Influence of target direct current bias voltage on the film structure of hydrogenated microcrystalline silicon prepared by direct current–radiofrequency coupled magnetron sputtering

2005 ◽  
Vol 478 (1-2) ◽  
pp. 132-136 ◽  
Author(s):  
K. Fukaya ◽  
A. Tabata ◽  
T. Mizutani
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Direct Current ◽  
Film Structure ◽  
Microcrystalline Silicon ◽  
Direct Current Bias

A Frequency Reconfigurable Antenna based on Few Layer Graphene

2021 ◽  
Vol 36 (5) ◽  
pp. 542-547
Author(s):  
Sheng-lan Wang ◽  
Jing-Song Hong ◽  
Yan Deng ◽  
Zhi-jian Chen
Keyword(s):  
Experimental Evidence ◽  
Bias Voltage ◽  
Direct Current ◽  
Surface Impedance ◽  
Microstrip Line ◽  
Reconfigurable Antenna ◽  
Layer Graphene ◽  
Direct Current Bias ◽  
Few Layer Graphene ◽  
Frequency Reconfigurable Antenna

In this paper, a frequency reconfigurable antenna was presented. This antenna is made up of a square loop and a microstrip line with a gap, in which the few layer graphene (FLG) sheet is located to achieve frequency reconfigurable. FLG is likes a lumped resistor with resistance. And the surface impedance can be adjusted by applying a direct current bias voltage, which obtains two work modes that imitate switch. Additionally, the experimental evidence show the proposed frequency reconfigurable antenna can provide a tunable bandwidth.

Time evolution of an ion-ion plasma after the application of a direct current bias voltage

2002 ◽  
Vol 91 (10) ◽  
pp. 6282 ◽  
Author(s):  
Vikas Midha ◽  
Badri Ramamurthi ◽  
Demetre J. Economou
Keyword(s):  
Time Evolution ◽  
Bias Voltage ◽  
Direct Current ◽  
Ion Plasma ◽  
Direct Current Bias

Electrical and Thermal Interface Conductance of Carbon Nanotubes Grown under Direct Current Bias Voltage

2008 ◽  
Vol 112 (49) ◽  
pp. 19727-19733 ◽  
Author(s):  
Placidus B. Amama ◽  
Chun Lan ◽  
Baratunde A. Cola ◽  
Xianfan Xu ◽  
Ronald G. Reifenberger ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Bias Voltage ◽  
Direct Current ◽  
Thermal Interface ◽  
Direct Current Bias

scholarly journals Effect of Bias Voltage on Microstructure and Properties of Tantalum Nitride Coatings Deposited by RF Magnetron Sputtering

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 911
Author(s):  
Wei Dai ◽  
Yunzhan Shi
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Rf Magnetron Sputtering ◽  
Amorphous Structure ◽  
Tribological Performance ◽  
Tantalum Nitride ◽  
Growth Morphology ◽  
Low Friction ◽  
Nitride Coatings ◽  
Overall Performance

TaNx coatings were deposited by RF magnetron sputtering with different bias voltages. The growth morphology, crystalline structure, chemical bond structure, hardness and elastic modulus, adhesion strength and tribological performance of the coatings were studied as a function of the bias voltage. The results showed that an increasing bias voltage refines the coating grains and facilitates structure densification. Simultaneously, the structure of the TaNx coatings transfers from a composite structure consisting of TaN and Ta2N crystals, through a single composite mainly composed of the Ta2N crystal, to an amorphous structure as the bias voltage increases from low to high, indicating that the phase composition of the TaNx coatings can be varied by the bias voltage. The coating composed of Ta2N crystal showed a good overall performance including enhanced hardness, enhanced adhesive strength, and good tribological performance with enhanced wear resistance and a low friction coefficient of 0.18.

ZrCuAlNi thin film metallic glass grown by high power impulse and direct current magnetron sputtering

2021 ◽  
pp. 127029
Author(s):  
Niklas Bönninghoff ◽  
Wahyu Diyatmika ◽  
Jinn P. Chu ◽  
Stanislav Mráz ◽  
Jochen M. Schneider ◽  
...  
Keyword(s):  
Thin Film ◽  
Metallic Glass ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
High Power ◽  
Direct Current Magnetron Sputtering
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