scholarly journals Heat treatment of cathodic arc deposited amorphous hard carbon films

1997 ◽  
Vol 308-309 ◽  
pp. 186-190 ◽  
Author(s):  
Simone Anders ◽  
Joel W Ager III ◽  
George M Pharr ◽  
Ting Y Tsui ◽  
I G. Brown
1994 ◽  
Vol 354 ◽  
Author(s):  
K.C. Walter ◽  
H. Kung ◽  
T. Levine ◽  
J.T. Tesmer ◽  
P. Kodali ◽  
...  

AbstractPlasma and ion beam based techniques have been used to deposit carbon-based films. The ion beam based method, a cathodic arc process, used a magnetically mass analyzed beam and is inherently a line-of-sight process. Two hydrocarbon plasma-based, non-line-of-sight techniques were also used and have the advantage of being capable of coating complicated geometries. The self-bias technique can produce hard carbon films, but is dependent on rf power and the surface area of the target. The pulsed-bias technique can also produce hard carbon films but has the additional advantage of being independent of rf power and target surface area. Tribological results indicated the coefficient of friction is nearly the same for carbon films from each deposition process, but the wear rate of the cathodic arc film was five times less than for the self-bias or pulsed-bias films. Although the cathodic arc film was the hardest, contained the highest fraction of sp3 bonds and exhibited the lowest wear rate, the cathodic arc film also produced the highest wear on the 440C stainless steel counterface during tribological testing. Thus, for tribological applications requiring low wear rates for both counterfaces, coating one surface with a very hard, wear resistant film may detrimentally affect the tribological behavior of the counterface.


1997 ◽  
Vol 71 (23) ◽  
pp. 3367-3369 ◽  
Author(s):  
Simone Anders ◽  
Javier Dı́az ◽  
Joel W. Ager ◽  
Roger Yu Lo ◽  
David B. Bogy

1995 ◽  
Vol 383 ◽  
Author(s):  
Simone Anders ◽  
André Anders ◽  
Joel W. Ager ◽  
Zhi Wang ◽  
George M. Pharr ◽  
...  

ABSTRACTCathodic arc deposition combined with macroparticle filtering of the plasma is an efficient and versatile method for the deposition of amorphous hard carbon films of high quality. The film properties can be tailored over a broad range by varying the energy of the carbon ions incident upon the substrate and upon the growing film by applying a pulsed bias technique. By varying the bias voltage during the deposition process specific properties of the interface, bulk film and top surface layer can be obtained. We report on nanoindentation and transmission electron microscopy studies as well as stress measurements of cathodic-arc amorphous hard carbon films deposited with varied bias voltage. The investigations were performed on multilayers consisting of alternating hard and soft amorphous carbon.


1998 ◽  
Author(s):  
S. Anders ◽  
C.S. Bhatia ◽  
W. Fong ◽  
R.Y. Lo ◽  
D.B. Bogy

1997 ◽  
Vol 498 ◽  
Author(s):  
S. M. Camphausen ◽  
A. F. Myers ◽  
S. P. Bozeman ◽  
J. J. Cuomo

ABSTRACTHard carbon films can be prepared by the condensation of energetic carbon species at or below room temperature. These amorphous films are primarily tetrahedrally coordinated and contain high fractions of sp3 bonds leading to the terminology amorphous diamond. These films have been successfully doped with phosphorus up to 1 at.%, by other researchers by using a phosphorus doped graphite target. We have also investigated evaporated phosphorus in conjuction with a filtered cathodic arc to incorporate phosphorus into the films and have successfully incorporated phosphorus up to 40 at.% into our films using this technique. XPS showed that some of the phosphorus was clustered. PEELS revealed that with an incorporation of 40 at.% of phosphorus, the sp3 content was approximately 20%.


1996 ◽  
Vol 68 (6) ◽  
pp. 779-781 ◽  
Author(s):  
George M. Pharr ◽  
Daniel L. Callahan ◽  
Shaun D. McAdams ◽  
Ting Y. Tsui ◽  
Simone Anders ◽  
...  

1998 ◽  
Vol 517 ◽  
Author(s):  
Simone Anders ◽  
C. Singh Bhatia ◽  
Walton Fong ◽  
Roger Yu Lo ◽  
David B. Bogy

AbstractAmorphous hard carbon films deposited by filtered cathodic arc deposition exhibit very high hardness and elastic modulus, high mass density, low coefficient of friction, and the films are very smooth. All these properties are beneficial to applications of these films for the head/disk interface tribology. The properties of cathodic arc deposited amorphous carbon films are summarized, and they are compared to sputter deposited, hydrogenated (CHx), and nitrogenated (CNx) carbon films which are the present choice for hard disk and slider coatings. New developments in cathodic arc coaters are discussed which are of interest to the disk drive industry. Experiments on the nanotribology, mass density and hardness, corrosion behavior, and tribochemical behavior of cathodic arc films are reported. A number of applications of cathodic arc deposited films to hard disk and slider coatings are described. It is shown that their tribological performance is considerably better compared to CHx and CNx films.


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