relevant Doped Amorphous Silicon Thin Films by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

Dry etching of magnesium oxide thin films by using inductively coupled plasma for buffer layer of MFIS structure

Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma

Etching mechanism of MgO thin films in inductively coupled Cl2∕Ar plasma

Gas-phase chemistry and etching mechanism of SiNx thin films in C4F8 + Ar inductively coupled plasma