Thermal stability of amorphous hard carbon films produced by cathodic arc deposition

ABSTRACTCathodic arc deposition combined with macroparticle filtering of the plasma is an efficient and versatile method for the deposition of amorphous hard carbon films of high quality. The film properties can be tailored over a broad range by varying the energy of the carbon ions incident upon the substrate and upon the growing film by applying a pulsed bias technique. By varying the bias voltage during the deposition process specific properties of the interface, bulk film and top surface layer can be obtained. We report on nanoindentation and transmission electron microscopy studies as well as stress measurements of cathodic-arc amorphous hard carbon films deposited with varied bias voltage. The investigations were performed on multilayers consisting of alternating hard and soft amorphous carbon.

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Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing

Applied Physics Letters ◽

10.1063/1.116530 ◽

1996 ◽

Vol 68 (6) ◽

pp. 779-781 ◽

Cited By ~ 217

Author(s):

George M. Pharr ◽

Daniel L. Callahan ◽

Shaun D. McAdams ◽

Ting Y. Tsui ◽

Simone Anders ◽

...

Keyword(s):

Elastic Modulus ◽

Carbon Films ◽

Hard Carbon ◽

Cathodic Arc Deposition ◽

Cathodic Arc ◽

Arc Deposition

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Oxidation Resistance and Corrosion Resistance of AlTiCrON Multilayered Coatings on AISI M2 Tool Steel

Applied Mechanics and Materials ◽

10.4028/www.scientific.net/amm.284-287.183 ◽

2013 ◽

Vol 284-287 ◽

pp. 183-187 ◽

Cited By ~ 1

Author(s):

Wei Yu Ho ◽

Cheng Hsun Hsu ◽

Zhong Shen Yang ◽

Li Wei Shen ◽

Woei Yun Ho

Keyword(s):

Thermal Stability ◽

Corrosion Resistance ◽

Al Alloy ◽

Multilayered Coatings ◽

Cathodic Arc Deposition ◽

Oxide Phases ◽

Cathodic Arc ◽

Crn Coatings ◽

Arc Deposition ◽

Thermal Stability Of

This study utilized the reaction of O2/N2gases and Al0.67Ti0.33/Cr (99.9%) dual targets to synthesize (Ti,Al)ON/CrON multilayered coatings on AISI M2 steel by cathodic arc deposition system. Thermal stability and corrosion resistance of the multilayered coatings for aluminum die casting applications, along with coating structure were investigated. The results showed that the structure of multilayered coatings was a B1 NaCl type. The formation of oxide phases by introducing oxygen to react with Al, Cr, and Ti elements was confirmed by XPS. The thermal stability of oxygen-doped AlTiN/CrN coatings was higher than that of one without oxygen. After the immersion tests in Al-alloy melt, the oxygen-doped AlTiN/CrN coatings deposited at the O2/N2ratio value of 0.3 had the best improvement on the corrosion resistance among all the coated specimens.

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Thermal Stability of Tetrahedral Amorphous Carbon Films Fabricated by Filtered Cathodic Arc Technique

Journal of Inorganic Materials ◽

10.3724/sp.j.1077.2008.00789 ◽

2008 ◽

Vol 23 (4) ◽

pp. 789-793

Author(s):

Li-Zhao QIN

Keyword(s):

Thermal Stability ◽

Amorphous Carbon ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Tetrahedral Amorphous Carbon ◽

Cathodic Arc ◽

Thermal Stability Of

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Structural Characteristics of Diamond-Like Carbon Films Synthesized by Different Methods

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.743.112 ◽

2017 ◽

Vol 743 ◽

pp. 112-117

Author(s):

Alexander Zolkin ◽

Anna Semerikova ◽

Sergey Chepkasov ◽

Maksim Khomyakov

Keyword(s):

Amorphous Phase ◽

Ion Beam ◽

High Energy ◽

Carbon Films ◽

Ion Source ◽

Ordered Structure ◽

Deposition Technique ◽

Cathodic Arc Deposition ◽

Cathodic Arc ◽

Arc Deposition

In the present study, the Raman spectra of diamond-like amorphous (a-C) and hydrogenated amorphous (a-C:H) carbon films on silicon obtained using the ion-beam methods and the pulse cathodic arc deposition technique were investigated with the aim of elucidating the relation between the hardness and structure of the films. The hardness of the samples used in the present study was 19 – 45 GPa. Hydrogenated carbon films were synthesized using END–Hall ion sources and a linear anode layer ion source (LIS) on single-crystal silicon substrates. The gas precursors were CH4 and C3H8, and the rate of the gas flow fed into the ion source was 4.4 to 10 sccm. The ion energies ranged from 150 to 600 eV. a-C films were deposited onto Si substrates using the pulse cathodic arc deposition technique. The films obtained by the pulse arc technique contained elements with an ordered structure. In the films synthesized using low- (150 eV) and high-energy (600 eV) ions beams, an amorphous phase was the major phase. The significant blurriness of the diffraction rings in the electron diffraction patterns due to a large film thickness (180 – 250 nm) did not allow distinctly observing the signals from the elements with an ordered structure against the background of an amorphous phase.

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Structure of high hardness cathodic-arc deposited carbon

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100137409 ◽

1995 ◽

Vol 53 ◽

pp. 206-207

Author(s):

D. L. Callahan ◽

S. D. McAdams ◽

S. Anders ◽

A. Anders ◽

I.G. Brown ◽

...

Keyword(s):

High Hardness ◽

Carbon Films ◽

Peak Hardness ◽

Nanocrystalline Phase ◽

Substrate Bias ◽

Plan View ◽

Cathodic Arc Deposition ◽

Transmission Electron ◽

Cathodic Arc ◽

Arc Deposition

Carbon films exhibiting a peak hardness of 59 GPa have been produced using pulsebiased cathodic-arc deposition. This value is much greater than that expected of an amorphous "diamond-like" carbon (die) film and is well within the hardness range of chemically vapor-deposited diamond. Furthermore, this peak hardness is observed at an indentation depth of approximately 50 nm and not on the upper surface of the film. A structural analysis by transmission electron microscopy (TEM) has been conducted in order to explain these mechanical phenomena.Details of the sputtering apparatus are described elsewhere. Films for this study were deposited on silicon using a two-step process in which a thin layer, approximately 10 nm, was first deposited at a relatively high substrate bias (~2 kV) followed by growth of the majority of the film at a lower bias (~200 V). Plan-view examination of carbon films revealed both uniformly amorphous regions and extensive nanocrystalline phase regions.

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