Structural and optical properties of four-hexagonal polytype nanocrystalline silicon carbide films deposited by plasma enhanced chemical vapor deposition technique

Hexagonal Polytype ◽

Vapor Deposition Technique ◽

Influence of temperature and nickel catalyst on the structural and optical properties of indium oxide nanostructured films synthesized by chemical vapor deposition technique

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2021.105925 ◽

2021 ◽

Vol 132 ◽

pp. 105925

Author(s):

T.M. Aper ◽

F.K. Yam ◽

K.P. Beh

Keyword(s):

Optical Properties ◽

Nickel Catalyst ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Nanostructured Films ◽

Influence Of Temperature ◽

Vapor Deposition Technique

Characterization of Undoped, N- and P-Type Hydrogenated Nanocrystalline Silicon Carbide Films Deposited by Hot-Wire Chemical Vapor Deposition at Low Temperatures

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.1415 ◽

2007 ◽

Vol 46 (4A) ◽

pp. 1415-1426 ◽

Cited By ~ 46

Author(s):

Shinsuke Miyajima ◽

Akira Yamada ◽

Makoto Konagai

Keyword(s):

Silicon Carbide ◽

Vapor Deposition ◽

Low Temperatures ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Nanocrystalline Silicon Carbide ◽

P Type

Pressure dependent structural and optical properties of silicon carbide thin films deposited by hot wire chemical vapor deposition from pure silane and methane gases

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-012-0934-z ◽

2012 ◽

Vol 24 (4) ◽

pp. 1361-1368 ◽

Cited By ~ 16

Author(s):

Fatemeh Shariatmadar Tehrani ◽

Boon Tong Goh ◽

Muhamad Rasat Muhamad ◽

Saadah Abdul Rahman

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Optical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Structural And Optical Properties

A study of optical properties of hydrogenated microcrystalline silicon films prepared by plasma enhanced chemical vapor deposition technique at different conditions of excited power and pressure

Vacuum ◽

10.1016/j.vacuum.2009.01.009 ◽

2009 ◽

Vol 83 (7) ◽

pp. 1023-1030 ◽

Cited By ~ 9

Author(s):

R.I. Badran ◽

F.S. Al-Hazmi ◽

S. Al-Heniti ◽

A.A. Al-Ghamdi ◽

J. Li ◽

...

Keyword(s):

Optical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Deposition Technique ◽

Microcrystalline Silicon ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

Structural and optical properties of CdTe/CdSe heterostructure multilayer thin films prepared by physical vapor deposition technique

Applied Nanoscience ◽

10.1007/s13204-012-0150-4 ◽

2012 ◽

Vol 3 (5) ◽

pp. 453-459 ◽

Cited By ~ 14

Author(s):

M. Melvin David Kumar ◽

Suganthi Devadason

Keyword(s):

Thin Films ◽

Optical Properties ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Multilayer Thin Films ◽

Deposition Technique ◽

Physical Vapor Deposition Technique

Vapor Deposition Technique ◽

Preparation of Nanocrystalline Silicon Carbide Thin Films by Hot-Wire Chemical Vapor Deposition at Various Filament Temperature

2006 IEEE 4th World Conference on Photovoltaic Energy Conference ◽

10.1109/wcpec.2006.279805 ◽

2006 ◽

Cited By ~ 1

Author(s):

Akimori Tabata ◽

Yusuke Komura ◽

Masaki Kanaya ◽

Tomoki Narita ◽

Akihiro Kondo ◽

...

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Filament Temperature ◽

Structural and Optical Properties of Nanocrystalline Silicon Films Deposited by Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.169 ◽

2002 ◽

Vol 41 (Part 1, No. 1) ◽

pp. 169-175 ◽

Cited By ~ 5

Author(s):

Atif Mossad Ali ◽

Takao Inokuma ◽

Yoshihiro Kurata ◽

Seiichi Hasegawa

Keyword(s):

Optical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Nanocrystalline Silicon Films

Helicon wave plasma chemical vapor deposition of nanocrystalline silicon carbide films at low substrate temperature

10.1117/12.575650 ◽

2005 ◽

Author(s):

Wei Yu ◽

Wanbing Lu ◽

Baozhu Wang ◽

Li Han ◽

Guangsheng Fu

Keyword(s):

Silicon Carbide ◽

Substrate Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Helicon Wave ◽

High-rate chemical vapor deposition of nanocrystalline silicon carbide films by radio frequency thermal plasma

Materials Letters ◽

10.1016/s0167-577x(02)01116-3 ◽

2003 ◽

Vol 57 (13-14) ◽

pp. 1982-1986 ◽

Cited By ~ 34

Author(s):

F. Liao ◽

S. Park ◽

J.M. Larson ◽

M.R. Zachariah ◽

S.L. Girshick

Keyword(s):

Silicon Carbide ◽

Radio Frequency ◽

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

High Rate ◽

Effects of substrate temperature on structural and electrical properties of cubic silicon carbide films deposited by hot wire chemical vapor deposition technique

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-015-2767-z ◽

2015 ◽

Vol 26 (5) ◽

pp. 2844-2850 ◽

Cited By ~ 5

Author(s):

Himanshu S. Jha ◽

Pratima Agarwal

Keyword(s):

Silicon Carbide ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Deposition Technique ◽

Vapor Deposition Technique ◽

Structural And Electrical Properties ◽

Cubic Silicon Carbide